JPS635343B2 - - Google Patents
Info
- Publication number
- JPS635343B2 JPS635343B2 JP54027238A JP2723879A JPS635343B2 JP S635343 B2 JPS635343 B2 JP S635343B2 JP 54027238 A JP54027238 A JP 54027238A JP 2723879 A JP2723879 A JP 2723879A JP S635343 B2 JPS635343 B2 JP S635343B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- film
- substrate
- gas mixture
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 67
- 239000000203 mixture Substances 0.000 claims description 65
- 238000000576 coating method Methods 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 25
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 25
- 229910001887 tin oxide Inorganic materials 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 14
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 13
- 239000000047 product Substances 0.000 claims description 13
- 239000007795 chemical reaction product Substances 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 150000003377 silicon compounds Chemical class 0.000 claims description 8
- 239000000376 reactant Substances 0.000 claims description 6
- 150000003606 tin compounds Chemical class 0.000 claims description 6
- UTUAUBOPWUPBCH-UHFFFAOYSA-N dimethylsilylidene(dimethyl)silane Chemical group C[Si](C)=[Si](C)C UTUAUBOPWUPBCH-UHFFFAOYSA-N 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- UPARUZSLIVQDTG-UHFFFAOYSA-N methyl(methylsilyl)silane Chemical compound C[SiH2][SiH2]C UPARUZSLIVQDTG-UHFFFAOYSA-N 0.000 claims description 4
- 229920000548 poly(silane) polymer Polymers 0.000 claims description 4
- JDTCYQUMKGXSMX-UHFFFAOYSA-N dimethyl(methylsilyl)silane Chemical compound C[SiH2][SiH](C)C JDTCYQUMKGXSMX-UHFFFAOYSA-N 0.000 claims description 3
- IQCYANORSDPPDT-UHFFFAOYSA-N methyl(silyl)silane Chemical compound C[SiH2][SiH3] IQCYANORSDPPDT-UHFFFAOYSA-N 0.000 claims 2
- 238000006276 transfer reaction Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 42
- 239000007789 gas Substances 0.000 description 39
- 239000010410 layer Substances 0.000 description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 12
- 239000003086 colorant Substances 0.000 description 11
- 230000008021 deposition Effects 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000005286 illumination Methods 0.000 description 5
- 238000004364 calculation method Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 2
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229940071182 stannate Drugs 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- -1 Me 4 Si Chemical class 0.000 description 1
- SZORCXXIWAPIMC-UHFFFAOYSA-N O=[Si]=O.O=[Sn]=O Chemical compound O=[Si]=O.O=[Sn]=O SZORCXXIWAPIMC-UHFFFAOYSA-N 0.000 description 1
- 241000271569 Rhea Species 0.000 description 1
- 229910008045 Si-Si Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000681 Silicon-tin Inorganic materials 0.000 description 1
- 229910006411 Si—Si Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical group C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical class C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- LQJIDIOGYJAQMF-UHFFFAOYSA-N lambda2-silanylidenetin Chemical compound [Si].[Sn] LQJIDIOGYJAQMF-UHFFFAOYSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- DOVLZBWRSUUIJA-UHFFFAOYSA-N oxotin;silicon Chemical compound [Si].[Sn]=O DOVLZBWRSUUIJA-UHFFFAOYSA-N 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011158 quantitative evaluation Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/229—Non-specific enumeration
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/36—Underside coating of a glass sheet
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/884,432 US4206252A (en) | 1977-04-04 | 1978-03-08 | Deposition method for coating glass and the like |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54127424A JPS54127424A (en) | 1979-10-03 |
| JPS635343B2 true JPS635343B2 (es) | 1988-02-03 |
Family
ID=25384616
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2723879A Granted JPS54127424A (en) | 1978-03-08 | 1979-03-08 | Improved deposition method |
