JPS6216534B2 - - Google Patents

Info

Publication number
JPS6216534B2
JPS6216534B2 JP54013711A JP1371179A JPS6216534B2 JP S6216534 B2 JPS6216534 B2 JP S6216534B2 JP 54013711 A JP54013711 A JP 54013711A JP 1371179 A JP1371179 A JP 1371179A JP S6216534 B2 JPS6216534 B2 JP S6216534B2
Authority
JP
Japan
Prior art keywords
electron beam
resist film
beam resist
electrode
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54013711A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55105326A (en
Inventor
Yoshihiro Todokoro
Setsuko Takeda
Yoshihisa Kawamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP1371179A priority Critical patent/JPS55105326A/ja
Publication of JPS55105326A publication Critical patent/JPS55105326A/ja
Publication of JPS6216534B2 publication Critical patent/JPS6216534B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
JP1371179A 1979-02-07 1979-02-07 Manufacturing method of electrode of semiconductor device Granted JPS55105326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1371179A JPS55105326A (en) 1979-02-07 1979-02-07 Manufacturing method of electrode of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1371179A JPS55105326A (en) 1979-02-07 1979-02-07 Manufacturing method of electrode of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55105326A JPS55105326A (en) 1980-08-12
JPS6216534B2 true JPS6216534B2 (show.php) 1987-04-13

Family

ID=11840809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1371179A Granted JPS55105326A (en) 1979-02-07 1979-02-07 Manufacturing method of electrode of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55105326A (show.php)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5646536A (en) * 1979-09-22 1981-04-27 Nippon Telegr & Teleph Corp <Ntt> Formation of microminiature electrode
JPS5814577A (ja) * 1981-07-17 1983-01-27 Fujitsu Ltd 電界効果型半導体装置の製造方法
JPS58153375A (ja) * 1982-03-08 1983-09-12 Oki Electric Ind Co Ltd 半導体素子の製造方法
JPS58199567A (ja) * 1982-05-17 1983-11-19 Toshiba Corp シヨツトキ障壁型電界効果トランジスタ及びその製造方法
JPS60145673A (ja) * 1984-01-09 1985-08-01 Mitsubishi Electric Corp 半導体装置の製造方法
JPH0630361B2 (ja) * 1984-09-21 1994-04-20 富士通株式会社 パターン形成方法
JPS61104675A (ja) * 1984-10-29 1986-05-22 Fujitsu Ltd 半導体装置の製造方法
JPS61125176A (ja) * 1984-11-22 1986-06-12 Nec Corp 半導体装置の製造方法
JP2612836B2 (ja) * 1987-09-23 1997-05-21 シーメンス、アクチエンゲゼルシヤフト 自己整合ゲートを備えるｍｅｓｆｅｔの製造方法
JP2661237B2 (ja) * 1989-02-08 1997-10-08 三菱電機株式会社 パターン形成方法
JP2667250B2 (ja) * 1989-06-15 1997-10-27 松下電子工業株式会社 半導体装置の製造方法
US5053348A (en) * 1989-12-01 1991-10-01 Hughes Aircraft Company Fabrication of self-aligned, t-gate hemt
KR920007357B1 (ko) * 1990-03-12 1992-08-31 재단법인 한국전자통신연구소 내열성 게이트를 이용한 갈륨비소 반도체 소자의 제조방법
JP2626558B2 (ja) * 1994-06-13 1997-07-02 日本電気株式会社 Ｔ型ゲート電極の作製方法
JP2746539B2 (ja) * 1994-12-19 1998-05-06 韓國電子通信研究院 電界効果トランジスタのゲート形成方法とその形成領域の形成方法
US7892903B2 (en) * 2004-02-23 2011-02-22 Asml Netherlands B.V. Device manufacturing method and substrate comprising multiple resist layers

Also Published As

Publication number Publication date
JPS55105326A (en) 1980-08-12

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