JPS6147678A - 接合形成用レジストステンシルパタ−ンの作製方法 - Google Patents

接合形成用レジストステンシルパタ−ンの作製方法

Info

Publication number
JPS6147678A
JPS6147678A JP59169207A JP16920784A JPS6147678A JP S6147678 A JPS6147678 A JP S6147678A JP 59169207 A JP59169207 A JP 59169207A JP 16920784 A JP16920784 A JP 16920784A JP S6147678 A JPS6147678 A JP S6147678A
Authority
JP
Japan
Prior art keywords
film
resist
forming
thickness
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59169207A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0210589B2 (enrdf_load_stackoverflow
Inventor
Koji Yamada
宏治 山田
Yoshinobu Taruya
良信 樽谷
Shinichiro Yano
振一郎 矢野
Nobuo Miyamoto
信雄 宮本
Mikio Hirano
幹夫 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP59169207A priority Critical patent/JPS6147678A/ja
Publication of JPS6147678A publication Critical patent/JPS6147678A/ja
Publication of JPH0210589B2 publication Critical patent/JPH0210589B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Drying Of Semiconductors (AREA)
JP59169207A 1984-08-15 1984-08-15 接合形成用レジストステンシルパタ−ンの作製方法 Granted JPS6147678A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59169207A JPS6147678A (ja) 1984-08-15 1984-08-15 接合形成用レジストステンシルパタ−ンの作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59169207A JPS6147678A (ja) 1984-08-15 1984-08-15 接合形成用レジストステンシルパタ−ンの作製方法

Publications (2)

Publication Number Publication Date
JPS6147678A true JPS6147678A (ja) 1986-03-08
JPH0210589B2 JPH0210589B2 (enrdf_load_stackoverflow) 1990-03-08

Family

ID=15882185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59169207A Granted JPS6147678A (ja) 1984-08-15 1984-08-15 接合形成用レジストステンシルパタ−ンの作製方法

Country Status (1)

Country Link
JP (1) JPS6147678A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01106482A (ja) * 1987-10-20 1989-04-24 Fujitsu Ltd 超伝導材料構造
JPH07148733A (ja) * 1993-07-22 1995-06-13 Owens Illinois Closure Inc プラスチックペレット送出しシステム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01106482A (ja) * 1987-10-20 1989-04-24 Fujitsu Ltd 超伝導材料構造
JPH07148733A (ja) * 1993-07-22 1995-06-13 Owens Illinois Closure Inc プラスチックペレット送出しシステム

Also Published As

Publication number Publication date
JPH0210589B2 (enrdf_load_stackoverflow) 1990-03-08

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Legal Events

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