JPS6081158A - Radiation-sensitive substance - Google Patents

Radiation-sensitive substance

Info

Publication number
JPS6081158A
JPS6081158A JP18833283A JP18833283A JPS6081158A JP S6081158 A JPS6081158 A JP S6081158A JP 18833283 A JP18833283 A JP 18833283A JP 18833283 A JP18833283 A JP 18833283A JP S6081158 A JPS6081158 A JP S6081158A
Authority
JP
Japan
Prior art keywords
radiation
compound
lower alkyl
formula
doublet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18833283A
Other languages
Japanese (ja)
Other versions
JPH0446267B2 (en
Inventor
Fumio Kataoka
文雄 片岡
Fusaji Shoji
房次 庄子
Ataru Yokono
中 横野
Mitsumasa Kojima
児嶋 充雅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP18833283A priority Critical patent/JPS6081158A/en
Publication of JPS6081158A publication Critical patent/JPS6081158A/en
Publication of JPH0446267B2 publication Critical patent/JPH0446267B2/ja
Granted legal-status Critical Current

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  • Hydrogenated Pyridines (AREA)
  • Pyridine Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

NEW MATERIAL:The compound of formula I -formula IV [X is halogen; Y is CH or N; when Y is CH, Z is H, lower alkyl, OR<1> (R' is H or lower alkyl) or COOR<1>, and when Y is N, Z is H, lower alkyl, or C(O)R<1>CO2R<1>; n and m are 0-1; the position of the N3 group on the benzene nucleus is para or meta]. EXAMPLE:2,3-Dibromo-1,3-(p-azidophenyl)propan-1-one. USE:Hardener for a radiation-sensitive resin. An aromatic bisazide-type radiation- sensitive substance having high sensitivity. PREPARATION:The compound of formula I or II can be produced by reacting the 4-substituted-2,6-bis(azidobezal)cyclohexanone, diazidochalcone or diazidobenzalacetone with N-methyl-2-pyrrolidone-halogen complex. The above compound can be converted to the compound of formula III or IV by the dehydrohalogenation reaction with pyridine.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は放射線レノストに用いられる含ハロゲン芳香族
アット系放射線感応物質に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a halogen-containing aromatic at-based radiation-sensitive material used in radiation renost.

〔発明の背景〕[Background of the invention]

近年の半導体工業の急速な進歩に併ない、素子微IYa
加工技術の分野において要求されるノlターン寸法も微
細化の一途をたどり、今後はεクロン以下の超微細化・
9ターンを得ることが望まれている。
Along with the rapid progress of the semiconductor industry in recent years, element micro IYa
The nolturn dimensions required in the field of processing technology are becoming increasingly finer, and in the future, ultra-fine and
It is hoped to get 9 turns.

この要求に対し、従来のパターン形成用材料である感光
性樹脂は、光の回折や干渉のために原理的にミクロン以
下の超微細パターンを得ることは困難であった。このた
め、回折や干渉が極めて小さい電子線やX線を用いたり
ソグラフィ技術がクローズアップされ、これに併なって
これら放射線に感応する樹脂祠科の費求が高まって来た
In response to this demand, it has been theoretically difficult to obtain ultra-fine patterns of microns or less using photosensitive resins, which are conventional pattern-forming materials, due to light diffraction and interference. For this reason, lithography techniques using electron beams and X-rays, which have extremely low diffraction and interference, have attracted attention, and along with this, the demand for resin molds that are sensitive to these radiations has increased.

芳香族アジド化合物は、光に対する感度が極めて高いた
め、現在感光性樹脂の感光剤として汎く用いられている
が、放射線に対しては反応性が低いため、放射線感応性
硬化剤としては効果的に用いることができなかった。
Aromatic azide compounds are currently widely used as photosensitizers for photosensitive resins because they have extremely high sensitivity to light, but they have low reactivity to radiation, so they are not effective as radiation-sensitive curing agents. could not be used for

〔発明の目的〕[Purpose of the invention]

本発明の目的は、放射線感応4m脂用の硬化剤として、
放射線感応性の高い芳香族ビスアジド系放射線感応性物
置を提供するにある。
The purpose of the present invention is to use the following as a curing agent for radiation-sensitive 4m fat:
An object of the present invention is to provide an aromatic bisazide-based radiation-sensitive container having high radiation sensitivity.

