JPS6450548A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6450548A JPS6450548A JP20652587A JP20652587A JPS6450548A JP S6450548 A JPS6450548 A JP S6450548A JP 20652587 A JP20652587 A JP 20652587A JP 20652587 A JP20652587 A JP 20652587A JP S6450548 A JPS6450548 A JP S6450548A
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- contact hole
- diffusion layer
- film
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To round the corner part of the contact hole without changing the size of the contact hole by forming, on a semiconductor substrate including a diffusion layer region, a first insulating film and a second insulating film having an etch rate larger than the first insulating film, performing an etching to form a stepped contact hole, and performing the reflow processing of the second insulating film. CONSTITUTION:When forming a contact hole for connecting a diffusion layer 2 and a wiring conductor in a semiconductor device, a first insulating film 3 is formed on a semiconductor substrate 1 including the diffusion layer 2, are thereon a second insulating film 4 having an etch rate larger than the first insulating film 3 is formed. Then, on the second insulating film 4, a film 5 as a mask having an opening in the part corresponding to the region of said diffusion layer 2 is formed by photolithography, and through the film 5 as a mask, the first and second insulating films 3, 4 are etched by a wet or dry etching method to form a contact hole having stepped sides. Thereafter, the reflow processing of the second insulating film 4 is carried out, thereby rounding the corner portions thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20652587A JPS6450548A (en) | 1987-08-21 | 1987-08-21 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20652587A JPS6450548A (en) | 1987-08-21 | 1987-08-21 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6450548A true JPS6450548A (en) | 1989-02-27 |
Family
ID=16524810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20652587A Pending JPS6450548A (en) | 1987-08-21 | 1987-08-21 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6450548A (en) |
-
1987
- 1987-08-21 JP JP20652587A patent/JPS6450548A/en active Pending
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