GB2161283B - Method of exposing a semiconductor wafer to light from a mercury-vapor - Google Patents

Method of exposing a semiconductor wafer to light from a mercury-vapor

Info

Publication number
GB2161283B
GB2161283B GB08506122A GB8506122A GB2161283B GB 2161283 B GB2161283 B GB 2161283B GB 08506122 A GB08506122 A GB 08506122A GB 8506122 A GB8506122 A GB 8506122A GB 2161283 B GB2161283 B GB 2161283B
Authority
GB
United Kingdom
Prior art keywords
mercury
exposing
vapor
light
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08506122A
Other versions
GB8506122D0 (en
GB2161283A (en
Inventor
Takehiro Kira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of GB8506122D0 publication Critical patent/GB8506122D0/en
Publication of GB2161283A publication Critical patent/GB2161283A/en
Application granted granted Critical
Publication of GB2161283B publication Critical patent/GB2161283B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08506122A 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor Expired GB2161283B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139773A JPS6120322A (en) 1984-07-07 1984-07-07 Method for exposing material of semiconductor wafer by mercury lamp

Publications (3)

Publication Number Publication Date
GB8506122D0 GB8506122D0 (en) 1985-04-11
GB2161283A GB2161283A (en) 1986-01-08
GB2161283B true GB2161283B (en) 1988-09-07

Family

ID=15253074

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08506122A Expired GB2161283B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor

Country Status (5)

Country Link
JP (1) JPS6120322A (en)
DE (1) DE3510522A1 (en)
FR (1) FR2567279B1 (en)
GB (1) GB2161283B (en)
NL (1) NL8501932A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0143814B1 (en) * 1995-03-28 1998-07-01 이대원 Semiconductor exposure equipment
JP3517583B2 (en) * 1998-03-27 2004-04-12 キヤノン株式会社 Exposure apparatus, device manufacturing method, and discharge lamp

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2422280A (en) * 1944-07-24 1947-06-17 Curtis Helene Ind Inc Fluorescent illumination
US3813576A (en) * 1972-07-21 1974-05-28 Rca Corp Series regulated power supply for arc discharge lamps utilizing incandescent lamps
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
US4190795A (en) * 1977-09-09 1980-02-26 Coberly & Associates Constant intensity light source
GB2014335B (en) * 1978-02-14 1982-06-03 Kasper Instruments Apparatus for prolonging lamp life by minimizing power requirement levels
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
JPS5858730A (en) * 1981-10-05 1983-04-07 Hitachi Ltd Projection alligner

Also Published As

Publication number Publication date
JPS6120322A (en) 1986-01-29
FR2567279A1 (en) 1986-01-10
FR2567279B1 (en) 1990-12-28
DE3510522A1 (en) 1986-02-27
GB8506122D0 (en) 1985-04-11
NL8501932A (en) 1986-02-03
GB2161283A (en) 1986-01-08

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050307