JPS6439029A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6439029A JPS6439029A JP19551287A JP19551287A JPS6439029A JP S6439029 A JPS6439029 A JP S6439029A JP 19551287 A JP19551287 A JP 19551287A JP 19551287 A JP19551287 A JP 19551287A JP S6439029 A JPS6439029 A JP S6439029A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- resist layer
- patterning
- film layer
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE:To improve the accuracy of patterning by preventing the invasion of an etching solution by patterning an ITO film layer with use of a patterned resist layer and a SiO2 film layer as a mask. CONSTITUTION:An ITO film layer 2 is formed on a wafer 1. Then, a SiO2 film layer 3 is formed, a negative type resist layer 4 is formed, and the negative type resist layer 4 is patterned. The SiO2 layer 3 is etched with an etching solution containing a mixture of fluoric acid and ammonium fluride with use of the resist layer 4 as a mask. In succession, the ITO film layer 2 is etched using the resist layer 4 and the SiO2 film layer 3 as a mask and using hydrochloric acid and nitric acid as an etching solution. Then, the resist layer 4 is removed to complete the patterning. Hereby, the SiO2 film and the ITO film are brought into strong close contact, preventing the invasion of the etchant therein. Thus, the amount of side etching is reduced to improve patterning accuracy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19551287A JPS6439029A (en) | 1987-08-05 | 1987-08-05 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19551287A JPS6439029A (en) | 1987-08-05 | 1987-08-05 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6439029A true JPS6439029A (en) | 1989-02-09 |
Family
ID=16342312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19551287A Pending JPS6439029A (en) | 1987-08-05 | 1987-08-05 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6439029A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100345204C (en) * | 2002-03-19 | 2007-10-24 | 索尼株式会社 | Recording medium, method of recording and recording and reproducing device |
-
1987
- 1987-08-05 JP JP19551287A patent/JPS6439029A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100345204C (en) * | 2002-03-19 | 2007-10-24 | 索尼株式会社 | Recording medium, method of recording and recording and reproducing device |
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