JPS63204620A - ハイブリッド厚膜回路におけるボンデイングワイヤとコンタクト領域との間の接続形成方法 - Google Patents
ハイブリッド厚膜回路におけるボンデイングワイヤとコンタクト領域との間の接続形成方法Info
- Publication number
- JPS63204620A JPS63204620A JP63029994A JP2999488A JPS63204620A JP S63204620 A JPS63204620 A JP S63204620A JP 63029994 A JP63029994 A JP 63029994A JP 2999488 A JP2999488 A JP 2999488A JP S63204620 A JPS63204620 A JP S63204620A
- Authority
- JP
- Japan
- Prior art keywords
- bonding wire
- wire
- barrier layer
- contact region
- thick film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10W70/093—
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/328—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by welding
-
- H10W70/66—
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/04—Soldering or other types of metallurgic bonding
- H05K2203/049—Wire bonding
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
-
- H10W72/075—
-
- H10W72/07533—
-
- H10W72/522—
-
- H10W72/5363—
-
- H10W72/552—
-
- H10W72/5522—
-
- H10W72/5524—
-
- H10W72/555—
-
- H10W72/59—
-
- H10W72/923—
-
- H10W72/952—
-
- H10W90/754—
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3704200.9 | 1987-02-11 | ||
| DE19873704200 DE3704200A1 (de) | 1987-02-11 | 1987-02-11 | Verfahren zur herstellung einer verbindung zwischen einem bonddraht und einer kontaktflaeche bei hybriden dickschicht-schaltkreisen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63204620A true JPS63204620A (ja) | 1988-08-24 |
Family
ID=6320738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63029994A Pending JPS63204620A (ja) | 1987-02-11 | 1988-02-10 | ハイブリッド厚膜回路におけるボンデイングワイヤとコンタクト領域との間の接続形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0278413A3 (enExample) |
| JP (1) | JPS63204620A (enExample) |
| DE (1) | DE3704200A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5272596A (en) * | 1991-06-24 | 1993-12-21 | At&T Bell Laboratories | Personal data card fabricated from a polymer thick-film circuit |
| US6835898B2 (en) | 1993-11-16 | 2004-12-28 | Formfactor, Inc. | Electrical contact structures formed by configuring a flexible wire to have a springable shape and overcoating the wire with at least one layer of a resilient conductive material, methods of mounting the contact structures to electronic components, and applications for employing the contact structures |
| US6336269B1 (en) | 1993-11-16 | 2002-01-08 | Benjamin N. Eldridge | Method of fabricating an interconnection element |
| EP0792517B1 (en) * | 1994-11-15 | 2003-10-22 | Formfactor, Inc. | Electrical contact structures from flexible wire |
| US6727579B1 (en) | 1994-11-16 | 2004-04-27 | Formfactor, Inc. | Electrical contact structures formed by configuring a flexible wire to have a springable shape and overcoating the wire with at least one layer of a resilient conductive material, methods of mounting the contact structures to electronic components, and applications for employing the contact structures |
| US20100065963A1 (en) | 1995-05-26 | 2010-03-18 | Formfactor, Inc. | Method of wirebonding that utilizes a gas flow within a capillary from which a wire is played out |
| DE10205609A1 (de) * | 2002-02-11 | 2003-08-28 | Infineon Technologies Ag | Anordnung zum Drahtbonden und Verfahren zur Herstellung einer Bondverbindung |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54162457A (en) * | 1978-06-14 | 1979-12-24 | Toshiba Corp | Electrode forming method for semiconductor element |
| JPS5778145A (en) * | 1980-10-31 | 1982-05-15 | Toshiba Corp | Forming method for bonding pad of semiconductor chip |
| JPS6016463A (ja) * | 1983-07-08 | 1985-01-28 | Agency Of Ind Science & Technol | オ−ム性電極 |
| JPS6097655A (ja) * | 1983-11-02 | 1985-05-31 | Hitachi Ltd | ボンデイング用ワイヤ |