〔発明の概要〕[Summary of the invention]

ビスアジド化合物を感応性樹脂に用いた場合に感度が高
く、放射線感応樹脂に用いた場合感度が低いのは、ビス
アジド化合物は光を吸収する効率が高いのに対し、放射
線の吸収効率が低いために、樹脂硬化に要する活性化学
種の発生効率が低いためと考えられる。放射線の吸収効
率は電子密度に依存するため、上記の吸収効率を高める
ためにはビスアジド化合物に電子密度の高い重原子ハロ
ダンを導入すれば良いと考え、ハロゲン原子を含む芳香
族ビスアジド化合物の合成を鋭怠検討した結果、本発明
者らは、下記の一般式で表わされる含ハロゲン芳香族ビ
スアジド化合物で上記目的が達成されるという知見に到
達した。
The reason why bisazide compounds have high sensitivity when used in sensitive resins and low sensitivity when used in radiation-sensitive resins is because bisazide compounds have high light absorption efficiency, but radiation absorption efficiency is low. This is thought to be due to the low generation efficiency of active chemical species required for resin curing. Since the absorption efficiency of radiation depends on the electron density, we thought that in order to increase the absorption efficiency mentioned above, it would be sufficient to introduce a heavy atom, halodane, which has a high electron density, into the bisazide compound. As a result of extensive studies, the present inventors have reached the knowledge that the above object can be achieved with a halogen-containing aromatic bisazide compound represented by the following general formula.

ただし、Xはハロゲン、Yは−CH−または−N−。However, X is halogen and Y is -CH- or -N-.

1.1 2はYが−CH−のとき水素、低級アルキル基、一0R
I(R1は水素または低級アルキル基を衣わす)、はl
を表わし、−N3基はベンゼン核のパラまたはメタ位に
位置する。
1.1 2 is hydrogen, lower alkyl group, 10R when Y is -CH-
I (R1 represents hydrogen or a lower alkyl group), is l
and the -N3 group is located at the para or meta position of the benzene nucleus.

一般式(1)または(2)で表わされる化合物は、4−
置換2.6−ビス(アジドペンデル)シクロヘキサノン
、ジアジドカルコンまたはジアジドペンデルアセトンを
N−メチル−2−ピロリドン−ハロゲン錯体と反応させ
ることによって合成した。
The compound represented by general formula (1) or (2) is 4-
Substituted 2,6-bis(azidopendel)cyclohexanone, diazidochalcone or diazidopendelacetone was synthesized by reacting with N-methyl-2-pyrrolidone-halogen complex.

一般式(3)または(4)で表わされる化合物は前記一
般式(1)または(2)で表わされる化合物を非プロト
ン性極性溶媒中、ピリジンで処理し、脱ハロゲン化水素
反応させることによって合成した。
The compound represented by the general formula (3) or (4) is synthesized by treating the compound represented by the general formula (1) or (2) with pyridine in an aprotic polar solvent and causing a dehydrohalogenation reaction. did.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明によって提供される含ハロゲン芳香族ビス
アジド化合物とその合成法を実施例によって説明する。
Hereinafter, the halogen-containing aromatic bisazide compound provided by the present invention and the method for synthesizing the same will be explained with reference to Examples.

なお、以下の実施例に示す分解望ヒはすべて示差熱分析
装置による発熱ピークからめた。また、核磁気共鳴CN
MR)スペクトルはすべてジメチルスルホキシド−d6
中で測定し、ケミカルシフトはテトラメチルシランを内
部標準としてppm単位で与えである。また、括弧内の
データはスペクトルミ4ターン、カッシリングコンスタ
ント、積分比を順に示す。
In addition, all decomposition tests shown in the following examples were determined from exothermic peaks measured by a differential thermal analyzer. In addition, nuclear magnetic resonance CN
MR) Spectra are all dimethyl sulfoxide-d6
Chemical shifts are given in ppm using tetramethylsilane as an internal standard. Furthermore, the data in parentheses indicate the spectrum mi-turn, the cassilling constant, and the integral ratio in that order.

実施91112,3−ジブロム−1,3−(p−アシド
フェニル)クロパン−1−オン N−メチル−2−ピロリドン(以下本明細書においては
NMPと略記する。)150+mに対して、冷却下で臭
素を滴下し、NMP−臭素錯体のNMP溶液を調製した
。この溶液40IILeに対し、4,4′−ジアジドカ
ルコン10’tを加え、室温で2日間反応させた。次に
、この溶液を500 dの水に加えて室温で1日放置し
、析出した固形物を吸引濾過によってJ1%メ、 10
0コX3回の水洗い、50.dのメタノール洗浄の後に
減圧乾燥して、分解温度140〜150’C。
Example 9111 2,3-dibromo-1,3-(p-acidophenyl)cropan-1-one N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP) against 150+m under cooling. Bromine was added dropwise to prepare an NMP solution of an NMP-bromine complex. To 40 IILe of this solution, 10't of 4,4'-diazide chalcone was added and reacted at room temperature for 2 days. Next, this solution was added to 500 d of water and left to stand at room temperature for 1 day, and the precipitated solid was filtered with suction to give 1% J, 10
0 x 3 washes, 50. After washing with methanol in step d, drying under reduced pressure is carried out at a decomposition temperature of 140 to 150'C.

