JPS5463828A - Developer for photoresist - Google Patents
Developer for photoresistInfo
- Publication number
- JPS5463828A JPS5463828A JP13044377A JP13044377A JPS5463828A JP S5463828 A JPS5463828 A JP S5463828A JP 13044377 A JP13044377 A JP 13044377A JP 13044377 A JP13044377 A JP 13044377A JP S5463828 A JPS5463828 A JP S5463828A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13044377A JPS5463828A (en) | 1977-10-31 | 1977-10-31 | Developer for photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13044377A JPS5463828A (en) | 1977-10-31 | 1977-10-31 | Developer for photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5463828A true JPS5463828A (en) | 1979-05-23 |
Family
ID=15034357
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13044377A Pending JPS5463828A (en) | 1977-10-31 | 1977-10-31 | Developer for photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5463828A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS5627143A (en) * | 1979-08-14 | 1981-03-16 | Japan Synthetic Rubber Co Ltd | Polymer type photoresist developing method |
JPS5683740A (en) * | 1979-12-13 | 1981-07-08 | Japan Synthetic Rubber Co Ltd | Developer for polymer photoresist |
-
1977
- 1977-10-31 JP JP13044377A patent/JPS5463828A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS5627143A (en) * | 1979-08-14 | 1981-03-16 | Japan Synthetic Rubber Co Ltd | Polymer type photoresist developing method |
JPH0145054B2 (en) * | 1979-08-14 | 1989-10-02 | Japan Synthetic Rubber Co Ltd | |
JPS5683740A (en) * | 1979-12-13 | 1981-07-08 | Japan Synthetic Rubber Co Ltd | Developer for polymer photoresist |
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