JPS61205619A - 耐熱性酸化亜鉛透明導電膜 - Google Patents

耐熱性酸化亜鉛透明導電膜

Info

Publication number
JPS61205619A
JPS61205619A JP60046782A JP4678285A JPS61205619A JP S61205619 A JPS61205619 A JP S61205619A JP 60046782 A JP60046782 A JP 60046782A JP 4678285 A JP4678285 A JP 4678285A JP S61205619 A JPS61205619 A JP S61205619A
Authority
JP
Japan
Prior art keywords
zinc oxide
conductive film
transparent conductive
oxide transparent
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60046782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0372011B2 (enFirst
Inventor
Uchitsugu Minami
内嗣 南
Shinzo Takada
新三 高田
Hidehito Nanto
秀仁 南戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OSAKA TOKUSHU GOKIN KK
Original Assignee
OSAKA TOKUSHU GOKIN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OSAKA TOKUSHU GOKIN KK filed Critical OSAKA TOKUSHU GOKIN KK
Priority to JP60046782A priority Critical patent/JPS61205619A/ja
Publication of JPS61205619A publication Critical patent/JPS61205619A/ja
Publication of JPH0372011B2 publication Critical patent/JPH0372011B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP60046782A 1985-03-08 1985-03-08 耐熱性酸化亜鉛透明導電膜 Granted JPS61205619A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60046782A JPS61205619A (ja) 1985-03-08 1985-03-08 耐熱性酸化亜鉛透明導電膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60046782A JPS61205619A (ja) 1985-03-08 1985-03-08 耐熱性酸化亜鉛透明導電膜

Publications (2)

Publication Number Publication Date
JPS61205619A true JPS61205619A (ja) 1986-09-11
JPH0372011B2 JPH0372011B2 (enFirst) 1991-11-15

Family

ID=12756897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60046782A Granted JPS61205619A (ja) 1985-03-08 1985-03-08 耐熱性酸化亜鉛透明導電膜

Country Status (1)

Country Link
JP (1) JPS61205619A (enFirst)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433811A (en) * 1987-04-04 1989-02-03 Gunze Kk Transparent conductive film and its manufacture
JPH01201021A (ja) * 1988-02-04 1989-08-14 Bridgestone Corp 熱線遮蔽材料及び熱線遮蔽ガラス
JPH01242417A (ja) * 1988-03-25 1989-09-27 Mitsubishi Metal Corp 透明導電性酸化亜鉛膜の製造方法
US5776353A (en) * 1996-02-16 1998-07-07 Advanced Minerals Corporation Advanced composite filtration media
US5972527A (en) * 1992-12-15 1999-10-26 Idemitsu Kosan Co., Ltd. Transparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive material
WO2003022954A1 (fr) * 2001-09-10 2003-03-20 Japan Represented By President Of Tokyo Institute Of Technology Procédé de production de matériau absorbant les ultraviolets
WO2007108266A1 (ja) 2006-03-17 2007-09-27 Nippon Mining & Metals Co., Ltd. 酸化亜鉛系透明導電体及び同透明導電体形成用スパッタリングターゲット
JP2007280910A (ja) * 2006-04-03 2007-10-25 Ind Technol Res Inst 金属ナノ粒子を含むアルミニウム添加亜鉛酸化物透明導電膜とその製造方法
WO2008023482A1 (fr) 2006-08-24 2008-02-28 Nippon Mining & Metals Co., Ltd. conducteur électrique transparent à base d'oxyde de zinc, cible de pulvérisation cathodique pour former le conducteur et processus de fabrication de la cible
JPWO2006090806A1 (ja) * 2005-02-24 2008-07-24 積水化学工業株式会社 ガリウム含有酸化亜鉛
JP2009114538A (ja) * 2007-10-19 2009-05-28 Hakusui Tech Co Ltd 酸化亜鉛系薄膜製造用のイオンプレーティング用ターゲット
JP2009132998A (ja) * 2007-10-30 2009-06-18 Mitsubishi Materials Corp ＺｎＯスパッタリングターゲットとその製造方法
JP2009132997A (ja) * 2007-10-30 2009-06-18 Mitsubishi Materials Corp ＺｎＯ蒸着材とその製造方法
US8197908B2 (en) 2008-03-14 2012-06-12 Hestia Tec, Llc Method for preparing electrically conducting materials
JP2012144409A (ja) * 2011-01-14 2012-08-02 Tosoh Corp 酸化物焼結体、それから成るターゲットおよび透明導電膜
US8895427B2 (en) 2008-09-04 2014-11-25 Kaneka Corporation Substrate having a transparent electrode and method for producing the same
JPWO2016092902A1 (ja) * 2014-12-09 2017-09-21 リンテック株式会社 透明導電膜及び透明導電膜の製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867636B2 (en) * 2006-01-11 2011-01-11 Murata Manufacturing Co., Ltd. Transparent conductive film and method for manufacturing the same
CN101496117B (zh) * 2006-07-28 2012-04-18 株式会社爱发科 透明导电膜的成膜方法
CN101522569B (zh) 2006-10-06 2012-02-15 堺化学工业株式会社 超微粒氧化锌及其制造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023918A (enFirst) * 1973-07-02 1975-03-14
JPS515360A (ja) * 1974-07-02 1976-01-17 Yoshiaki Sakai Horiesuterukeshobanno seizoho

