GB2009442B - X-ray lithographic mask and method of fabrication - Google Patents

X-ray lithographic mask and method of fabrication

Info

Publication number
GB2009442B
GB2009442B GB7846506A GB7846506A GB2009442B GB 2009442 B GB2009442 B GB 2009442B GB 7846506 A GB7846506 A GB 7846506A GB 7846506 A GB7846506 A GB 7846506A GB 2009442 B GB2009442 B GB 2009442B
Authority
GB
United Kingdom
Prior art keywords
fabrication
lithographic mask
ray lithographic
ray
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7846506A
Other versions
GB2009442A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of GB2009442A publication Critical patent/GB2009442A/en
Application granted granted Critical
Publication of GB2009442B publication Critical patent/GB2009442B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB7846506A 1977-12-02 1978-11-29 X-ray lithographic mask and method of fabrication Expired GB2009442B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85706177A 1977-12-02 1977-12-02

Publications (2)

Publication Number Publication Date
GB2009442A GB2009442A (en) 1979-06-13
GB2009442B true GB2009442B (en) 1982-10-20

Family

ID=25325096

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7846506A Expired GB2009442B (en) 1977-12-02 1978-11-29 X-ray lithographic mask and method of fabrication

Country Status (4)

Country Link
JP (1) JPS5480083A (en)
DE (1) DE2852134A1 (en)
GB (1) GB2009442B (en)
IT (1) IT1107980B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
GB2142158A (en) * 1983-05-25 1985-01-09 Philips Electronic Associated Electron lithography masks
DE3729432A1 (en) * 1987-09-03 1989-03-16 Philips Patentverwaltung METHOD FOR PRODUCING A MASK FOR RADIATION LITHOGRAPHY
EP2562599B1 (en) 2009-01-29 2014-12-10 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Also Published As

Publication number Publication date
IT1107980B (en) 1985-12-02
DE2852134A1 (en) 1979-06-07
JPS5480083A (en) 1979-06-26
IT7852139A0 (en) 1978-11-30
GB2009442A (en) 1979-06-13

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 19981128