JPS6213813B2 - - Google Patents
Info
- Publication number
- JPS6213813B2 JPS6213813B2 JP5577278A JP5577278A JPS6213813B2 JP S6213813 B2 JPS6213813 B2 JP S6213813B2 JP 5577278 A JP5577278 A JP 5577278A JP 5577278 A JP5577278 A JP 5577278A JP S6213813 B2 JPS6213813 B2 JP S6213813B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- negative
- positive
- resist layer
- sensitive resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 9
- 238000009832 plasma treatment Methods 0.000 claims description 2
- 230000000415 inactivating effect Effects 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 46
- 239000007789 gas Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 230000008094 contradictory effect Effects 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000002779 inactivation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5577278A JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5577278A JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54146966A JPS54146966A (en) | 1979-11-16 |
| JPS6213813B2 true JPS6213813B2 (enrdf_load_stackoverflow) | 1987-03-28 |
Family
ID=13008156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5577278A Granted JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54146966A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03108619U (enrdf_load_stackoverflow) * | 1990-02-23 | 1991-11-08 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56111226A (en) * | 1980-02-07 | 1981-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
| JPS5842231A (ja) * | 1981-09-08 | 1983-03-11 | Fujitsu Ltd | パターン形成方法 |
| JPS58100428A (ja) * | 1981-12-10 | 1983-06-15 | Matsushita Electronics Corp | パタ−ン形成方法 |
| JPS61214435A (ja) * | 1985-03-19 | 1986-09-24 | Rohm Co Ltd | 半導体のホトリソグラフィー方法 |
-
1978
- 1978-05-10 JP JP5577278A patent/JPS54146966A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03108619U (enrdf_load_stackoverflow) * | 1990-02-23 | 1991-11-08 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54146966A (en) | 1979-11-16 |
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