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023918A (enFirst) * 1973-07-02 1975-03-14
JPS515360A (ja) * 1974-07-02 1976-01-17 Yoshiaki Sakai Horiesuterukeshobanno seizoho

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433811A (en) * 1987-04-04 1989-02-03 Gunze Kk Transparent conductive film and its manufacture
JPH01201021A (ja) * 1988-02-04 1989-08-14 Bridgestone Corp 熱線遮蔽材料及び熱線遮蔽ガラス
JPH01242417A (ja) * 1988-03-25 1989-09-27 Mitsubishi Metal Corp 透明導電性酸化亜鉛膜の製造方法
US5972527A (en) * 1992-12-15 1999-10-26 Idemitsu Kosan Co., Ltd. Transparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive material
US5776353A (en) * 1996-02-16 1998-07-07 Advanced Minerals Corporation Advanced composite filtration media
WO2003022954A1 (fr) * 2001-09-10 2003-03-20 Japan Represented By President Of Tokyo Institute Of Technology Procédé de production de matériau absorbant les ultraviolets
JPWO2006090806A1 (ja) * 2005-02-24 2008-07-24 積水化学工業株式会社 ガリウム含有酸化亜鉛
WO2007108266A1 (ja) 2006-03-17 2007-09-27 Nippon Mining & Metals Co., Ltd. 酸化亜鉛系透明導電体及び同透明導電体形成用スパッタリングターゲット
JP2007280910A (ja) * 2006-04-03 2007-10-25 Ind Technol Res Inst 金属ナノ粒子を含むアルミニウム添加亜鉛酸化物透明導電膜とその製造方法
WO2008023482A1 (fr) 2006-08-24 2008-02-28 Nippon Mining & Metals Co., Ltd. conducteur électrique transparent à base d'oxyde de zinc, cible de pulvérisation cathodique pour former le conducteur et processus de fabrication de la cible
JP2009114538A (ja) * 2007-10-19 2009-05-28 Hakusui Tech Co Ltd 酸化亜鉛系薄膜製造用のイオンプレーティング用ターゲット
JP2009132998A (ja) * 2007-10-30 2009-06-18 Mitsubishi Materials Corp ＺｎＯスパッタリングターゲットとその製造方法
JP2009132997A (ja) * 2007-10-30 2009-06-18 Mitsubishi Materials Corp ＺｎＯ蒸着材とその製造方法
US8197908B2 (en) 2008-03-14 2012-06-12 Hestia Tec, Llc Method for preparing electrically conducting materials
US8895427B2 (en) 2008-09-04 2014-11-25 Kaneka Corporation Substrate having a transparent electrode and method for producing the same
JP2012144409A (ja) * 2011-01-14 2012-08-02 Tosoh Corp 酸化物焼結体、それから成るターゲットおよび透明導電膜
JPWO2016092902A1 (ja) * 2014-12-09 2017-09-21 リンテック株式会社 透明導電膜及び透明導電膜の製造方法

Also Published As

Publication number Publication date
JPH0372011B2 (enFirst) 1991-11-15

Similar Documents

Publication Publication Date Title
JPS61205619A (ja) 耐熱性酸化亜鉛透明導電膜
US3655545A (en) Post heating of sputtered metal oxide films
JPS62122011A (ja) 透明導電膜の製造方法
JPH05334924A (ja) 透明導電薄膜の製造法
JPH06187833A (ja) 透明導電膜
JP3616128B2 (ja) 透明導電膜の製造方法
CN1308482C (zh) 相变温度可调的氧化钒薄膜的制备方法
JPH056766B2 (enFirst)
JP2917432B2 (ja) 電導性ガラスの製造方法
JPH0987833A (ja) 透明導電膜の製造方法
JPH1083719A (ja) 透明導電膜
CN108588661B (zh) 一种采用低价钒种子层优化氧化钒薄膜性能的方法
Lee et al. Heat treatment effects on electrical and optical properties of ternary compound In 2 O 3–ZnO films
JPH0784654B2 (ja) Ｉｔｏ透明導電膜用スパッタリングターゲットの製造方法
JPH054768B2 (enFirst)
JPH0641723A (ja) 透明導電膜
JPH0668713A (ja) 透明導電膜
JP2017193755A (ja) 透明導電膜の製造方法、及び透明導電膜
JP3058278B2 (ja) 酸化物焼結体及びその用途
JPH02163363A (ja) 透明導電膜の製造方法
Tsunashima et al. Preparation of tin-doped indium oxide thin films by thermal decomposition of metal octanoates
JPH01283369A (ja) Ｉｔｏ透明導電膜形成用スパッタリングターゲット
JPH0452566B2 (enFirst)
JP2005135824A (ja) 透明電極及びその製造方法
JPH0765167B2 (ja) Ｉｔｏ透明導電膜用スパッタリングターゲット