JPS6296526A - アルカリ可溶性ポリオルガノシルセスキオキサン重合体 - Google Patents

アルカリ可溶性ポリオルガノシルセスキオキサン重合体

Info

Publication number
JPS6296526A
JPS6296526A JP23634485A JP23634485A JPS6296526A JP S6296526 A JPS6296526 A JP S6296526A JP 23634485 A JP23634485 A JP 23634485A JP 23634485 A JP23634485 A JP 23634485A JP S6296526 A JPS6296526 A JP S6296526A
Authority
JP
Japan
Prior art keywords
polymer
alkali
soluble
polyorganosilsesquioxane
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23634485A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0558446B2 (enExample
Inventor
Hisashi Sugiyama
寿 杉山
Kazuo Nate
和男 名手
Takashi Inoue
隆史 井上
Akiko Mizushima
明子 水島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP23634485A priority Critical patent/JPS6296526A/ja
Priority to US06/859,370 priority patent/US4745169A/en
Priority to EP86106238A priority patent/EP0204963B1/en
Priority to DE8686106238T priority patent/DE3687479T2/de
Publication of JPS6296526A publication Critical patent/JPS6296526A/ja
Priority to US07/893,946 priority patent/US5264319A/en
Publication of JPH0558446B2 publication Critical patent/JPH0558446B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Polymers (AREA)
JP23634485A 1985-05-10 1985-10-24 アルカリ可溶性ポリオルガノシルセスキオキサン重合体 Granted JPS6296526A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP23634485A JPS6296526A (ja) 1985-10-24 1985-10-24 アルカリ可溶性ポリオルガノシルセスキオキサン重合体
US06/859,370 US4745169A (en) 1985-05-10 1986-05-05 Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer
EP86106238A EP0204963B1 (en) 1985-05-10 1986-05-07 Use of Alkali-Soluble Polyorganosilsesquioxane Polymers in a resist for preparing electronics parts.
DE8686106238T DE3687479T2 (de) 1985-05-10 1986-05-07 Verwendung von in alkalische milieu loeslichen silsesquioxanpolymeren in einem resist zur herstellung von electronischen teilen.
US07/893,946 US5264319A (en) 1985-05-10 1992-06-04 Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23634485A JPS6296526A (ja) 1985-10-24 1985-10-24 アルカリ可溶性ポリオルガノシルセスキオキサン重合体

Publications (2)

Publication Number Publication Date
JPS6296526A true JPS6296526A (ja) 1987-05-06
JPH0558446B2 JPH0558446B2 (enExample) 1993-08-26

Family

ID=16999418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23634485A Granted JPS6296526A (ja) 1985-05-10 1985-10-24 アルカリ可溶性ポリオルガノシルセスキオキサン重合体

Country Status (1)

Country Link
JP (1) JPS6296526A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4946921A (en) * 1988-05-18 1990-08-07 Toray Silicone Company Limited Alkali-soluble organopolysiloxane
JPH0436322A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd シロキサンポリマーの製造方法
JPH04130324A (ja) * 1990-09-21 1992-05-01 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物
WO2004111734A1 (ja) * 2003-06-11 2004-12-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物、レジスト積層体、およびレジストパターン形成方法
JPWO2005010077A1 (ja) * 2003-07-29 2006-11-30 東亞合成株式会社 珪素含有高分子化合物及びその製造方法並びに耐熱性樹脂組成物及び耐熱性皮膜
US8082803B2 (en) 2008-05-28 2011-12-27 Kabushiki Kaisha Toshiba Electromagnetic flow meter having a cut groove formed in the flange for holding the liner in position
WO2016111112A1 (ja) * 2015-01-05 2016-07-14 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4946921A (en) * 1988-05-18 1990-08-07 Toray Silicone Company Limited Alkali-soluble organopolysiloxane
JPH0436322A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd シロキサンポリマーの製造方法
JPH04130324A (ja) * 1990-09-21 1992-05-01 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物
WO2004111734A1 (ja) * 2003-06-11 2004-12-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物、レジスト積層体、およびレジストパターン形成方法
US7811637B2 (en) 2003-07-29 2010-10-12 Toagosei Co., Ltd. Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film
EP1650250A4 (en) * 2003-07-29 2009-08-12 Toagosei Co Ltd SILICONE-CONTAINING POLYMER, MANUFACTURING METHOD, HEAT-RESISTANT RESIN COMPOSITION AND HEAT-RESISTANT FILM
JPWO2005010077A1 (ja) * 2003-07-29 2006-11-30 東亞合成株式会社 珪素含有高分子化合物及びその製造方法並びに耐熱性樹脂組成物及び耐熱性皮膜
JP2011102399A (ja) * 2003-07-29 2011-05-26 Toagosei Co Ltd 珪素含有高分子化合物及びその製造方法並びに耐熱性樹脂組成物及び耐熱性皮膜
JP4702055B2 (ja) * 2003-07-29 2011-06-15 東亞合成株式会社 珪素含有高分子化合物及びその製造方法
US8329815B2 (en) 2003-07-29 2012-12-11 Toagosei Co., Ltd. Silicone-containing polymer and a heat-resistant resin composition comprising the silicon-containing polymer
US8082803B2 (en) 2008-05-28 2011-12-27 Kabushiki Kaisha Toshiba Electromagnetic flow meter having a cut groove formed in the flange for holding the liner in position
WO2016111112A1 (ja) * 2015-01-05 2016-07-14 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法
JPWO2016111112A1 (ja) * 2015-01-05 2017-10-12 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法

Also Published As

Publication number Publication date
JPH0558446B2 (enExample) 1993-08-26

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