BR7905714A - Composicao e artigo sensivel a luz de acao positiva - Google Patents

Composicao e artigo sensivel a luz de acao positiva

Info

Publication number
BR7905714A
BR7905714A BR7905714A BR7905714A BR7905714A BR 7905714 A BR7905714 A BR 7905714A BR 7905714 A BR7905714 A BR 7905714A BR 7905714 A BR7905714 A BR 7905714A BR 7905714 A BR7905714 A BR 7905714A
Authority
BR
Brazil
Prior art keywords
composition
positive action
action light
article sensitive
sensitive
Prior art date
Application number
BR7905714A
Other languages
English (en)
Portuguese (pt)
Inventor
J Vikesland
R Presely
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BR7905714A publication Critical patent/BR7905714A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
BR7905714A 1978-09-06 1979-09-05 Composicao e artigo sensivel a luz de acao positiva BR7905714A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93998978A 1978-09-06 1978-09-06

Publications (1)

Publication Number Publication Date
BR7905714A true BR7905714A (pt) 1980-05-13

Family

ID=25474042

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7905714A BR7905714A (pt) 1978-09-06 1979-09-05 Composicao e artigo sensivel a luz de acao positiva

Country Status (9)

Country Link
JP (1) JPS5546746A (enrdf_load_stackoverflow)
BR (1) BR7905714A (enrdf_load_stackoverflow)
CA (1) CA1119447A (enrdf_load_stackoverflow)
DE (1) DE2935904A1 (enrdf_load_stackoverflow)
FR (1) FR2435741B1 (enrdf_load_stackoverflow)
GB (1) GB2031442B (enrdf_load_stackoverflow)
IT (1) IT1162658B (enrdf_load_stackoverflow)
LU (1) LU81652A1 (enrdf_load_stackoverflow)
NL (1) NL7906588A (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
JPS58152236A (ja) * 1982-03-05 1983-09-09 Toray Ind Inc 感光性組成物
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
US4680346A (en) * 1985-12-13 1987-07-14 Ppg Industries, Inc. Flexible primer composition and method of providing a substrate with a flexible multilayer coating
JPH0654390B2 (ja) * 1986-07-18 1994-07-20 東京応化工業株式会社 高耐熱性ポジ型ホトレジスト組成物
JPS6380254A (ja) * 1986-09-24 1988-04-11 Fuji Photo Film Co Ltd 感光性組成物
JPS6463856A (en) * 1987-05-12 1989-03-09 Sumitomo Metal Ind Method and apparatus for automatic ultrasonic flaw detection of pipe end
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
DE3927631A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch
WO1997019819A1 (en) * 1995-11-24 1997-06-05 Horsell Graphic Industries Limited Hydrophilized support for planographic printing plates and its preparation
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (fr) * 1965-11-02 1968-09-06 Ferrania Spa Procédé de fabrication de matrices présensibilisées pour l'impression offset
BE789196A (fr) * 1971-09-25 1973-03-22 Kalle Ag Matiere a copier photosensible
CH576739A5 (enrdf_load_stackoverflow) * 1972-08-25 1976-06-15 Ciba Geigy Ag
AR205345A1 (es) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg Composicion organofilica fotosensible y placa litografica preparada con la misma
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse

Also Published As

Publication number Publication date
FR2435741A1 (fr) 1980-04-04
IT7950175A0 (it) 1979-09-05
NL7906588A (nl) 1980-03-10
LU81652A1 (fr) 1980-04-21
GB2031442B (en) 1982-11-10
FR2435741B1 (fr) 1986-10-03
DE2935904A1 (de) 1980-03-20
DE2935904C2 (enrdf_load_stackoverflow) 1991-03-07
CA1119447A (en) 1982-03-09
JPS5546746A (en) 1980-04-02
GB2031442A (en) 1980-04-23
IT1162658B (it) 1987-04-01
JPS6244256B2 (enrdf_load_stackoverflow) 1987-09-18

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Legal Events

Date Code Title Description
MK Patent expired

Effective date: 19940905