ES2095880T3 - Dispositivo y procedimiento para la vaporizacion de material en vacio, asi como aplicacion del procedimiento. - Google Patents

Dispositivo y procedimiento para la vaporizacion de material en vacio, asi como aplicacion del procedimiento.

Info

Publication number
ES2095880T3
ES2095880T3 ES91102573T ES91102573T ES2095880T3 ES 2095880 T3 ES2095880 T3 ES 2095880T3 ES 91102573 T ES91102573 T ES 91102573T ES 91102573 T ES91102573 T ES 91102573T ES 2095880 T3 ES2095880 T3 ES 2095880T3
Authority
ES
Spain
Prior art keywords
procedure
vaporization
well
application
vacuum material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91102573T
Other languages
English (en)
Inventor
Erich Dr Bergmann
Helmut Dr Rudigier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25890680&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2095880(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE19904006456 external-priority patent/DE4006456C1/de
Application filed by Balzers AG filed Critical Balzers AG
Application granted granted Critical
Publication of ES2095880T3 publication Critical patent/ES2095880T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

EL OBJETIVO DE ESTA INVENCION ES LLEGAR A PRODUCIR LA INFLAMACION EN UN ARCO DE EVAPORACION, DE AL MENOS MATERIAL FUNDIDO EN SU SUPERFICIE COMO CONSECUENCIA DE LA EVAPORACION, ASI COMO SU ESTABILIZACION Y SU CONTROL. PARA ELLO SE PREVEE DE UN CAÑON DE RADIACION ELECTRONICA O DE UN LASER, PARA LA GENERACION DE UNA NUBE DE VAPOR LOCAL O UNAS MANCHAS DE MATERIAL PREFUNDIDO SOBRE LA SUPERFICIE OBJETO, Y CON ELLO PRODUCIR LA INFLAMACION DE MANCHA DE ARCO O RESPECTIVAMENTE SU CONTROL.
ES91102573T 1990-03-01 1991-02-22 Dispositivo y procedimiento para la vaporizacion de material en vacio, asi como aplicacion del procedimiento. Expired - Lifetime ES2095880T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19904006456 DE4006456C1 (en) 1990-03-01 1990-03-01 Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
DE4006458 1990-03-01

Publications (1)

Publication Number Publication Date
ES2095880T3 true ES2095880T3 (es) 1997-03-01

Family

ID=25890680

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91102573T Expired - Lifetime ES2095880T3 (es) 1990-03-01 1991-02-22 Dispositivo y procedimiento para la vaporizacion de material en vacio, asi como aplicacion del procedimiento.

Country Status (6)

Country Link
EP (1) EP0444538B2 (es)
JP (1) JPH0641727A (es)
KR (1) KR910016959A (es)
AT (1) ATE146010T1 (es)
DE (1) DE59108387D1 (es)
ES (1) ES2095880T3 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0641727B2 (ja) * 1990-11-29 1994-06-01 晏弘 奥田 内燃機関の消音器
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
DE4427585A1 (de) * 1994-08-04 1996-02-08 Leybold Ag Beschichtungsanlage zum Beschichten eines Substrates
KR100426658B1 (ko) * 2002-01-31 2004-04-13 한국수력원자력 주식회사 소형 전자총을 이용한 코팅장치
JP2010248574A (ja) * 2009-04-16 2010-11-04 Ulvac Japan Ltd 蒸着装置及び蒸着方法。
KR20150133179A (ko) * 2013-01-22 2015-11-27 니씬 일렉트릭 코.,엘티디. 플라즈마 장치, 그를 이용한 탄소 박막의 제조 방법 및 코팅 방법
DE102019135749B4 (de) * 2019-12-23 2024-02-08 Ri Research Instruments Gmbh Lichtbogen-Beschichtungsanordnung und Verfahren

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
US4829153A (en) * 1986-04-28 1989-05-09 Battelle Memorial Institute Welding arc initiator
DE3901401C2 (de) * 1988-03-01 1996-12-19 Fraunhofer Ges Forschung Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung
DD272666B5 (de) * 1988-05-31 1995-09-21 Fraunhofer Ges Forschung Verfahren zur Herstellung von Mehrfachschichten mittels Vakuum-Lichtbogenverdampfer
DD275883B5 (de) * 1988-09-29 1995-10-19 Fraunhofer Ges Forschung Verfahren zur homogenen Schichtabscheidung mittels Bogenentladung
DD277472B5 (de) * 1988-11-30 1996-01-25 Fraunhofer Ges Forschung Verfahren zum Betreiben eines Vakuum-Bogenentladungsverdampfers

Also Published As

Publication number Publication date
EP0444538B1 (de) 1996-12-04
EP0444538A3 (en) 1992-02-05
EP0444538B2 (de) 2002-04-24
ATE146010T1 (de) 1996-12-15
KR910016959A (ko) 1991-11-05
EP0444538A2 (de) 1991-09-04
DE59108387D1 (de) 1997-01-16
JPH0641727A (ja) 1994-02-15

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