JPS6317356B2 - - Google Patents
Info
- Publication number
- JPS6317356B2 JPS6317356B2 JP57041316A JP4131682A JPS6317356B2 JP S6317356 B2 JPS6317356 B2 JP S6317356B2 JP 57041316 A JP57041316 A JP 57041316A JP 4131682 A JP4131682 A JP 4131682A JP S6317356 B2 JPS6317356 B2 JP S6317356B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- optical
- type semiconductor
- current blocking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 21
- 230000000903 blocking effect Effects 0.000 claims description 14
- 238000000605 extraction Methods 0.000 claims description 6
- 239000013078 crystal Substances 0.000 description 15
- 230000010355 oscillation Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 230000000737 periodic effect Effects 0.000 description 9
- 230000007423 decrease Effects 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 3
- 230000007017 scission Effects 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- MODGUXHMLLXODK-UHFFFAOYSA-N [Br].CO Chemical compound [Br].CO MODGUXHMLLXODK-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57041316A JPS58158988A (ja) | 1982-03-16 | 1982-03-16 | 分布帰還形半導体レ−ザ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57041316A JPS58158988A (ja) | 1982-03-16 | 1982-03-16 | 分布帰還形半導体レ−ザ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58158988A JPS58158988A (ja) | 1983-09-21 |
| JPS6317356B2 true JPS6317356B2 (de) | 1988-04-13 |
Family
ID=12605103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57041316A Granted JPS58158988A (ja) | 1982-03-16 | 1982-03-16 | 分布帰還形半導体レ−ザ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58158988A (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63263137A (ja) * | 1987-04-17 | 1988-10-31 | Sumitomo Electric Ind Ltd | 車両のトランスミツシヨン制御システム |
| JPH01300028A (ja) * | 1988-05-28 | 1989-12-04 | Hitachi Ltd | 駆動輪スリツプ防止制御装置 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61182295A (ja) * | 1985-02-07 | 1986-08-14 | Sharp Corp | 半導体レ−ザ装置 |
| JP2804502B2 (ja) * | 1989-03-30 | 1998-09-30 | 沖電気工業株式会社 | 半導体レーザ素子及びその製造方法 |
-
1982
- 1982-03-16 JP JP57041316A patent/JPS58158988A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63263137A (ja) * | 1987-04-17 | 1988-10-31 | Sumitomo Electric Ind Ltd | 車両のトランスミツシヨン制御システム |
| JPH01300028A (ja) * | 1988-05-28 | 1989-12-04 | Hitachi Ltd | 駆動輪スリツプ防止制御装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58158988A (ja) | 1983-09-21 |
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