JPS62201903A - 光開始剤ペ−スト - Google Patents

光開始剤ペ−スト

Info

Publication number
JPS62201903A
JPS62201903A JP4282586A JP4282586A JPS62201903A JP S62201903 A JPS62201903 A JP S62201903A JP 4282586 A JP4282586 A JP 4282586A JP 4282586 A JP4282586 A JP 4282586A JP S62201903 A JPS62201903 A JP S62201903A
Authority
JP
Japan
Prior art keywords
photoinitiator
parts
paste
acrylate
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4282586A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564641B2 (enExample
Inventor
Hideo Nakamoto
中本 英夫
Fumito Aozai
青才 文人
Hiroshi Fukushima
福島 洋
Osamu Takemoto
竹本 脩
Eriko Suda
須田 恵理子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP4282586A priority Critical patent/JPS62201903A/ja
Publication of JPS62201903A publication Critical patent/JPS62201903A/ja
Publication of JPH0564641B2 publication Critical patent/JPH0564641B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP4282586A 1986-03-01 1986-03-01 光開始剤ペ−スト Granted JPS62201903A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4282586A JPS62201903A (ja) 1986-03-01 1986-03-01 光開始剤ペ−スト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4282586A JPS62201903A (ja) 1986-03-01 1986-03-01 光開始剤ペ−スト

Publications (2)

Publication Number Publication Date
JPS62201903A true JPS62201903A (ja) 1987-09-05
JPH0564641B2 JPH0564641B2 (enExample) 1993-09-16

Family

ID=12646733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4282586A Granted JPS62201903A (ja) 1986-03-01 1986-03-01 光開始剤ペ−スト

Country Status (1)

Country Link
JP (1) JPS62201903A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023012154A (ja) * 2021-07-13 2023-01-25 アイカ工業株式会社 光硬化性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023012154A (ja) * 2021-07-13 2023-01-25 アイカ工業株式会社 光硬化性樹脂組成物

Also Published As

Publication number Publication date
JPH0564641B2 (enExample) 1993-09-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees