JPS6420428A - Formation of acicular member - Google Patents

Formation of acicular member

Info

Publication number
JPS6420428A
JPS6420428A JP17766187A JP17766187A JPS6420428A JP S6420428 A JPS6420428 A JP S6420428A JP 17766187 A JP17766187 A JP 17766187A JP 17766187 A JP17766187 A JP 17766187A JP S6420428 A JPS6420428 A JP S6420428A
Authority
JP
Japan
Prior art keywords
sio2 film
projection
etching
substrate
acicular member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17766187A
Other languages
Japanese (ja)
Inventor
Osamu Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17766187A priority Critical patent/JPS6420428A/en
Publication of JPS6420428A publication Critical patent/JPS6420428A/en
Pending legal-status Critical Current

Links

Landscapes

  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To easily obtain an acicular member in large quantities by etching the surface of a planar material, forming plural projections, removing a mask layer, executing chemically etching and forming sharply the tip part of the projection. CONSTITUTION:An SiO2 film 2 is stuck to a substrate 1. By patterning the SiO2 film, the SiO2 film 2 is left partially. By using the SiO2 film 2 as a mask and executing ion etching, the surface of the substrate 1 is removed selectively, and a projection 3 is formed. A tip part 5 of the projection 3 is immersed into an etching liquid. As a result, the tip part 5 becomes sharper. By separating the substrate 1 by a cleavage, etc., a prescribed acicular member is obtained separately. In such a way, the acicular member can be obtained easily in large quantities.
JP17766187A 1987-07-15 1987-07-15 Formation of acicular member Pending JPS6420428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17766187A JPS6420428A (en) 1987-07-15 1987-07-15 Formation of acicular member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17766187A JPS6420428A (en) 1987-07-15 1987-07-15 Formation of acicular member

Publications (1)

Publication Number Publication Date
JPS6420428A true JPS6420428A (en) 1989-01-24

Family

ID=16034892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17766187A Pending JPS6420428A (en) 1987-07-15 1987-07-15 Formation of acicular member

Country Status (1)

Country Link
JP (1) JPS6420428A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04233128A (en) * 1990-07-25 1992-08-21 Internatl Business Mach Corp <Ibm> Precision instrument sensor for profil measurement of afm/stm/mfm and its manufacture
US5173716A (en) * 1990-02-02 1992-12-22 Harada Kogyo Kabushiki Kaisha Device for driving telescopic power antenna
US5599464A (en) * 1995-10-06 1997-02-04 Vlsi Standards, Inc. Formation of atomic scale vertical features for topographic instrument calibration
US5771744A (en) * 1995-03-14 1998-06-30 Holmac S.A.S. Di Gastaldi Christian E C. Device for subjecting a shaft to a combined simple rotation and alternating rotation of limited extent about its own axis
US6358860B1 (en) 1999-10-07 2002-03-19 Vlsi Standards, Inc. Line width calibration standard manufacturing and certifying method
JP2006160298A (en) * 2004-12-03 2006-06-22 Yushin Giken Kk Packaging box, and packaging structure using the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173716A (en) * 1990-02-02 1992-12-22 Harada Kogyo Kabushiki Kaisha Device for driving telescopic power antenna
JPH04233128A (en) * 1990-07-25 1992-08-21 Internatl Business Mach Corp <Ibm> Precision instrument sensor for profil measurement of afm/stm/mfm and its manufacture
US5771744A (en) * 1995-03-14 1998-06-30 Holmac S.A.S. Di Gastaldi Christian E C. Device for subjecting a shaft to a combined simple rotation and alternating rotation of limited extent about its own axis
US5599464A (en) * 1995-10-06 1997-02-04 Vlsi Standards, Inc. Formation of atomic scale vertical features for topographic instrument calibration
US6358860B1 (en) 1999-10-07 2002-03-19 Vlsi Standards, Inc. Line width calibration standard manufacturing and certifying method
JP2006160298A (en) * 2004-12-03 2006-06-22 Yushin Giken Kk Packaging box, and packaging structure using the same

Similar Documents

Publication Publication Date Title
JPS5548935A (en) Forming of electrode pattern
GB1534475A (en) Etching of polymeric materials
JPS6420428A (en) Formation of acicular member
JPS5748237A (en) Manufacture of 2n doubling pattern
KR890004392A (en) Formation method of fine pattern
JPS6424465A (en) Manufacture of mesfet
JPS6425986A (en) Selective formation of silicon dioxide film
JPS57118641A (en) Lifting-off method
JPS5642346A (en) Manufacture of semiconductor device
JPS6455826A (en) Manufacture of semiconductor device
JPS56112727A (en) Manufacture of x-ray mask
JPS5619053A (en) Manufacture of photomask
JPS5618429A (en) Minute electrode formation
JPS5759331A (en) Manufacture of semiconductor device
JPS5732634A (en) Production of pattern with fine gap
JPS56115534A (en) Formation of pattern
JPS641215A (en) Manufacture of magnetic thin film
JPS5545233A (en) Production of piezo-electric thin film driving metal vibration piece
JPS6439029A (en) Manufacture of semiconductor device
JPS56130716A (en) Manufacture of electrode substrate for liquid-crystal display element
JPS5756934A (en) Manufacture of semiconductor element
JPS6410230A (en) Pattern forming method
JPS5750474A (en) Manufacture of semiconductor device
JPS56101745A (en) Formation of microminiature electrode
JPS5743431A (en) Manufacture of semiconductor device