JPS6412378B2 - - Google Patents

Info

Publication number
JPS6412378B2
JPS6412378B2 JP10862980A JP10862980A JPS6412378B2 JP S6412378 B2 JPS6412378 B2 JP S6412378B2 JP 10862980 A JP10862980 A JP 10862980A JP 10862980 A JP10862980 A JP 10862980A JP S6412378 B2 JPS6412378 B2 JP S6412378B2
Authority
JP
Japan
Prior art keywords
water
parts
weight
photosensitive resin
polyamides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10862980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5732441A (en
Inventor
Takashi Okamoto
Minoru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP10862980A priority Critical patent/JPS5732441A/ja
Publication of JPS5732441A publication Critical patent/JPS5732441A/ja
Publication of JPS6412378B2 publication Critical patent/JPS6412378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP10862980A 1980-08-06 1980-08-06 Photosensitive resin composition Granted JPS5732441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10862980A JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10862980A JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5732441A JPS5732441A (en) 1982-02-22
JPS6412378B2 true JPS6412378B2 (enExample) 1989-02-28

Family

ID=14489633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10862980A Granted JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5732441A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170835A (ja) * 1983-03-17 1984-09-27 Toray Ind Inc 感光性樹脂組成物
JPS59195235A (ja) * 1983-04-20 1984-11-06 Toray Ind Inc 感光性樹脂組成物
DE3342851A1 (de) * 1983-11-26 1985-06-05 Merck Patent Gmbh, 6100 Darmstadt Fotolacke
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物
JPS6147741A (ja) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The 硬化性樹脂組成物
EP0636940B1 (en) * 1993-07-20 1998-10-07 Toray Industries, Inc. Photosensitive polymer composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3810110A (en) * 1973-05-01 1974-05-07 Digital Equipment Corp Computer system overlap of memory operation

Also Published As

Publication number Publication date
JPS5732441A (en) 1982-02-22

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