JPS63258022A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS63258022A
JPS63258022A JP62092678A JP9267887A JPS63258022A JP S63258022 A JPS63258022 A JP S63258022A JP 62092678 A JP62092678 A JP 62092678A JP 9267887 A JP9267887 A JP 9267887A JP S63258022 A JPS63258022 A JP S63258022A
Authority
JP
Japan
Prior art keywords
layer
photomask
exposed
photoresist
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62092678A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577287B2 (enExample
Inventor
Akira Kanzawa
公 神澤
Eiji Ikemoto
池本　英二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP62092678A priority Critical patent/JPS63258022A/ja
Publication of JPS63258022A publication Critical patent/JPS63258022A/ja
Publication of JPH0577287B2 publication Critical patent/JPH0577287B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP62092678A 1987-04-15 1987-04-15 半導体装置の製造方法 Granted JPS63258022A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62092678A JPS63258022A (ja) 1987-04-15 1987-04-15 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62092678A JPS63258022A (ja) 1987-04-15 1987-04-15 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS63258022A true JPS63258022A (ja) 1988-10-25
JPH0577287B2 JPH0577287B2 (enExample) 1993-10-26

Family

ID=14061143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62092678A Granted JPS63258022A (ja) 1987-04-15 1987-04-15 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS63258022A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02268416A (ja) * 1989-04-11 1990-11-02 Matsushita Electron Corp 半導体装置の製造方法及びそれに使用するフオトマスク
JPH03266437A (ja) * 1990-03-16 1991-11-27 Toshiba Corp 半導体装置の製造方法
JPH05283358A (ja) * 1992-02-07 1993-10-29 Sumitomo Metal Ind Ltd 半導体装置のコンタクトホール形成方法
WO2004077484A1 (ja) * 2003-02-28 2004-09-10 Matsushita Electric Industrial Co., Ltd. プラズマディスプレイパネルの製造方法及びプラズマディスプレイパネル

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4540968B2 (ja) * 2003-11-13 2010-09-08 パナソニック株式会社 プラズマディスプレイパネルの製造方法およびプラズマディスプレイ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224628A (ja) * 1985-07-24 1987-02-02 Matsushita Electronics Corp ホトレジストパタ−ンの形成方法
JPS6258622A (ja) * 1985-09-09 1987-03-14 Toshiba Corp レジストパタ−ン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224628A (ja) * 1985-07-24 1987-02-02 Matsushita Electronics Corp ホトレジストパタ−ンの形成方法
JPS6258622A (ja) * 1985-09-09 1987-03-14 Toshiba Corp レジストパタ−ン形成方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02268416A (ja) * 1989-04-11 1990-11-02 Matsushita Electron Corp 半導体装置の製造方法及びそれに使用するフオトマスク
JPH03266437A (ja) * 1990-03-16 1991-11-27 Toshiba Corp 半導体装置の製造方法
JPH05283358A (ja) * 1992-02-07 1993-10-29 Sumitomo Metal Ind Ltd 半導体装置のコンタクトホール形成方法
WO2004077484A1 (ja) * 2003-02-28 2004-09-10 Matsushita Electric Industrial Co., Ltd. プラズマディスプレイパネルの製造方法及びプラズマディスプレイパネル
US7491107B2 (en) 2003-02-28 2009-02-17 Panasonic Corporation Plasma display panel producing method, and plasma display panel

Also Published As

Publication number Publication date
JPH0577287B2 (enExample) 1993-10-26

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