JPS52149116A - Method of forming xxray image - Google Patents
Method of forming xxray imageInfo
- Publication number
- JPS52149116A JPS52149116A JP6636476A JP6636476A JPS52149116A JP S52149116 A JPS52149116 A JP S52149116A JP 6636476 A JP6636476 A JP 6636476A JP 6636476 A JP6636476 A JP 6636476A JP S52149116 A JPS52149116 A JP S52149116A
- Authority
- JP
- Japan
- Prior art keywords
- xxray
- image
- forming
- xxray image
- forming xxray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6636476A JPS52149116A (en) | 1976-06-07 | 1976-06-07 | Method of forming xxray image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6636476A JPS52149116A (en) | 1976-06-07 | 1976-06-07 | Method of forming xxray image |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52149116A true JPS52149116A (en) | 1977-12-12 |
JPS5721700B2 JPS5721700B2 (en) | 1982-05-08 |
Family
ID=13313710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6636476A Granted JPS52149116A (en) | 1976-06-07 | 1976-06-07 | Method of forming xxray image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52149116A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55101086U (en) * | 1979-01-04 | 1980-07-14 | ||
JPS6081158A (en) * | 1983-10-11 | 1985-05-09 | Hitachi Ltd | Radiation-sensitive substance |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS497495A (en) * | 1972-05-25 | 1974-01-23 | ||
JPS4912902A (en) * | 1972-05-16 | 1974-02-04 | ||
JPS5187971A (en) * | 1975-01-29 | 1976-07-31 | Ibm | Denjiimushoshanyoru rejisutozo no keiseihoho |
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
-
1976
- 1976-06-07 JP JP6636476A patent/JPS52149116A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4912902A (en) * | 1972-05-16 | 1974-02-04 | ||
JPS497495A (en) * | 1972-05-25 | 1974-01-23 | ||
JPS5187971A (en) * | 1975-01-29 | 1976-07-31 | Ibm | Denjiimushoshanyoru rejisutozo no keiseihoho |
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55101086U (en) * | 1979-01-04 | 1980-07-14 | ||
JPS598384Y2 (en) * | 1979-01-04 | 1984-03-15 | 松下電器産業株式会社 | audio equipment |
JPS6081158A (en) * | 1983-10-11 | 1985-05-09 | Hitachi Ltd | Radiation-sensitive substance |
JPH0446267B2 (en) * | 1983-10-11 | 1992-07-29 | Hitachi Seisakusho Kk |
Also Published As
Publication number | Publication date |
---|---|
JPS5721700B2 (en) | 1982-05-08 |
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