JPS6136381B2 - - Google Patents

Info

Publication number
JPS6136381B2
JPS6136381B2 JP53123628A JP12362878A JPS6136381B2 JP S6136381 B2 JPS6136381 B2 JP S6136381B2 JP 53123628 A JP53123628 A JP 53123628A JP 12362878 A JP12362878 A JP 12362878A JP S6136381 B2 JPS6136381 B2 JP S6136381B2
Authority
JP
Japan
Prior art keywords
silicon
film
groove
oxide film
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53123628A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5550636A (en
Inventor
Hisao Nakajima
Akira Sato
Tokuo Kure
Akira Shintani
Masao Kawamura
Masanobu Myao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12362878A priority Critical patent/JPS5550636A/ja
Publication of JPS5550636A publication Critical patent/JPS5550636A/ja
Publication of JPS6136381B2 publication Critical patent/JPS6136381B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)
  • Recrystallisation Techniques (AREA)
  • Local Oxidation Of Silicon (AREA)
JP12362878A 1978-10-09 1978-10-09 Preparation of semiconductor device Granted JPS5550636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12362878A JPS5550636A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12362878A JPS5550636A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5550636A JPS5550636A (en) 1980-04-12
JPS6136381B2 true JPS6136381B2 (enExample) 1986-08-18

Family

ID=14865281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12362878A Granted JPS5550636A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5550636A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259886U (enExample) * 1988-10-17 1990-05-01

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939581U (ja) * 1982-09-02 1984-03-13 三洋電機株式会社 白バランス補正回路
JPH0782996B2 (ja) * 1986-03-28 1995-09-06 キヤノン株式会社 結晶の形成方法
JP2670442B2 (ja) * 1986-03-31 1997-10-29 キヤノン株式会社 結晶の形成方法
JP2670453B2 (ja) * 1988-03-27 1997-10-29 キヤノン株式会社 結晶の形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259886U (enExample) * 1988-10-17 1990-05-01

Also Published As

Publication number Publication date
JPS5550636A (en) 1980-04-12

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