JPS55155353A - Developer composition - Google Patents
Developer compositionInfo
- Publication number
- JPS55155353A JPS55155353A JP6222679A JP6222679A JPS55155353A JP S55155353 A JPS55155353 A JP S55155353A JP 6222679 A JP6222679 A JP 6222679A JP 6222679 A JP6222679 A JP 6222679A JP S55155353 A JPS55155353 A JP S55155353A
- Authority
- JP
- Japan
- Prior art keywords
- xylene
- butyl acetate
- developer composition
- recovered
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain a developer composition suitable for developing a minute pattern of a rubber type photoresist and capable of being recovered and used by mixing xylene and n-butyl acetate in a specified ratio. CONSTITUTION:Xylene and n-butyl acetate are blended in a ratio of 9:1-5:5 by vol., preferably 8.5:1.5-6:4 to form a developer composition. This composition is applicable to known rubber type photoresist such as ''OMR-83 '' of TOKYO OKA K.K. A waste developer from an automatic developing machine is recovered by distillation, and the resulting mixed soln. of xylene and n-butyl acetate can easily be regenerated only by adding a necessary amount of xylene.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6222679A JPS55155353A (en) | 1979-05-22 | 1979-05-22 | Developer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6222679A JPS55155353A (en) | 1979-05-22 | 1979-05-22 | Developer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55155353A true JPS55155353A (en) | 1980-12-03 |
JPH0238942B2 JPH0238942B2 (en) | 1990-09-03 |
Family
ID=13194023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6222679A Granted JPS55155353A (en) | 1979-05-22 | 1979-05-22 | Developer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55155353A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56101148A (en) * | 1980-01-16 | 1981-08-13 | Toshiba Corp | Photoresist developing method |
JPS592043A (en) * | 1982-06-29 | 1984-01-07 | Fujitsu Ltd | Photoresist developing method |
JPS6043826A (en) * | 1983-08-19 | 1985-03-08 | Rohm Co Ltd | Manufacture of semiconductor device |
US6551749B1 (en) | 1999-04-09 | 2003-04-22 | Fujitsu Limited | Developer and method for forming resist pattern and photomask produced by use thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5359367A (en) * | 1976-11-10 | 1978-05-29 | Hitachi Ltd | Formation of electron beam resist image |
JPS53138676A (en) * | 1977-05-06 | 1978-12-04 | Allied Chem | Method of developing photoresist |
-
1979
- 1979-05-22 JP JP6222679A patent/JPS55155353A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5359367A (en) * | 1976-11-10 | 1978-05-29 | Hitachi Ltd | Formation of electron beam resist image |
JPS53138676A (en) * | 1977-05-06 | 1978-12-04 | Allied Chem | Method of developing photoresist |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56101148A (en) * | 1980-01-16 | 1981-08-13 | Toshiba Corp | Photoresist developing method |
JPH0145055B2 (en) * | 1980-01-16 | 1989-10-02 | Tokyo Shibaura Electric Co | |
JPS592043A (en) * | 1982-06-29 | 1984-01-07 | Fujitsu Ltd | Photoresist developing method |
JPH0319540B2 (en) * | 1982-06-29 | 1991-03-15 | Fujitsu Ltd | |
JPS6043826A (en) * | 1983-08-19 | 1985-03-08 | Rohm Co Ltd | Manufacture of semiconductor device |
JPH0428300B2 (en) * | 1983-08-19 | 1992-05-14 | Rohm Kk | |
US6551749B1 (en) | 1999-04-09 | 2003-04-22 | Fujitsu Limited | Developer and method for forming resist pattern and photomask produced by use thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0238942B2 (en) | 1990-09-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55155353A (en) | Developer composition | |
JPS5238673A (en) | Device for controlling the mortar blending | |
JPS5246820A (en) | Developers for xerography | |
JPS5436726A (en) | Dry type development for zerography | |
JPS54135846A (en) | Composition for sealing material | |
JPS53400A (en) | Washing method for mixing stirrer of radioactive waste and cement | |
JPS5230428A (en) | Photoresist exposure method | |
JPS5369636A (en) | Liquid developing agent for use in static photography | |
JPS51126372A (en) | A solidification trertment for toxic substances | |
JPS561946A (en) | Developer composition | |
JPS56163745A (en) | Lecithin composition having superior water dispersibility | |
JPS5266542A (en) | Composition of surfacer | |
JPS51124106A (en) | Apparatus for prodcuing emulsion fuel with water-in-oil type | |
JPS5237051A (en) | Exposure device for color electrophotographic copying machine | |
JPS5697344A (en) | Rubber resist developer for minute working | |
JPS5247010A (en) | Homogenization of fats and oils | |
JPS51121477A (en) | Process for treating cement-containing dirty mud-like waste materials | |
JPS5224879A (en) | Mixed feed for land produced shellfish | |
JPS53118051A (en) | Toner | |
JPS5433360A (en) | Method and device for disposing of muddy water | |
JPS548534A (en) | Toner for electrostatic charge developing | |
JPS5363274A (en) | Treating method for sludge containing mercury | |
JPS5230924A (en) | Liquid fuel mixing burner | |
JPS548527A (en) | Photoreceptor for electrophotography | |
JPS51125951A (en) | Control device for an air exposure tank |