JPS629188B2 - - Google Patents

Info

Publication number
JPS629188B2
JPS629188B2 JP57039259A JP3925982A JPS629188B2 JP S629188 B2 JPS629188 B2 JP S629188B2 JP 57039259 A JP57039259 A JP 57039259A JP 3925982 A JP3925982 A JP 3925982A JP S629188 B2 JPS629188 B2 JP S629188B2
Authority
JP
Japan
Prior art keywords
low
substance
pressure arc
chamber
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57039259A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57161062A (en
Inventor
Mooru Eberuharuto
Buuru Rainaa
Dakushingaa Herumuuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BARUTSUERUSU AG FUYUA HOTSUHOBAKUMUTEHINIKU UNTO DEYUNNE SHIHITEN
Original Assignee
BARUTSUERUSU AG FUYUA HOTSUHOBAKUMUTEHINIKU UNTO DEYUNNE SHIHITEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BARUTSUERUSU AG FUYUA HOTSUHOBAKUMUTEHINIKU UNTO DEYUNNE SHIHITEN filed Critical BARUTSUERUSU AG FUYUA HOTSUHOBAKUMUTEHINIKU UNTO DEYUNNE SHIHITEN
Publication of JPS57161062A publication Critical patent/JPS57161062A/ja
Publication of JPS629188B2 publication Critical patent/JPS629188B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
JP57039259A 1981-03-13 1982-03-12 Evaporation of substance under vacuum and device Granted JPS57161062A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH171981A CH645137A5 (de) 1981-03-13 1981-03-13 Verfahren und vorrichtung zum verdampfen von material unter vakuum.

Publications (2)

Publication Number Publication Date
JPS57161062A JPS57161062A (en) 1982-10-04
JPS629188B2 true JPS629188B2 (OSRAM) 1987-02-26

Family

ID=4217002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57039259A Granted JPS57161062A (en) 1981-03-13 1982-03-12 Evaporation of substance under vacuum and device

Country Status (6)

