JPS5434682A - Soft xxray lithography mask and method of producing same - Google Patents

Soft xxray lithography mask and method of producing same

Info

Publication number
JPS5434682A
JPS5434682A JP10074177A JP10074177A JPS5434682A JP S5434682 A JPS5434682 A JP S5434682A JP 10074177 A JP10074177 A JP 10074177A JP 10074177 A JP10074177 A JP 10074177A JP S5434682 A JPS5434682 A JP S5434682A
Authority
JP
Japan
Prior art keywords
xxray
soft
producing same
lithography mask
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10074177A
Other languages
Japanese (ja)
Other versions
JPS6041457B2 (en
Inventor
Yuuji Kikuchi
Akira Kaneki
Norihiko Tsukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP52100741A priority Critical patent/JPS6041457B2/en
Publication of JPS5434682A publication Critical patent/JPS5434682A/en
Publication of JPS6041457B2 publication Critical patent/JPS6041457B2/en
Expired legal-status Critical Current

Links

JP52100741A 1977-08-23 1977-08-23 Manufacturing method of mask for soft X-ray lithography Expired JPS6041457B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52100741A JPS6041457B2 (en) 1977-08-23 1977-08-23 Manufacturing method of mask for soft X-ray lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52100741A JPS6041457B2 (en) 1977-08-23 1977-08-23 Manufacturing method of mask for soft X-ray lithography

Publications (2)

Publication Number Publication Date
JPS5434682A true JPS5434682A (en) 1979-03-14
JPS6041457B2 JPS6041457B2 (en) 1985-09-17

Family

ID=14281976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52100741A Expired JPS6041457B2 (en) 1977-08-23 1977-08-23 Manufacturing method of mask for soft X-ray lithography

Country Status (1)

Country Link
JP (1) JPS6041457B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150023U (en) * 1979-04-16 1980-10-29
JPS5731862U (en) * 1980-07-30 1982-02-19
JPS6068339A (en) * 1983-09-26 1985-04-18 Canon Inc Structural body of mask for lithography
JPS6068336A (en) * 1983-09-26 1985-04-18 Canon Inc Structural body of mask for lithography

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IEEE TRANSACTION ON ELECTRON DEVICES=1975 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150023U (en) * 1979-04-16 1980-10-29
JPS5731862U (en) * 1980-07-30 1982-02-19
JPS6068339A (en) * 1983-09-26 1985-04-18 Canon Inc Structural body of mask for lithography
JPS6068336A (en) * 1983-09-26 1985-04-18 Canon Inc Structural body of mask for lithography
JPH0563933B2 (en) * 1983-09-26 1993-09-13 Canon Kk
JPH0563932B2 (en) * 1983-09-26 1993-09-13 Canon Kk

Also Published As

Publication number Publication date
JPS6041457B2 (en) 1985-09-17

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