JPS5683740A - Developer for polymer photoresist - Google Patents

Developer for polymer photoresist

Info

Publication number
JPS5683740A
JPS5683740A JP16203979A JP16203979A JPS5683740A JP S5683740 A JPS5683740 A JP S5683740A JP 16203979 A JP16203979 A JP 16203979A JP 16203979 A JP16203979 A JP 16203979A JP S5683740 A JPS5683740 A JP S5683740A
Authority
JP
Japan
Prior art keywords
developer
solvent
polymer photoresist
good solvent
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16203979A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Harita
Kazuo Sano
Toko Harada
Kazuhiko Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP16203979A priority Critical patent/JPS5683740A/en
Publication of JPS5683740A publication Critical patent/JPS5683740A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain an image with high resolution without requiring a rinsing process by using a bad solvent and a good solvent different from each other in b.p. to prepare a developer for a polymer photoresist and specifying the 2nd virial coefficient. CONSTITUTION:A good solvent such as cyclohexanone having 80.7 deg.C b.p. and a bad solvent such as n-butyl acetate having 125 deg.C b.p. are mixed in (1-9):(9-1) vol. ratio, and this mixed org. solvent is required to be higher than that of the good solvent. By carrying out development with this developer at 20-30 deg.C, the 2nd virial coefficient A2 is adjusted to -0.2X10<-4>-+1.2X10<-4>ml/g. This developer is suitable for developing a polymer photoresist and gives an image with high resolution without subjecting to any rinsing process.
JP16203979A 1979-12-13 1979-12-13 Developer for polymer photoresist Pending JPS5683740A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16203979A JPS5683740A (en) 1979-12-13 1979-12-13 Developer for polymer photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16203979A JPS5683740A (en) 1979-12-13 1979-12-13 Developer for polymer photoresist

Publications (1)

Publication Number Publication Date
JPS5683740A true JPS5683740A (en) 1981-07-08

Family

ID=15746914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16203979A Pending JPS5683740A (en) 1979-12-13 1979-12-13 Developer for polymer photoresist

Country Status (1)

Country Link
JP (1) JPS5683740A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101148A (en) * 1980-01-16 1981-08-13 Toshiba Corp Photoresist developing method
JPS5876836A (en) * 1981-10-31 1983-05-10 Toshiba Corp Developer of high resolution resist
JPS58137836A (en) * 1982-02-10 1983-08-16 Toshiba Corp Processing agent for rubber resist
JPS58187926A (en) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd Method for developing radiation sensitive negative type resist
JPS592043A (en) * 1982-06-29 1984-01-07 Fujitsu Ltd Photoresist developing method
EP0124265A2 (en) * 1983-03-31 1984-11-07 Oki Electric Industry Company, Limited Process for forming pattern with negative resist
JPH0566570A (en) * 1991-09-06 1993-03-19 Nippon Telegr & Teleph Corp <Ntt> Resist developer and pattern forming method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5151939A (en) * 1974-10-31 1976-05-07 Canon Kk SAISENPATAANYOHOTOREJISUTOGENZOEKI
JPS51130222A (en) * 1975-05-07 1976-11-12 Hitachi Ltd A process for producing an electron beam resist image
JPS5276924A (en) * 1975-12-23 1977-06-28 Japan Synthetic Rubber Co Ltd Developer
JPS5330330A (en) * 1976-09-01 1978-03-22 Fujitsu Ltd Developing liquid for radiant ray resist
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5463828A (en) * 1977-10-31 1979-05-23 Japan Synthetic Rubber Co Ltd Developer for photoresist
JPS54140535A (en) * 1978-04-24 1979-10-31 Japan Synthetic Rubber Co Ltd Developer
JPS5627143A (en) * 1979-08-14 1981-03-16 Japan Synthetic Rubber Co Ltd Polymer type photoresist developing method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5151939A (en) * 1974-10-31 1976-05-07 Canon Kk SAISENPATAANYOHOTOREJISUTOGENZOEKI
JPS51130222A (en) * 1975-05-07 1976-11-12 Hitachi Ltd A process for producing an electron beam resist image
JPS5276924A (en) * 1975-12-23 1977-06-28 Japan Synthetic Rubber Co Ltd Developer
JPS5330330A (en) * 1976-09-01 1978-03-22 Fujitsu Ltd Developing liquid for radiant ray resist
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5463828A (en) * 1977-10-31 1979-05-23 Japan Synthetic Rubber Co Ltd Developer for photoresist
JPS54140535A (en) * 1978-04-24 1979-10-31 Japan Synthetic Rubber Co Ltd Developer
JPS5627143A (en) * 1979-08-14 1981-03-16 Japan Synthetic Rubber Co Ltd Polymer type photoresist developing method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101148A (en) * 1980-01-16 1981-08-13 Toshiba Corp Photoresist developing method
JPH0145055B2 (en) * 1980-01-16 1989-10-02 Tokyo Shibaura Electric Co
JPS5876836A (en) * 1981-10-31 1983-05-10 Toshiba Corp Developer of high resolution resist
JPS58137836A (en) * 1982-02-10 1983-08-16 Toshiba Corp Processing agent for rubber resist
JPS58187926A (en) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd Method for developing radiation sensitive negative type resist
JPH0546535B2 (en) * 1982-04-28 1993-07-14 Tosoh Corp
JPS592043A (en) * 1982-06-29 1984-01-07 Fujitsu Ltd Photoresist developing method
JPH0319540B2 (en) * 1982-06-29 1991-03-15 Fujitsu Ltd
EP0124265A2 (en) * 1983-03-31 1984-11-07 Oki Electric Industry Company, Limited Process for forming pattern with negative resist
JPH0566570A (en) * 1991-09-06 1993-03-19 Nippon Telegr & Teleph Corp <Ntt> Resist developer and pattern forming method

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