Country Link
US (1) US4448802A (OSRAM)
JP (1) JPS57161062A (OSRAM)
CH (1) CH645137A5 (OSRAM)
DE (1) DE3206882C2 (OSRAM)
FR (1) FR2501725B1 (OSRAM)
GB (1) GB2095029B (OSRAM)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
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DE3406953C2 (de) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
JPH06101252B2 (ja) 1985-06-21 1994-12-12 旭硝子株式会社 透明電導性金属酸化物膜の形成方法
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
JPS6318063A (ja) * 1986-07-10 1988-01-25 Nippon Kokan Kk <Nkk> 真空蒸着方法
JPS6318064A (ja) * 1986-07-10 1988-01-25 Nippon Kokan Kk <Nkk> 真空蒸着方法
JPS6318058A (ja) * 1986-07-10 1988-01-25 Nippon Kokan Kk <Nkk> 真空蒸着装置
US4882198A (en) * 1986-11-26 1989-11-21 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
US4777908A (en) * 1986-11-26 1988-10-18 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
US5133845A (en) * 1986-12-12 1992-07-28 Sorin Biomedica, S.P.A. Method for making prosthesis of polymeric material coated with biocompatible carbon
GB8701414D0 (en) * 1987-01-22 1987-02-25 Matthews A Heating enhancement in physical vapour deposition
US4863581A (en) * 1987-02-12 1989-09-05 Kawasaki Steel Corp. Hollow cathode gun and deposition device for ion plating process
US4866239A (en) * 1988-05-31 1989-09-12 The Boc Group, Inc. Vapor source assembly with crucible
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
US4951604A (en) * 1989-02-17 1990-08-28 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
US5075181A (en) * 1989-05-05 1991-12-24 Kennametal Inc. High hardness/high compressive stress multilayer coated tool
DE58909591D1 (de) * 1989-08-21 1996-03-14 Balzers Hochvakuum Beschichtetes Werkstück mit einer Mischkristallbeschichtung, Verfahren zu dessen Herstellung, sowie Vorrichtung zur Durchführung des Verfahrens
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
ATE146010T1 (de) * 1990-03-01 1996-12-15 Balzers Hochvakuum Vorrichtung und verfahren zum verdampfen von material im vakuum sowie anwendung des verfahrens
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
EP0470777A3 (en) * 1990-08-07 1993-06-02 The Boc Group, Inc. Thin gas barrier films and rapid deposition method therefor
US5232318A (en) * 1990-09-17 1993-08-03 Kennametal Inc. Coated cutting tools
US5266388A (en) * 1990-09-17 1993-11-30 Kennametal Inc. Binder enriched coated cutting tool
US5325747A (en) * 1990-09-17 1994-07-05 Kennametal Inc. Method of machining using coated cutting tools
WO1992005296A1 (en) * 1990-09-17 1992-04-02 Kennametal Inc. Cvd and pvd coated cutting tools
US5250367A (en) * 1990-09-17 1993-10-05 Kennametal Inc. Binder enriched CVD and PVD coated cutting tool
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
JPH0822483B2 (ja) * 1993-08-05 1996-03-06 工業技術院長 レーザ放電誘導式放電加工装置
DE4336681C2 (de) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
US5418345A (en) * 1994-02-28 1995-05-23 United Technologies Corporation Method for forming shaped passages
DE4421045C2 (de) * 1994-06-17 1997-01-23 Dresden Vakuumtech Gmbh Einrichtung zur plamagestützten Beschichtung von Substraten, insbesondere mit elektrisch isolierendem Material
JP2655094B2 (ja) * 1994-08-30 1997-09-17 日本電気株式会社 電子銃蒸着装置
US5753319A (en) * 1995-03-08 1998-05-19 Corion Corporation Method for ion plating deposition
DE29615190U1 (de) * 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
US5750247A (en) * 1996-03-15 1998-05-12 Kennametal, Inc. Coated cutting tool having an outer layer of TiC
DE19612345C1 (de) * 1996-03-28 1997-01-16 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Hochgeschwindigkeits-Bedampfen großflächiger Substrate
DE19612344C1 (de) * 1996-03-28 1997-08-21 Fraunhofer Ges Forschung Einrichtung zur plasmaaktivierten Hochratebedampfung
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US5902462A (en) * 1997-03-27 1999-05-11 Krauss; Alan R. Filtered cathodic arc deposition apparatus and method
US6274249B1 (en) * 1997-09-12 2001-08-14 Unaxis Balzers Aktiengesellschaft Tool with tool body and protective layer system
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US6348764B1 (en) * 2000-08-17 2002-02-19 Taiwan Semiconductor Manufacturing Company, Ltd Indirect hot cathode (IHC) ion source
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
ITRM20010060A1 (it) * 2001-02-06 2001-05-07 Carlo Misiano Perfezionamento di un metodo e apparato per la deposizione di film sottili, soprattutto in condizioni reattive.
US6599584B2 (en) * 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
DE10129507C2 (de) 2001-06-19 2003-07-17 Fraunhofer Ges Forschung Einrichtung zur plasmaaktivierten Bedampfung großer Flächen
ES2250891T3 (es) * 2002-04-15 2006-04-16 The Coca-Cola Company Composicion revestimiento que contiene un aditivo epoxidico y estructuras revestidas con el mismo.
US20050181177A1 (en) * 2004-02-18 2005-08-18 Jamie Knapp Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels
RU2265077C1 (ru) * 2004-02-25 2005-11-27 Ооо "Альбатэк" Способ нанесения покрытий в вакууме и устройство для его осуществления
RU2379378C2 (ru) * 2006-07-26 2010-01-20 Дмитрий Давидович Спиваков Способ ионно-плазменного нанесения многокомпонентных пленочных покрытий и установка для его осуществления
DE102009019146B4 (de) * 2009-04-29 2014-07-24 THEVA DüNNSCHICHTTECHNIK GMBH Verfahren und Vorrichtung zur Hochratenbeschichtung durch Hochdruckverdampfen
WO2010141306A1 (en) * 2009-06-03 2010-12-09 Ixys Corporation Methods and apparatuses for converting carbon dioxide and treating waste material
CN201864770U (zh) * 2010-11-22 2011-06-15 江苏淘镜有限公司 电子枪蒸发用坩埚
US9422621B2 (en) * 2013-10-30 2016-08-23 Skyworks Solutions, Inc. Refractory metal barrier in semiconductor devices
CN112176293A (zh) * 2020-09-28 2021-01-05 杨雪 一种耐高温多弧离子真空镀膜装置及其镀膜方法

Family Cites Families (7)

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Publication number Priority date Publication date Assignee Title
NL292036A (OSRAM) * 1900-01-01
US2998376A (en) * 1956-10-29 1961-08-29 Temescal Metallurgical Corp High-vacuum evaporator
DE2519537C2 (de) * 1975-05-02 1982-11-04 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlgerät für Heiz-, Schmelz- und Verdampfungszwecke mit Ablenksystemen
DE2624005C2 (de) * 1976-05-28 1982-04-08 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zum Aufbringen von dünnen Schichten auf ein Substrat nach dem "Ion-plating"-Verfahren.
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
FR2405111A1 (fr) * 1977-10-07 1979-05-04 Thomson Csf Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede
CH619344B (de) * 1977-12-23 Balzers Hochvakuum Verfahren zur herstellung goldfarbener ueberzuege.

Also Published As

Publication number Publication date
US4448802A (en) 1984-05-15
CH645137A5 (de) 1984-09-14
JPS57161062A (en) 1982-10-04
DE3206882C2 (de) 1985-04-11
FR2501725B1 (fr) 1985-06-28
DE3206882A1 (de) 1982-10-14
GB2095029B (en) 1984-09-26
GB2095029A (en) 1982-09-22
FR2501725A1 (fr) 1982-09-17

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