の無色固体12 fを得た。A colorless solid 12f was obtained.

上記反応を化学式で表わせば、下記のように書くことが
できる。
If the above reaction is expressed as a chemical formula, it can be written as follows.

0 この生成物はスペクトル分析によって題記の化合物であ
ることを確認した。以下に赤外吸収スペクトルおよび核
磁気共鳴スペクトルのデータを示す。赤外吸収: 21
50cIn−”(Ns) o核磁気共鳴:δ5.7(2
重項、1IHz、 l 11) 、 6.7 (2重項
、 11 Hz 。
0 This product was confirmed to be the title compound by spectral analysis. Infrared absorption spectrum and nuclear magnetic resonance spectrum data are shown below. Infrared absorption: 21
50 cIn-” (Ns) o Nuclear magnetic resonance: δ5.7 (2
Doublet, 1IHz, 11), 6.7 (Doublet, 11Hz.

IH)、7.2(2重項、9Hz 、2H)、7.3(
2重項、 9 Hz 、 2 H) 、 7.9 (2
重項、9Hz、2H)。
IH), 7.2 (doublet, 9Hz, 2H), 7.3 (
Doublet, 9 Hz, 2 H), 7.9 (2
doublet, 9Hz, 2H).

8.4(2重項、9Hz、2H)。8.4 (doublet, 9Hz, 2H).

実施例22.6−シグロムー2.6−(α−ジグロム−
p−アジドベンジル−4−メチルシクロヘキサノン 実施例1で調整したNMP−臭素錯体のNMP溶液(1
)・aに対し、2.6−ビス(p−アジドペンデル)−
4−メチルシクロヘキサy7Fを7JOえ、室温で2日
間反応場せた。次に、この溶液を500−の水に加えて
室温で1日放置し、析出した固形物を吸引濾過によって
集め、100 at X 3回の水洗、50−のメタノ
ール洗浄の後に減圧乾燥して、分解温度110〜120
°Cの無色固体9fを得た。
Example 22.6-siglomu2.6-(α-diglomu-
p-azidobenzyl-4-methylcyclohexanone An NMP solution of the NMP-bromine complex prepared in Example 1 (1
)・a, 2,6-bis(p-azidopendel)-
7JO of 4-methylcyclohexay7F was added and allowed to react at room temperature for 2 days. Next, this solution was added to 500 mm of water and left at room temperature for 1 day, and the precipitated solids were collected by suction filtration, washed with 100 at. Decomposition temperature 110-120
A colorless solid 9f at °C was obtained.

上記反応を化学式で表わせば、下記のように書くことが
できる。
If the above reaction is expressed as a chemical formula, it can be written as follows.

この生成物はスペクトル分析によって題記の化合物であ
ることを確認した。以下に赤外吸収スペクトルおよび核
磁気共鳴スペクトルのデータを示す。赤外吸収: 21
5k t(−Ns)。核磁気共鳴:δ1.05 (2重
項、 5 Hz、 3H) 1.5−2.5(多重項、
5H)。
This product was confirmed to be the title compound by spectral analysis. Infrared absorption spectrum and nuclear magnetic resonance spectrum data are shown below. Infrared absorption: 21
5k t(-Ns). Nuclear magnetic resonance: δ1.05 (doublet, 5 Hz, 3H) 1.5-2.5 (multiplet,
5H).

6.05(1重項、2H)、7.1(2重項、8Hz、
4H)。
6.05 (singlet, 2H), 7.1 (doublet, 8Hz,
4H).

7.6(2重項、8Hz、4H)。7.6 (doublet, 8Hz, 4H).

実施例32.6−ノプロムー2.6−(α−ブロム−p
−アジドベンノル)−4−カル?キシシクロヘキサノン 実施例1で調整したNMP−臭素錯体のNMP 4液2
5コに対し、2.6−ビス(p−アジドベンザル)−4
−カルyj?キシシクロヘキサノン3.5tヲ加L、室
温で2日間反応させた。次に、この溶液を300dの水
に加えて室温で1日放置し、析出した固形物を吸引濾過
によって集め、100 ml X 3回の水洗い、20
mJのメタノール洗浄の後に減圧乾燥して、分解温度1
10、、.1206Cの無色固体3.7tを得た。
Example 32.6-nopromu2.6-(α-bromo-p
-azidobennol)-4-cal? NMP 4 solution 2 of NMP-bromine complex prepared in oxycyclohexanone Example 1
5, 2,6-bis(p-azidobenzal)-4
-Cal yj? 3.5 tons of oxycyclohexanone was added and the reaction was carried out at room temperature for 2 days. Next, this solution was added to 300 ml of water and left at room temperature for 1 day, and the precipitated solids were collected by suction filtration, washed with 100 ml of water 3 times, and washed with water for 20 min.
After washing with mJ of methanol, drying under reduced pressure to a decomposition temperature of 1
10,... 3.7 tons of colorless solid of 1206C were obtained.

