JPS61292600A - X線光学系 - Google Patents
X線光学系Info
- Publication number
- JPS61292600A JPS61292600A JP13494785A JP13494785A JPS61292600A JP S61292600 A JPS61292600 A JP S61292600A JP 13494785 A JP13494785 A JP 13494785A JP 13494785 A JP13494785 A JP 13494785A JP S61292600 A JPS61292600 A JP S61292600A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- rays
- ray
- curved
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13494785A JPS61292600A (ja) | 1985-06-20 | 1985-06-20 | X線光学系 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13494785A JPS61292600A (ja) | 1985-06-20 | 1985-06-20 | X線光学系 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61292600A true JPS61292600A (ja) | 1986-12-23 |
| JPH0511600B2 JPH0511600B2 (cs) | 1993-02-15 |
Family
ID=15140280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13494785A Granted JPS61292600A (ja) | 1985-06-20 | 1985-06-20 | X線光学系 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61292600A (cs) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01117252A (ja) * | 1987-10-30 | 1989-05-10 | Hamamatsu Photonics Kk | X線像観察装置 |
| US5055679A (en) * | 1989-01-06 | 1991-10-08 | Hitachi, Ltd. | Surface analysis method and apparatus |
| US5241426A (en) * | 1991-04-26 | 1993-08-31 | Olympus Optical Co., Ltd. | Condenser optical system |
| US5291339A (en) * | 1990-11-30 | 1994-03-01 | Olympus Optical Co., Ltd. | Schwarzschild optical system |
| JP2005115108A (ja) * | 2003-10-09 | 2005-04-28 | Sony Corp | 表示装置および方法、並びに撮像装置および方法 |
| JP2012242165A (ja) * | 2011-05-17 | 2012-12-10 | Hamamatsu Photonics Kk | X線装置 |
-
1985
- 1985-06-20 JP JP13494785A patent/JPS61292600A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01117252A (ja) * | 1987-10-30 | 1989-05-10 | Hamamatsu Photonics Kk | X線像観察装置 |
| US5055679A (en) * | 1989-01-06 | 1991-10-08 | Hitachi, Ltd. | Surface analysis method and apparatus |
| US5291339A (en) * | 1990-11-30 | 1994-03-01 | Olympus Optical Co., Ltd. | Schwarzschild optical system |
| US5241426A (en) * | 1991-04-26 | 1993-08-31 | Olympus Optical Co., Ltd. | Condenser optical system |
| JP2005115108A (ja) * | 2003-10-09 | 2005-04-28 | Sony Corp | 表示装置および方法、並びに撮像装置および方法 |
| JP2012242165A (ja) * | 2011-05-17 | 2012-12-10 | Hamamatsu Photonics Kk | X線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0511600B2 (cs) | 1993-02-15 |
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