| JPS61256766A (ja) * | 1985-05-10 | 1986-11-14 | Hitachi Ltd | 化合物半導体用電極 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3585461A (en) * | 1968-02-19 | 1971-06-15 | Westinghouse Electric Corp | High reliability semiconductive devices and integrated circuits |
| US3480412A (en) * | 1968-09-03 | 1969-11-25 | Fairchild Camera Instr Co | Method of fabrication of solder reflow interconnections for face down bonding of semiconductor devices |
| US3544704A (en) * | 1969-01-21 | 1970-12-01 | Motorola Inc | Bonding islands for hybrid circuits |
| US3601666A (en) * | 1969-08-21 | 1971-08-24 | Texas Instruments Inc | Titanium tungsten-gold contacts for semiconductor devices |
| US3590060A (en) * | 1969-09-22 | 1971-06-29 | Dow Corning | Fluroalkyltin compounds |
| US4176443A (en) * | 1977-03-08 | 1979-12-04 | Sgs-Ates Componenti Elettronici S.P.A. | Method of connecting semiconductor structure to external circuits |
| DE2748239A1 (de) * | 1977-10-27 | 1979-05-03 | Siemens Ag | Verfahren zum kontaktieren eines elektrischen kaltleiter-widerstandes mit einem anschlusselement |
| CA1153128A (en) * | 1980-04-22 | 1983-08-30 | Jonathan L. Evans | Electrical circuit assemblies |
| DE3023528C2 (de) * | 1980-06-24 | 1984-11-29 | W.C. Heraeus Gmbh, 6450 Hanau | Aluminium enthaltender Feinstdraht |
| JPS584955A (ja) * | 1981-06-30 | 1983-01-12 | Shinko Electric Ind Co Ltd | 金めつきされた電子部品パツケ−ジ |
| DD200954A1 (de) * | 1981-10-20 | 1983-06-22 | Wolfgang Werner | Mikrodraht aus aluminium fuer das drahtbonden |
| US4447857A (en) * | 1981-12-09 | 1984-05-08 | International Business Machines Corporation | Substrate with multiple type connections |
-
1987
- 1987-02-11 DE DE19873704200 patent/DE3704200A1/de active Granted
-
1988
- 1988-02-05 EP EP88101661A patent/EP0278413A3/de not_active Withdrawn
- 1988-02-10 JP JP63029994A patent/JPS63204620A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54162457A (en) * | 1978-06-14 | 1979-12-24 | Toshiba Corp | Electrode forming method for semiconductor element |
| JPS5778145A (en) * | 1980-10-31 | 1982-05-15 | Toshiba Corp | Forming method for bonding pad of semiconductor chip |
| JPS6016463A (ja) * | 1983-07-08 | 1985-01-28 | Agency Of Ind Science & Technol | オ−ム性電極 |
| JPS6097655A (ja) * | 1983-11-02 | 1985-05-31 | Hitachi Ltd | ボンデイング用ワイヤ |
| JPS61256766A (ja) * | 1985-05-10 | 1986-11-14 | Hitachi Ltd | 化合物半導体用電極 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3704200C2 (enExample) | 1991-11-28 |
| DE3704200A1 (de) | 1988-08-25 |
| EP0278413A2 (de) | 1988-08-17 |
| EP0278413A3 (de) | 1989-03-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3952404A (en) | Beam lead formation method | |
| EP0253691B1 (en) | Silicon die bonding process | |
| US4463059A (en) | Layered metal film structures for LSI chip carriers adapted for solder bonding and wire bonding | |
| US3760238A (en) | Fabrication of beam leads | |
| US5587336A (en) | Bump formation on yielded semiconductor dies | |
| JPH0689919A (ja) | ワイヤボンドとはんだ接続の両者を有する電気的内部接続基体および製造方法 | |
| JPS61204953A (ja) | ハ−メチツクシ−ルカバ−及びその製造方法 | |
| US6203926B1 (en) | Corrosion-free multi-layer conductor | |
| JPS62145758A (ja) | パラジウムを用いる銅製ボンデイングパツドの酸化防止法 | |
| JPH0136254B2 (enExample) | ||
| JPS63204620A (ja) | ハイブリッド厚膜回路におけるボンデイングワイヤとコンタクト領域との間の接続形成方法 | |
| JPH03101234A (ja) | 半導体装置の製造方法 | |
| CA1244147A (en) | Die bonding process | |
| JPS61225839A (ja) | バンプ電極の形成方法 | |
| JP2768448B2 (ja) | 半田バンプの形成方法 | |
| JPS5850421B2 (ja) | 薄膜回路 | |
| JPH02183538A (ja) | 半導体装置 | |
| JP2974840B2 (ja) | 半導体素子の実装方法 | |
| JP2850579B2 (ja) | 半導体装置用フィルムキャリア | |
| JPH03250628A (ja) | 半導体装置 | |
| JPS6353693B2 (enExample) | ||
| JPH01220840A (ja) | 半導体素子の接続構造 | |
| JPH0198238A (ja) | 半導体装置の実装方法 | |
| JPS6057219B2 (ja) | 半導体装置 | |
| JPH031834B2 (enExample) |