JPS6120322A - 水銀灯による半導体ウエハ−材料の露光方法 - Google Patents

水銀灯による半導体ウエハ−材料の露光方法

Info

Publication number
JPS6120322A
JPS6120322A JP59139773A JP13977384A JPS6120322A JP S6120322 A JPS6120322 A JP S6120322A JP 59139773 A JP59139773 A JP 59139773A JP 13977384 A JP13977384 A JP 13977384A JP S6120322 A JPS6120322 A JP S6120322A
Authority
JP
Japan
Prior art keywords
mercury lamp
power consumption
exposure
semiconductor wafer
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59139773A
Other languages
English (en)
Japanese (ja)
Inventor
Takehiro Kira
健裕 吉良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP59139773A priority Critical patent/JPS6120322A/ja
Priority to FR8502941A priority patent/FR2567279B1/fr
Priority to GB08506122A priority patent/GB2161283B/en
Priority to DE19853510522 priority patent/DE3510522A1/de
Priority to NL8501932A priority patent/NL8501932A/nl
Publication of JPS6120322A publication Critical patent/JPS6120322A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59139773A 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法 Pending JPS6120322A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59139773A JPS6120322A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法
FR8502941A FR2567279B1 (fr) 1984-07-07 1985-02-28 Procede d'exposition d'une pastille de semi-conducteur par une lampe a vapeur de mercure
GB08506122A GB2161283B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor
DE19853510522 DE3510522A1 (de) 1984-07-07 1985-03-22 Verfahren zur belichtung einer halbleiterwafer mittels einer quecksilberdampflampe
NL8501932A NL8501932A (nl) 1984-07-07 1985-07-05 Werkwijze voor het belichten van een halfgeleiderplak door middel van een kwikdamplamp en een inrichting voor het uitvoeren van de werkwijze.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139773A JPS6120322A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Publications (1)

Publication Number Publication Date
JPS6120322A true JPS6120322A (ja) 1986-01-29

Family

ID=15253074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59139773A Pending JPS6120322A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Country Status (5)

Country Link
JP (1) JPS6120322A (fr)
DE (1) DE3510522A1 (fr)
FR (1) FR2567279B1 (fr)
GB (1) GB2161283B (fr)
NL (1) NL8501932A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0143814B1 (ko) * 1995-03-28 1998-07-01 이대원 반도체 노광 장치
JP3517583B2 (ja) 1998-03-27 2004-04-12 キヤノン株式会社 露光装置、デバイス製造方法及び放電灯

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143411A (en) * 1975-05-19 1976-12-09 Optical Ass Exposure device
JPS5450270A (en) * 1977-09-09 1979-04-20 Shii Hoiraa Koubarii Constant intensity light source
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
JPS5858730A (ja) * 1981-10-05 1983-04-07 Hitachi Ltd 投影露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2422280A (en) * 1944-07-24 1947-06-17 Curtis Helene Ind Inc Fluorescent illumination
US3813576A (en) * 1972-07-21 1974-05-28 Rca Corp Series regulated power supply for arc discharge lamps utilizing incandescent lamps
GB2014335B (en) * 1978-02-14 1982-06-03 Kasper Instruments Apparatus for prolonging lamp life by minimizing power requirement levels

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143411A (en) * 1975-05-19 1976-12-09 Optical Ass Exposure device
JPS5450270A (en) * 1977-09-09 1979-04-20 Shii Hoiraa Koubarii Constant intensity light source
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
JPS5858730A (ja) * 1981-10-05 1983-04-07 Hitachi Ltd 投影露光装置

Also Published As

Publication number Publication date
GB2161283A (en) 1986-01-08
FR2567279A1 (fr) 1986-01-10
NL8501932A (nl) 1986-02-03
GB2161283B (en) 1988-09-07
FR2567279B1 (fr) 1990-12-28
DE3510522A1 (de) 1986-02-27
GB8506122D0 (en) 1985-04-11

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