JPS6364909B2 - - Google Patents

Info

Publication number
JPS6364909B2
JPS6364909B2 JP55180381A JP18038180A JPS6364909B2 JP S6364909 B2 JPS6364909 B2 JP S6364909B2 JP 55180381 A JP55180381 A JP 55180381A JP 18038180 A JP18038180 A JP 18038180A JP S6364909 B2 JPS6364909 B2 JP S6364909B2
Authority
JP
Japan
Prior art keywords
region
substrate
impurity concentration
gate electrode
under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55180381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57104258A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP55180381A priority Critical patent/JPS57104258A/ja
Publication of JPS57104258A publication Critical patent/JPS57104258A/ja
Publication of JPS6364909B2 publication Critical patent/JPS6364909B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/351Substrate regions of field-effect devices
    • H10D62/357Substrate regions of field-effect devices of FETs
    • H10D62/364Substrate regions of field-effect devices of FETs of IGFETs
JP55180381A 1980-12-22 1980-12-22 Metal oxide semiconductor Granted JPS57104258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55180381A JPS57104258A (en) 1980-12-22 1980-12-22 Metal oxide semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55180381A JPS57104258A (en) 1980-12-22 1980-12-22 Metal oxide semiconductor

Publications (2)

Publication Number Publication Date
JPS57104258A JPS57104258A (en) 1982-06-29
JPS6364909B2 true JPS6364909B2 (enrdf_load_stackoverflow) 1988-12-14

Family

ID=16082234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55180381A Granted JPS57104258A (en) 1980-12-22 1980-12-22 Metal oxide semiconductor

Country Status (1)

Country Link
JP (1) JPS57104258A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162372A (ja) * 1987-12-18 1989-06-26 Matsushita Electron Corp Mis型トランジスタ
JP2650456B2 (ja) * 1989-07-04 1997-09-03 富士電機株式会社 Mos半導体装置

Also Published As

Publication number Publication date
JPS57104258A (en) 1982-06-29

Similar Documents

Publication Publication Date Title
US6303412B1 (en) Methods of forming semiconductor-on-insulator substrates and devices and structures formed thereby
US4232327A (en) Extended drain self-aligned silicon gate MOSFET
EP0918353A1 (en) A method of manufacturing a recessed insulated gate field-effect semiconductor device
US4318216A (en) Extended drain self-aligned silicon gate MOSFET
JPH05243572A (ja) 半導体装置
KR0177785B1 (ko) 오프셋 구조를 가지는 트랜지스터 및 그 제조방법
US7176071B2 (en) Semiconductor device and fabrication method with etch stop film below active layer
JPS634683A (ja) 電界効果トランジスタ
US4193182A (en) Passivated V-gate GaAs field-effect transistor and fabrication process therefor
JP3057439B2 (ja) 半導体デバイスの製造方法
US3983572A (en) Semiconductor devices
JP3420301B2 (ja) 薄膜トランジスタの製造方法
JPS6364909B2 (enrdf_load_stackoverflow)
JPS6326553B2 (enrdf_load_stackoverflow)
JPS63227059A (ja) 半導体装置およびその製造方法
KR100253261B1 (ko) 박막트랜지스터 및 그 제조방법
JP2759472B2 (ja) 高耐圧mos電界効果トランジスタの製造方法
JPH0612822B2 (ja) 半導体装置
JP2789998B2 (ja) 半導体装置
JPH11233776A (ja) 薄膜半導体装置およびその製造方法
KR0170513B1 (ko) 모스 트랜지스터 및 그의 제조방법
JPS622705B2 (enrdf_load_stackoverflow)
KR950012737B1 (ko) 박막 트랜지스터 제조 방법
JPS622706B2 (enrdf_load_stackoverflow)
JPH04146627A (ja) 電界効果型半導体装置およびその製造方法