JPS6356534B2 - - Google Patents

Info

Publication number
JPS6356534B2
JPS6356534B2 JP6813482A JP6813482A JPS6356534B2 JP S6356534 B2 JPS6356534 B2 JP S6356534B2 JP 6813482 A JP6813482 A JP 6813482A JP 6813482 A JP6813482 A JP 6813482A JP S6356534 B2 JPS6356534 B2 JP S6356534B2
Authority
JP
Japan
Prior art keywords
information
picture
color
pattern
displayed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6813482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58184945A (ja
Inventor
Hitoshi Oono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP57068134A priority Critical patent/JPS58184945A/ja
Publication of JPS58184945A publication Critical patent/JPS58184945A/ja
Publication of JPS6356534B2 publication Critical patent/JPS6356534B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Facsimile Image Signal Circuits (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57068134A 1982-04-23 1982-04-23 絵柄の位置決め方法 Granted JPS58184945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57068134A JPS58184945A (ja) 1982-04-23 1982-04-23 絵柄の位置決め方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57068134A JPS58184945A (ja) 1982-04-23 1982-04-23 絵柄の位置決め方法

Publications (2)

Publication Number Publication Date
JPS58184945A JPS58184945A (ja) 1983-10-28
JPS6356534B2 true JPS6356534B2 (enrdf_load_stackoverflow) 1988-11-08

Family

ID=13364964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57068134A Granted JPS58184945A (ja) 1982-04-23 1982-04-23 絵柄の位置決め方法

Country Status (1)

Country Link
JP (1) JPS58184945A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238835A (ja) * 1984-05-11 1985-11-27 Dainippon Printing Co Ltd 印刷におけるレイアウト作図システム
JPH0719264B2 (ja) * 1985-08-22 1995-03-06 大日本印刷株式会社 チラシ・カタログ類の写真割付方法
JPH0775391B2 (ja) * 1986-03-20 1995-08-09 凸版印刷株式会社 カラ−スキヤナ−用原稿の角度および倍率設定装置
JPS62284359A (ja) * 1986-06-03 1987-12-10 Dainippon Printing Co Ltd 無地網製版前準備装置
JPH0486825A (ja) * 1990-07-31 1992-03-19 Gurafuika:Kk 印刷用の製版装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
RESPONSE300 *
RESPONSE300=1980 *

Also Published As

Publication number Publication date
JPS58184945A (ja) 1983-10-28

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