JPS52149116A - Method of forming xxray image - Google Patents

Method of forming xxray image

Info

Publication number
JPS52149116A
JPS52149116A JP6636476A JP6636476A JPS52149116A JP S52149116 A JPS52149116 A JP S52149116A JP 6636476 A JP6636476 A JP 6636476A JP 6636476 A JP6636476 A JP 6636476A JP S52149116 A JPS52149116 A JP S52149116A
Authority
JP
Japan
Prior art keywords
xxray
image
forming
xxray image
forming xxray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6636476A
Other languages
Japanese (ja)
Other versions
JPS5721700B2 (en
Inventor
Tadao Nakatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO OUKA KOUGIYOU KK
Original Assignee
TOKYO OUKA KOUGIYOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO OUKA KOUGIYOU KK filed Critical TOKYO OUKA KOUGIYOU KK
Priority to JP6636476A priority Critical patent/JPS52149116A/en
Publication of JPS52149116A publication Critical patent/JPS52149116A/en
Publication of JPS5721700B2 publication Critical patent/JPS5721700B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6636476A 1976-06-07 1976-06-07 Method of forming xxray image Granted JPS52149116A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6636476A JPS52149116A (en) 1976-06-07 1976-06-07 Method of forming xxray image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6636476A JPS52149116A (en) 1976-06-07 1976-06-07 Method of forming xxray image

Publications (2)

Publication Number Publication Date
JPS52149116A true JPS52149116A (en) 1977-12-12
JPS5721700B2 JPS5721700B2 (en) 1982-05-08

Family

ID=13313710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6636476A Granted JPS52149116A (en) 1976-06-07 1976-06-07 Method of forming xxray image

Country Status (1)

Country Link
JP (1) JPS52149116A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55101086U (en) * 1979-01-04 1980-07-14
JPS6081158A (en) * 1983-10-11 1985-05-09 Hitachi Ltd Radiation-sensitive substance

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS497495A (en) * 1972-05-25 1974-01-23
JPS4912902A (en) * 1972-05-16 1974-02-04
JPS5187971A (en) * 1975-01-29 1976-07-31 Ibm Denjiimushoshanyoru rejisutozo no keiseihoho
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4912902A (en) * 1972-05-16 1974-02-04
JPS497495A (en) * 1972-05-25 1974-01-23
JPS5187971A (en) * 1975-01-29 1976-07-31 Ibm Denjiimushoshanyoru rejisutozo no keiseihoho
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55101086U (en) * 1979-01-04 1980-07-14
JPS598384Y2 (en) * 1979-01-04 1984-03-15 松下電器産業株式会社 audio equipment
JPS6081158A (en) * 1983-10-11 1985-05-09 Hitachi Ltd Radiation-sensitive substance
JPH0446267B2 (en) * 1983-10-11 1992-07-29 Hitachi Seisakusho Kk

Also Published As

Publication number Publication date
JPS5721700B2 (en) 1982-05-08

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