JPS53138676A - Method of developing photoresist - Google Patents
Method of developing photoresistInfo
- Publication number
- JPS53138676A JPS53138676A JP5331378A JP5331378A JPS53138676A JP S53138676 A JPS53138676 A JP S53138676A JP 5331378 A JP5331378 A JP 5331378A JP 5331378 A JP5331378 A JP 5331378A JP S53138676 A JPS53138676 A JP S53138676A
- Authority
- JP
- Japan
- Prior art keywords
- developing photoresist
- photoresist
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US79468277A | 1977-05-06 | 1977-05-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53138676A true JPS53138676A (en) | 1978-12-04 |
Family
ID=25163339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5331378A Pending JPS53138676A (en) | 1977-05-06 | 1978-05-06 | Method of developing photoresist |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS53138676A (en) |
DE (1) | DE2817256A1 (en) |
FR (1) | FR2389926A1 (en) |
GB (1) | GB1595887A (en) |
HK (1) | HK9483A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55155353A (en) * | 1979-05-22 | 1980-12-03 | Tokyo Ohka Kogyo Co Ltd | Developer composition |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3924889A1 (en) * | 1989-07-27 | 1991-01-31 | Kali Chemie Ag | CLEANING COMPOSITIONS FROM DICHLORTRIFLUORENTHANES AND ALKANOLS |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3607767A (en) * | 1969-10-10 | 1971-09-21 | Union Carbide Corp | Azeothropic composition of 1,1,2-trifluoroethane,methylene chloride,and cyclopentane |
JPS4988603A (en) * | 1972-12-29 | 1974-08-24 | ||
DE2418609A1 (en) * | 1974-04-18 | 1975-10-30 | Grace W R & Co | Photo-cured images prodn. using liquid halohydrocarbon developer - contg. nonionic surfactant for poly-ene-poly-thiol compsn. |
-
1978
- 1978-04-20 DE DE19782817256 patent/DE2817256A1/en not_active Withdrawn
- 1978-05-03 GB GB1756978A patent/GB1595887A/en not_active Expired
- 1978-05-03 FR FR7813218A patent/FR2389926A1/fr not_active Withdrawn
- 1978-05-06 JP JP5331378A patent/JPS53138676A/en active Pending
-
1983
- 1983-03-17 HK HK9483A patent/HK9483A/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55155353A (en) * | 1979-05-22 | 1980-12-03 | Tokyo Ohka Kogyo Co Ltd | Developer composition |
JPH0238942B2 (en) * | 1979-05-22 | 1990-09-03 | Tokyo Ohka Kogyo Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
DE2817256A1 (en) | 1978-11-09 |
HK9483A (en) | 1983-03-17 |
GB1595887A (en) | 1981-08-19 |
FR2389926A1 (en) | 1978-12-01 |
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