JPS6364051B2 - - Google Patents

Info

Publication number
JPS6364051B2
JPS6364051B2 JP58042254A JP4225483A JPS6364051B2 JP S6364051 B2 JPS6364051 B2 JP S6364051B2 JP 58042254 A JP58042254 A JP 58042254A JP 4225483 A JP4225483 A JP 4225483A JP S6364051 B2 JPS6364051 B2 JP S6364051B2
Authority
JP
Japan
Prior art keywords
gap
wafer
focus mechanism
differential pressure
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58042254A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59169134A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58042254A priority Critical patent/JPS59169134A/ja
Priority to PCT/JP1984/000107 priority patent/WO1987002178A1/ja
Priority to US06/671,218 priority patent/US4615614A/en
Publication of JPS59169134A publication Critical patent/JPS59169134A/ja
Publication of JPS6364051B2 publication Critical patent/JPS6364051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
JP58042254A 1983-03-16 1983-03-16 縮小投影露光装置 Granted JPS59169134A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58042254A JPS59169134A (ja) 1983-03-16 1983-03-16 縮小投影露光装置
PCT/JP1984/000107 WO1987002178A1 (en) 1983-03-16 1984-03-16 Optical exposure apparatus
US06/671,218 US4615614A (en) 1983-03-16 1984-03-16 Optical exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58042254A JPS59169134A (ja) 1983-03-16 1983-03-16 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS59169134A JPS59169134A (ja) 1984-09-25
JPS6364051B2 true JPS6364051B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-12-09

Family

ID=12630884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58042254A Granted JPS59169134A (ja) 1983-03-16 1983-03-16 縮小投影露光装置

Country Status (3)

Country Link
US (1) US4615614A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS59169134A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO1987002178A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4714331A (en) * 1985-03-25 1987-12-22 Canon Kabushiki Kaisha Method and apparatus for automatic focusing
US5114223A (en) * 1985-07-15 1992-05-19 Canon Kabushiki Kaisha Exposure method and apparatus
JPH0760251B2 (ja) * 1986-08-14 1995-06-28 キヤノン株式会社 自動焦点合せ方法
JPS63220521A (ja) * 1987-03-10 1988-09-13 Canon Inc 焦点合せ装置
US5087927A (en) * 1990-01-31 1992-02-11 Ateo Corporation On-axis air gage focus system
US5224374A (en) * 1991-05-31 1993-07-06 Texas Instruments Incorporated Wafer proximity sensor
US5163312A (en) * 1991-05-31 1992-11-17 Texas Instruments Incorporated Wafer proximity sensor
KR100727847B1 (ko) 2005-09-07 2007-06-14 세메스 주식회사 기판 가장자리 노광 장치
KR100727848B1 (ko) 2005-09-27 2007-06-14 세메스 주식회사 기판 가장자리 노광 장치
EP4614231A1 (en) * 2024-03-05 2025-09-10 Mycronic AB Objective lens arrangement

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
JPS52143775A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Reduction projecting and printing method and reduction projecting and printing apparatus used in this method
FR2371716A1 (fr) * 1976-11-19 1978-06-16 Thomson Csf Appareil photorepeteur de masques

Also Published As

Publication number Publication date
WO1987002178A1 (en) 1987-04-09
US4615614A (en) 1986-10-07
JPS59169134A (ja) 1984-09-25

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