JPS63124743U - - Google Patents

Info

Publication number
JPS63124743U
JPS63124743U JP1987016763U JP1676387U JPS63124743U JP S63124743 U JPS63124743 U JP S63124743U JP 1987016763 U JP1987016763 U JP 1987016763U JP 1676387 U JP1676387 U JP 1676387U JP S63124743 U JPS63124743 U JP S63124743U
Authority
JP
Japan
Prior art keywords
extraction hole
metal layer
electrode extraction
insulating layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987016763U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987016763U priority Critical patent/JPS63124743U/ja
Publication of JPS63124743U publication Critical patent/JPS63124743U/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto

Landscapes

  • Wire Bonding (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案に係る実施例の正面断面図、第
2図は第1図A―A線断面図である。第3図は従
来のDHD型定電圧ダイオードの断面図、第4図
及び第5図は従来のTAB型半導体装置の平面図
及び正面断面図である。 17……半導体基板、18……絶縁層、18a
……電極引出孔、19……リング状絶縁層、20
……金属層。
FIG. 1 is a front sectional view of an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line A--A in FIG. FIG. 3 is a sectional view of a conventional DHD type constant voltage diode, and FIGS. 4 and 5 are a plan view and a front sectional view of a conventional TAB type semiconductor device. 17... Semiconductor substrate, 18... Insulating layer, 18a
... Electrode extraction hole, 19 ... Ring-shaped insulating layer, 20
...Metal layer.

Claims (1)

【実用新案登録請求の範囲】 半導体基板上に被着された絶縁層に形成した電
極引出孔と、上記電極引出孔内の基板表面に形成
した金属層と、上記金属層上に形成したバンプ電
極とを具備する半導体装置において、 前記電極引出孔内の基板上に、金属層を内側と
外側とに遮断するリング状の絶縁層を具備したこ
とを特徴とする半導体装置。
[Claims for Utility Model Registration] An electrode extraction hole formed in an insulating layer deposited on a semiconductor substrate, a metal layer formed on the substrate surface within the electrode extraction hole, and a bump electrode formed on the metal layer. A semiconductor device comprising: a ring-shaped insulating layer that isolates a metal layer from inside and outside on the substrate in the electrode extraction hole.
JP1987016763U 1987-02-06 1987-02-06 Pending JPS63124743U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987016763U JPS63124743U (en) 1987-02-06 1987-02-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987016763U JPS63124743U (en) 1987-02-06 1987-02-06

Publications (1)

Publication Number Publication Date
JPS63124743U true JPS63124743U (en) 1988-08-15

Family

ID=30808912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987016763U Pending JPS63124743U (en) 1987-02-06 1987-02-06

Country Status (1)

Country Link
JP (1) JPS63124743U (en)

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