JPS5697344A - Rubber resist developer for minute working - Google Patents

Rubber resist developer for minute working

Info

Publication number
JPS5697344A
JPS5697344A JP17321379A JP17321379A JPS5697344A JP S5697344 A JPS5697344 A JP S5697344A JP 17321379 A JP17321379 A JP 17321379A JP 17321379 A JP17321379 A JP 17321379A JP S5697344 A JPS5697344 A JP S5697344A
Authority
JP
Japan
Prior art keywords
resist developer
developer
kinds
rubber resist
lower aliphatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17321379A
Other languages
Japanese (ja)
Inventor
Minoru Narita
Kiyoto Mori
Tomoaki Yamashita
Yoichi Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanto Chemical Co Inc
Original Assignee
Kanto Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanto Chemical Co Inc filed Critical Kanto Chemical Co Inc
Priority to JP17321379A priority Critical patent/JPS5697344A/en
Publication of JPS5697344A publication Critical patent/JPS5697344A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable a minute image to be reproduced by using a lower aliphatic or aromatic halogenated hydrocarbon as an essential component. CONSTITUTION:One or more kinds of lower aliphatic halogenated hydrocarbons such as carbon tetrachloride and trichloroethylene or aromatic halogenated hydrocarbons such as dichlorobenzene are mixed in a predetermined ratio, and one or more kinds of compounds selected from alcohols, esters, ketones and acid amides, e.g., n- butyl acetate are further blended to prepare a rubber resist developer. Using this developer a minute image with superior whiskers, bridges, swellability, etc. is obtd. mainly in the manufacture of an integrated circuit elements.
JP17321379A 1979-12-30 1979-12-30 Rubber resist developer for minute working Pending JPS5697344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17321379A JPS5697344A (en) 1979-12-30 1979-12-30 Rubber resist developer for minute working

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17321379A JPS5697344A (en) 1979-12-30 1979-12-30 Rubber resist developer for minute working

Publications (1)

Publication Number Publication Date
JPS5697344A true JPS5697344A (en) 1981-08-06

Family

ID=15956213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17321379A Pending JPS5697344A (en) 1979-12-30 1979-12-30 Rubber resist developer for minute working

Country Status (1)

Country Link
JP (1) JPS5697344A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4877716A (en) * 1988-02-24 1989-10-31 Arizona Board Of Regents Developer solutions for PMMA electron resist
US4937174A (en) * 1988-02-24 1990-06-26 Arizona Board Of Regents Process of obtaining improved contrast in electron beam lithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4877716A (en) * 1988-02-24 1989-10-31 Arizona Board Of Regents Developer solutions for PMMA electron resist
US4937174A (en) * 1988-02-24 1990-06-26 Arizona Board Of Regents Process of obtaining improved contrast in electron beam lithography

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