JPS6172682A - 磁気ヘツド用ジルコニア基板 - Google Patents
磁気ヘツド用ジルコニア基板Info
- Publication number
- JPS6172682A JPS6172682A JP59192356A JP19235684A JPS6172682A JP S6172682 A JPS6172682 A JP S6172682A JP 59192356 A JP59192356 A JP 59192356A JP 19235684 A JP19235684 A JP 19235684A JP S6172682 A JPS6172682 A JP S6172682A
- Authority
- JP
- Japan
- Prior art keywords
- density
- magnetic
- magnetic head
- substrate
- zirconia substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims description 31
- 239000000758 substrate Substances 0.000 title claims description 22
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 238000005245 sintering Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 229910052593 corundum Inorganic materials 0.000 description 8
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910001845 yogo sapphire Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 208000028341 floppy head Diseases 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 229910020018 Nb Zr Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000001272 pressureless sintering Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 102220531842 Protein MAL2_T11P_mutation Human genes 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000011549 displacement method Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- -1 oxygen ion Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59192356A JPS6172682A (ja) | 1984-09-13 | 1984-09-13 | 磁気ヘツド用ジルコニア基板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59192356A JPS6172682A (ja) | 1984-09-13 | 1984-09-13 | 磁気ヘツド用ジルコニア基板 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28028485A Division JPS61142520A (ja) | 1985-12-13 | 1985-12-13 | 薄膜磁気ヘツド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6172682A true JPS6172682A (ja) | 1986-04-14 |
| JPH0122229B2 JPH0122229B2 (enrdf_load_stackoverflow) | 1989-04-25 |
Family
ID=16289913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59192356A Granted JPS6172682A (ja) | 1984-09-13 | 1984-09-13 | 磁気ヘツド用ジルコニア基板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6172682A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63279410A (ja) * | 1987-05-11 | 1988-11-16 | Sony Corp | 薄膜磁気ヘッド |
| JPS64351U (enrdf_load_stackoverflow) * | 1987-06-19 | 1989-01-05 | ||
| JP2008094688A (ja) * | 2006-10-16 | 2008-04-24 | Nitsukatoo:Kk | ジルコニア質導電性焼結体 |
| JP2013505884A (ja) * | 2009-09-10 | 2013-02-21 | 中国砿業大学（北京） | 複合焼結助剤及びそれを用いて低温でナノ結晶セラミックを製造する方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6077406A (ja) * | 1983-10-04 | 1985-05-02 | Hitachi Metals Ltd | 薄膜磁気ヘツド用基板及びその製造方法 |
-
1984
- 1984-09-13 JP JP59192356A patent/JPS6172682A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6077406A (ja) * | 1983-10-04 | 1985-05-02 | Hitachi Metals Ltd | 薄膜磁気ヘツド用基板及びその製造方法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63279410A (ja) * | 1987-05-11 | 1988-11-16 | Sony Corp | 薄膜磁気ヘッド |
| JPS64351U (enrdf_load_stackoverflow) * | 1987-06-19 | 1989-01-05 | ||
| JP2008094688A (ja) * | 2006-10-16 | 2008-04-24 | Nitsukatoo:Kk | ジルコニア質導電性焼結体 |
| JP2013505884A (ja) * | 2009-09-10 | 2013-02-21 | 中国砿業大学（北京） | 複合焼結助剤及びそれを用いて低温でナノ結晶セラミックを製造する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0122229B2 (enrdf_load_stackoverflow) | 1989-04-25 |
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