| JP61293328A Granted JPS62191448A (ja) | 1978-03-08 | 1986-12-09 | ガラス構造物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61293328A Granted JPS62191448A (ja) | 1978-03-08 | 1986-12-09 | ガラス構造物 |
Country Status (19)
| Country | Link |
|---|---|
| JP (2) | JPS54127424A (es) |
| AR (1) | AR216975A1 (es) |
| AU (1) | AU526605B2 (es) |
| BE (1) | BE874614A (es) |
| BR (1) | BR7901379A (es) |
| CA (1) | CA1134214A (es) |
| CH (1) | CH638762A5 (es) |
| DE (1) | DE2908412C2 (es) |
| DK (1) | DK94879A (es) |
| ES (2) | ES478393A1 (es) |
| FI (1) | FI790781A (es) |
| FR (1) | FR2419335A1 (es) |
| GB (1) | GB2015983B (es) |
| IE (1) | IE48228B1 (es) |
| IT (1) | IT1119685B (es) |
| MX (1) | MX151883A (es) |
| NL (1) | NL7901875A (es) |
| NO (1) | NO145947C (es) |
| SE (1) | SE445449B (es) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4291167A (en) | 1980-07-28 | 1981-09-22 | Nalco Chemical Company | Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane |
| JPS57100942A (en) * | 1980-12-10 | 1982-06-23 | Asahi Glass Co Ltd | Substrate coated with silicon oxide |
| US4386117A (en) * | 1981-11-20 | 1983-05-31 | Gordon Roy G | Coating process using alkoxy substituted silicon-bearing reactant |
| JPS58112375A (ja) * | 1981-12-25 | 1983-07-04 | Fuji Electric Corp Res & Dev Ltd | 光起電力装置の製造方法 |
| JPS58112374A (ja) * | 1981-12-25 | 1983-07-04 | Fuji Electric Corp Res & Dev Ltd | 光起電力装置の製造方法 |
| US4595634A (en) * | 1983-08-01 | 1986-06-17 | Gordon Roy G | Coating process for making non-iridescent glass |
| GB8624825D0 (en) * | 1986-10-16 | 1986-11-19 | Glaverbel | Vehicle windows |
| US5221352A (en) * | 1989-06-19 | 1993-06-22 | Glaverbel | Apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
| US5122391A (en) * | 1991-03-13 | 1992-06-16 | Watkins-Johnson Company | Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD |
| CH690511A5 (de) * | 1994-09-01 | 2000-09-29 | Balzers Hochvakuum | Optisches Bauteil und Verfahren zum Herstellen eines solchen. |
| DE4433206A1 (de) * | 1994-09-17 | 1996-03-21 | Goldschmidt Ag Th | Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten |
| FR2736632B1 (fr) | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
| TW328971B (en) * | 1995-10-30 | 1998-04-01 | Dow Corning | Method for depositing Si-O containing coatings |
| US5698262A (en) | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
| DE19624838A1 (de) * | 1996-06-21 | 1998-01-08 | Schueller Glasbeschichtung Gmb | Wärmedämmende Anti-Reflex-Beschichtung und Verfahren zu deren Herstellung |
| US6303523B2 (en) | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
| US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
| US6054379A (en) | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
| US6159871A (en) | 1998-05-29 | 2000-12-12 | Dow Corning Corporation | Method for producing hydrogenated silicon oxycarbide films having low dielectric constant |
| US6667553B2 (en) | 1998-05-29 | 2003-12-23 | Dow Corning Corporation | H:SiOC coated substrates |
| FR2787440B1 (fr) * | 1998-12-21 | 2001-12-07 | Saint Gobain Vitrage | Substrat transparent comportant un revetement antireflet |
| US6797388B1 (en) * | 1999-03-18 | 2004-09-28 | Ppg Industries Ohio, Inc. | Methods of making low haze coatings and the coatings and coated articles made thereby |
| US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
| JP4924070B2 (ja) * | 2007-02-06 | 2012-04-25 | ブラザー工業株式会社 | 印刷装置 |
| US8728634B2 (en) * | 2007-06-13 | 2014-05-20 | Ppg Industries Ohio, Inc. | Appliance transparency |
| FR2956659B1 (fr) | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
| FR2962852A1 (fr) | 2010-07-19 | 2012-01-20 | Saint Gobain | Electrode transparente pour cellule photovoltaique a haut rendement |
| CN103958731B (zh) * | 2011-09-30 | 2016-12-21 | 阿科玛股份有限公司 | 通过常压化学气相沉积沉积氧化硅 |
| FR2983350A1 (fr) * | 2011-11-30 | 2013-05-31 | Saint Gobain | Electrode transparente pour cellule photovoltaique cdte |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE841625C (de) * | 1942-02-01 | 1952-06-16 | Leitz Ernst Gmbh | Verfahren zur Herstellung reflexmindernder Schichten, z. B. auf Glas |
