JPS5489594A - Manufacture for integrated circuit - Google Patents
Manufacture for integrated circuitInfo
- Publication number
- JPS5489594A JPS5489594A JP15885277A JP15885277A JPS5489594A JP S5489594 A JPS5489594 A JP S5489594A JP 15885277 A JP15885277 A JP 15885277A JP 15885277 A JP15885277 A JP 15885277A JP S5489594 A JPS5489594 A JP S5489594A
- Authority
- JP
- Japan
- Prior art keywords
- film
- region
- diffusion
- sio
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To increase the degree of integration and also to improve the yield rate, by providing all the openings required for the wiring formation with the self-alignment method using the acid proof material such as Si3N4, when the polycrystal Si film is constituted with IGFET used for the gate electrode material.
CONSTITUTION: The active region of P type Si substrate 101 is oxidized under water vapor by covering it with the Si3N4 film 103, and thick field SiO2 film 102 is caused other than the active region. Next, the film 103 for the other part is removed by leaving a part of the film 103 used for diffusion, and the gate SiO2 film 104, polycrystal Si film 105 and Si3N4 film are laminated and coated on the entire surface. After that, the film 106 is left only on the gate region and the film 102, and the film 104 and 105 on the diffusion region 107 are removed by etching. Further, the region 107 is formed by diffusion N type impurity in the substrate 101 exposed, the entire surface is covered with the SiO2 film 108, and the wiring electrode 109 is fitted by opening the open hole.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15885277A JPS5489594A (en) | 1977-12-27 | 1977-12-27 | Manufacture for integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15885277A JPS5489594A (en) | 1977-12-27 | 1977-12-27 | Manufacture for integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5489594A true JPS5489594A (en) | 1979-07-16 |
Family
ID=15680811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15885277A Pending JPS5489594A (en) | 1977-12-27 | 1977-12-27 | Manufacture for integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5489594A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56157369U (en) * | 1980-04-25 | 1981-11-24 | ||
JPS61102047A (en) * | 1984-10-25 | 1986-05-20 | Nec Corp | Semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51112193A (en) * | 1975-03-28 | 1976-10-04 | Matsushita Electric Ind Co Ltd | Processing method of semiconductor equipment |
-
1977
- 1977-12-27 JP JP15885277A patent/JPS5489594A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51112193A (en) * | 1975-03-28 | 1976-10-04 | Matsushita Electric Ind Co Ltd | Processing method of semiconductor equipment |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56157369U (en) * | 1980-04-25 | 1981-11-24 | ||
JPS61102047A (en) * | 1984-10-25 | 1986-05-20 | Nec Corp | Semiconductor device |
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