JPS53134366A - Method of forming resist film - Google Patents

Method of forming resist film

Info

Publication number
JPS53134366A
JPS53134366A JP4937277A JP4937277A JPS53134366A JP S53134366 A JPS53134366 A JP S53134366A JP 4937277 A JP4937277 A JP 4937277A JP 4937277 A JP4937277 A JP 4937277A JP S53134366 A JPS53134366 A JP S53134366A
Authority
JP
Japan
Prior art keywords
resist film
forming resist
forming
film
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4937277A
Other languages
Japanese (ja)
Other versions
JPS6056285B2 (en
Inventor
Susumu Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP4937277A priority Critical patent/JPS6056285B2/en
Publication of JPS53134366A publication Critical patent/JPS53134366A/en
Publication of JPS6056285B2 publication Critical patent/JPS6056285B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP4937277A 1977-04-28 1977-04-28 How to create a resist film Expired JPS6056285B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4937277A JPS6056285B2 (en) 1977-04-28 1977-04-28 How to create a resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4937277A JPS6056285B2 (en) 1977-04-28 1977-04-28 How to create a resist film

Publications (2)

Publication Number Publication Date
JPS53134366A true JPS53134366A (en) 1978-11-22
JPS6056285B2 JPS6056285B2 (en) 1985-12-09

Family

ID=12829190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4937277A Expired JPS6056285B2 (en) 1977-04-28 1977-04-28 How to create a resist film

Country Status (1)

Country Link
JP (1) JPS6056285B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194042A (en) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd Molecular construction and its manufacture
JPS61138254A (en) * 1984-12-10 1986-06-25 Matsushita Electric Ind Co Ltd Formation of pattern resin composition
JPS63184332A (en) * 1987-01-26 1988-07-29 Nippon Telegr & Teleph Corp <Ntt> Silanizing treater
JP2014119658A (en) * 2012-12-18 2014-06-30 Shin Etsu Chem Co Ltd Negative resist material and pattern forming method using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194042A (en) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd Molecular construction and its manufacture
JPS61138254A (en) * 1984-12-10 1986-06-25 Matsushita Electric Ind Co Ltd Formation of pattern resin composition
JPS63184332A (en) * 1987-01-26 1988-07-29 Nippon Telegr & Teleph Corp <Ntt> Silanizing treater
JP2014119658A (en) * 2012-12-18 2014-06-30 Shin Etsu Chem Co Ltd Negative resist material and pattern forming method using the same

Also Published As

Publication number Publication date
JPS6056285B2 (en) 1985-12-09

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