| DE742463C (de) * | 1942-07-15 | 1944-01-18 | Jenaer Glaswerk Schott & Gen | Schicht zur AEnderung des Reflexionsvermoegens aus einer Mehrzahl abwechselnd uebereinanderliegender Teilschichten aus zwei Stoffen von verschiedener Brechungszahl |
| US2602032A (en) * | 1946-08-19 | 1952-07-01 | Libbey Owens Ford Glass Co | Electrically conducting surface and method for producing same |
| US2617745A (en) * | 1951-12-19 | 1952-11-11 | Pittsburgh Plate Glass Co | Method of producing an electroconductive article |
| US2962388A (en) * | 1954-03-12 | 1960-11-29 | Metallgesellschaft Ag | Process for the production of titanium carbide coatings |
| GB1115884A (en) * | 1966-03-25 | 1968-05-29 | Standard Telephones Cables Ltd | Method for depositing on a substrate coherent solid layers |
| FR1524729A (fr) * | 1966-05-27 | 1968-05-10 | Dow Corning | Procédé et appareil pour la production continue de matières semi-conductrices |
| US3808035A (en) * | 1970-12-09 | 1974-04-30 | M Stelter | Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like |
| FR2210675B1 (es) * | 1972-12-15 | 1978-05-12 | Ppg Industries Inc | |
| GB1507465A (en) * | 1974-06-14 | 1978-04-12 | Pilkington Brothers Ltd | Coating glass |
| GB1507996A (en) * | 1975-06-11 | 1978-04-19 | Pilkington Brothers Ltd | Coating glass |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
-
1979
- 1979-02-06 CA CA320,878A patent/CA1134214A/en not_active Expired
- 1979-02-07 IE IE235/79A patent/IE48228B1/en unknown
- 1979-02-07 AU AU44014/79A patent/AU526605B2/en not_active Expired
- 1979-02-19 MX MX176653A patent/MX151883A/es unknown
- 1979-02-28 AR AR275647A patent/AR216975A1/es active
- 1979-03-02 FR FR7905492A patent/FR2419335A1/fr active Granted
- 1979-03-03 DE DE2908412A patent/DE2908412C2/de not_active Expired - Fee Related
- 1979-03-05 BE BE0/193835A patent/BE874614A/xx not_active IP Right Cessation
- 1979-03-05 CH CH213079A patent/CH638762A5/fr not_active IP Right Cessation
- 1979-03-07 SE SE7902052A patent/SE445449B/sv not_active IP Right Cessation
- 1979-03-07 ES ES478393A patent/ES478393A1/es not_active Expired
- 1979-03-07 BR BR7901379A patent/BR7901379A/pt unknown
- 1979-03-07 GB GB7908105A patent/GB2015983B/en not_active Expired
- 1979-03-07 IT IT67488/79A patent/IT1119685B/it active
- 1979-03-07 FI FI790781A patent/FI790781A/fi not_active Application Discontinuation
- 1979-03-07 NO NO790762A patent/NO145947C/no unknown
- 1979-03-07 DK DK94879A patent/DK94879A/da not_active Application Discontinuation
- 1979-03-08 NL NL7901875A patent/NL7901875A/xx not_active Application Discontinuation
- 1979-03-08 JP JP2723879A patent/JPS54127424A/ja active Granted
- 1979-07-12 ES ES482440A patent/ES482440A1/es not_active Expired
-
1986
- 1986-12-09 JP JP61293328A patent/JPS62191448A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| NL7901875A (nl) | 1979-09-11 |
| IT7967488A0 (it) | 1979-03-07 |
| GB2015983A (en) | 1979-09-19 |
| CA1134214A (en) | 1982-10-26 |
| SE7902052L (sv) | 1979-09-09 |
| JPS54127424A (en) | 1979-10-03 |
| DE2908412C2 (de) | 1994-01-27 |
| AU4401479A (en) | 1979-09-20 |
| FI790781A (fi) | 1979-09-09 |
| NO145947B (no) | 1982-03-22 |
| SE445449B (sv) | 1986-06-23 |
| CH638762A5 (fr) | 1983-10-14 |
| ES478393A1 (es) | 1980-01-16 |
| GB2015983B (en) | 1983-02-02 |
| FR2419335B1 (es) | 1985-03-22 |
| BR7901379A (pt) | 1979-10-02 |
| MX151883A (es) | 1985-04-23 |
| AR216975A1 (es) | 1980-02-15 |
| ES482440A1 (es) | 1980-02-16 |
| FR2419335A1 (fr) | 1979-10-05 |
| DK94879A (da) | 1979-09-09 |
| AU526605B2 (en) | 1983-01-20 |
| IE48228B1 (en) | 1984-11-14 |
| IT1119685B (it) | 1986-03-10 |
| JPS62191448A (ja) | 1987-08-21 |
| NO145947C (no) | 1982-06-30 |
| JPH0157061B2 (es) | 1989-12-04 |
| DE2908412A1 (de) | 1979-09-20 |
| IE790235L (en) | 1979-09-08 |
| NO790762L (no) | 1979-09-11 |
| BE874614A (fr) | 1979-09-05 |
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