JPS6244256B2 - - Google Patents

Info

Publication number
JPS6244256B2
JPS6244256B2 JP54114702A JP11470279A JPS6244256B2 JP S6244256 B2 JPS6244256 B2 JP S6244256B2 JP 54114702 A JP54114702 A JP 54114702A JP 11470279 A JP11470279 A JP 11470279A JP S6244256 B2 JPS6244256 B2 JP S6244256B2
Authority
JP
Japan
Prior art keywords
parts
resin
composition
weight
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54114702A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5546746A (en
Inventor
Piitaa Uikesurando Jon
Maikeru Puresurii Richaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of JPS5546746A publication Critical patent/JPS5546746A/ja
Publication of JPS6244256B2 publication Critical patent/JPS6244256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP11470279A 1978-09-06 1979-09-06 Positive type photosensitive composition and product thereof Granted JPS5546746A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93998978A 1978-09-06 1978-09-06

Publications (2)

Publication Number Publication Date
JPS5546746A JPS5546746A (en) 1980-04-02
JPS6244256B2 true JPS6244256B2 (enrdf_load_stackoverflow) 1987-09-18

Family

ID=25474042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11470279A Granted JPS5546746A (en) 1978-09-06 1979-09-06 Positive type photosensitive composition and product thereof

Country Status (9)

Country Link
JP (1) JPS5546746A (enrdf_load_stackoverflow)
BR (1) BR7905714A (enrdf_load_stackoverflow)
CA (1) CA1119447A (enrdf_load_stackoverflow)
DE (1) DE2935904A1 (enrdf_load_stackoverflow)
FR (1) FR2435741B1 (enrdf_load_stackoverflow)
GB (1) GB2031442B (enrdf_load_stackoverflow)
IT (1) IT1162658B (enrdf_load_stackoverflow)
LU (1) LU81652A1 (enrdf_load_stackoverflow)
NL (1) NL7906588A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS58152236A (ja) * 1982-03-05 1983-09-09 Toray Ind Inc 感光性組成物
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
US4680346A (en) * 1985-12-13 1987-07-14 Ppg Industries, Inc. Flexible primer composition and method of providing a substrate with a flexible multilayer coating
JPH0654390B2 (ja) * 1986-07-18 1994-07-20 東京応化工業株式会社 高耐熱性ポジ型ホトレジスト組成物
JPS6380254A (ja) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd 感光性組成物
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
DE3927631A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch
JP3978468B2 (ja) * 1995-11-24 2007-09-19 イーストマン コダック カンパニー 平板印刷版用親水性化基体およびその製造法
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (fr) * 1965-11-02 1968-09-06 Ferrania Spa Procédé de fabrication de matrices présensibilisées pour l'impression offset
BE789196A (fr) * 1971-09-25 1973-03-22 Kalle Ag Matiere a copier photosensible
CH576739A5 (enrdf_load_stackoverflow) * 1972-08-25 1976-06-15 Ciba Geigy Ag
AR205345A1 (es) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg Composicion organofilica fotosensible y placa litografica preparada con la misma
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end

Also Published As

Publication number Publication date
GB2031442A (en) 1980-04-23
CA1119447A (en) 1982-03-09
LU81652A1 (fr) 1980-04-21
BR7905714A (pt) 1980-05-13
FR2435741B1 (fr) 1986-10-03
GB2031442B (en) 1982-11-10
DE2935904C2 (enrdf_load_stackoverflow) 1991-03-07
IT7950175A0 (it) 1979-09-05
NL7906588A (nl) 1980-03-10
FR2435741A1 (fr) 1980-04-04
JPS5546746A (en) 1980-04-02
IT1162658B (it) 1987-04-01
DE2935904A1 (de) 1980-03-20

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