JPS6068339A - リソグラフィ−用マスク構造体 - Google Patents

リソグラフィ−用マスク構造体

Info

Publication number
JPS6068339A
JPS6068339A JP58177285A JP17728583A JPS6068339A JP S6068339 A JPS6068339 A JP S6068339A JP 58177285 A JP58177285 A JP 58177285A JP 17728583 A JP17728583 A JP 17728583A JP S6068339 A JPS6068339 A JP S6068339A
Authority
JP
Japan
Prior art keywords
mask
holding
thin film
lithography
holding substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58177285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0563932B2 (enrdf_load_stackoverflow
Inventor
Hideo Kato
日出夫 加藤
Hirofumi Shibata
浩文 柴田
Keiko Matsushita
松下　啓子
Osamu Takamatsu
修 高松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58177285A priority Critical patent/JPS6068339A/ja
Priority to DE19843435177 priority patent/DE3435177A1/de
Priority to GB08424300A priority patent/GB2148539B/en
Publication of JPS6068339A publication Critical patent/JPS6068339A/ja
Priority to US07/398,309 priority patent/US4956249A/en
Priority to US07/534,875 priority patent/US5112707A/en
Publication of JPH0563932B2 publication Critical patent/JPH0563932B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58177285A 1983-09-26 1983-09-26 リソグラフィ−用マスク構造体 Granted JPS6068339A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58177285A JPS6068339A (ja) 1983-09-26 1983-09-26 リソグラフィ−用マスク構造体
DE19843435177 DE3435177A1 (de) 1983-09-26 1984-09-25 Maske fuer lithographische zwecke
GB08424300A GB2148539B (en) 1983-09-26 1984-09-26 Lithographic mask
US07/398,309 US4956249A (en) 1983-09-26 1989-08-25 Mask structure for lithography
US07/534,875 US5112707A (en) 1983-09-26 1990-06-08 Mask structure for lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58177285A JPS6068339A (ja) 1983-09-26 1983-09-26 リソグラフィ−用マスク構造体

Publications (2)

Publication Number Publication Date
JPS6068339A true JPS6068339A (ja) 1985-04-18
JPH0563932B2 JPH0563932B2 (enrdf_load_stackoverflow) 1993-09-13

Family

ID=16028354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58177285A Granted JPS6068339A (ja) 1983-09-26 1983-09-26 リソグラフィ−用マスク構造体

Country Status (1)

Country Link
JP (1) JPS6068339A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6249623A (ja) * 1985-07-19 1987-03-04 Nec Corp Ｘ線露光マスク
JPS6252931A (ja) * 1985-08-31 1987-03-07 Dainippon Printing Co Ltd Ｘ線露光用マスク
JPH01265515A (ja) * 1988-04-15 1989-10-23 Fujitsu Ltd Ｘ線マスク

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434682A (en) * 1977-08-23 1979-03-14 Dainippon Printing Co Ltd Soft xxray lithography mask and method of producing same
JPS54124977A (en) * 1978-03-23 1979-09-28 Cho Lsi Gijutsu Kenkyu Kumiai Xxray exposure mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434682A (en) * 1977-08-23 1979-03-14 Dainippon Printing Co Ltd Soft xxray lithography mask and method of producing same
JPS54124977A (en) * 1978-03-23 1979-09-28 Cho Lsi Gijutsu Kenkyu Kumiai Xxray exposure mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6249623A (ja) * 1985-07-19 1987-03-04 Nec Corp Ｘ線露光マスク
JPS6252931A (ja) * 1985-08-31 1987-03-07 Dainippon Printing Co Ltd Ｘ線露光用マスク
JPH01265515A (ja) * 1988-04-15 1989-10-23 Fujitsu Ltd Ｘ線マスク

Also Published As

Publication number Publication date
JPH0563932B2 (enrdf_load_stackoverflow) 1993-09-13

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