上記反応を化学式で表わせば、下記のように書くことが
できる。
If the above reaction is expressed as a chemical formula, it can be written as follows.

この生成物はスペクトル分析によって題記の化合物であ
ることをJ&[した。赤外吸収: 2150!:In’
C−Ns )。核磁気共鳴:δ1.5〜3(多重項、5
H)。
This product was identified as the title compound by spectral analysis. Infrared absorption: 2150! :In'
C-Ns). Nuclear magnetic resonance: δ1.5-3 (multiplet, 5
H).

6.1 (1重項、2H)、7.1 (2重項、9 H
z + 4 H) +7.65(2重項、 9Hz 、
 4H)。
6.1 (singlet, 2H), 7.1 (doublet, 9H
z + 4 H) +7.65 (doublet, 9Hz,
4H).

実施例42,6−ジプロムー2.6−(α−ゾロムーp
−アジドベンジル)−4−ヒドロキシシクロヘキサノン 実施例1′t′調整したNMP−臭素錯体のNMP溶液
25 mlに対し、2.6−ビス(p−アジドペンデル
)−4−ヒドロキシシクロへキサノン3Fを加i、室温
で2日間反応させた。次に、この溶液を300コの水に
加えて室温で1日放置し、析出した同形物を吸引濾過に
よって集め、100 rnl X 3回の水洗、旬!d
×1回のメタノール洗浄の後に減圧乾燥して、分解温度
160−165℃の無色固体3,2fを得た。
Example 4 2,6-dipromu2,6-(α-zolomu p
-azidobenzyl)-4-hydroxycyclohexanone Example 1't' To 25 ml of the NMP solution of the prepared NMP-bromine complex, 2,6-bis(p-azidopendel)-4-hydroxycyclohexanone 3F was added. i. Reacted for 2 days at room temperature. Next, this solution was added to 300 ml of water and left at room temperature for one day, and the precipitated isomorphic material was collected by suction filtration, washed with 100 rnl x 3 times, and washed! d
After washing with methanol once, drying was carried out under reduced pressure to obtain colorless solid 3.2f with a decomposition temperature of 160-165°C.

上記反応を化学式で表わせば、下記のように書くことが
できる。
If the above reaction is expressed as a chemical formula, it can be written as follows.

Of( この生成物はスペクトル分析によって題記の化合物であ
ることを確認した0赤外吸収=2150crIL−1C
Ns)。核磁気共鳴:δ1.5〜3.0(多重項、5H
)。
Of (This product was confirmed to be the title compound by spectral analysis.0 infrared absorption=2150crIL-1C
Ns). Nuclear magnetic resonance: δ1.5-3.0 (multiplet, 5H
).

6.0(1重項、2H)、7.1(2重項、9Hz、4
H)。
6.0 (singlet, 2H), 7.1 (doublet, 9Hz, 4
H).

7.6 (2重項、9Hz、4H)。7.6 (Doublet, 9Hz, 4H).

実施例52−ブロム−1,3−ジ(p−アジドフェニル
)−2−fロペン−1−オン2.3−ジブロム−1,3
−(P−アジドフェニル)プロパン−1−オン7Fを7
04のNMPに溶解し、ピリジン102を加えて室温で
2日間反応させた。次に、この反応@液を500コの2
N塩酸に加え、得られた反応混液を200rll×2回
のクロロボルムで抽出した。抽出液を無水硫酸マグネシ
ウムで乾燥した後、減圧濃縮し、史に50m1のメタノ
ールを加えて生成物を結晶化させ、融点123〜124
6C2分解温度140〜150℃の結晶生成物1.5t
を得た。
Example 5 2-Brom-1,3-di(p-azidophenyl)-2-f Lopen-1-one 2,3-dibrom-1,3
-(P-azidophenyl)propan-1-one 7F
04 was dissolved in NMP, pyridine 102 was added thereto, and the mixture was allowed to react at room temperature for 2 days. Next, add this reaction@liquid to 500 pieces of 2
In addition to N-hydrochloric acid, the resulting reaction mixture was extracted with 200 rll×chloroborum twice. The extract was dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and 50 ml of methanol was added to the solution to crystallize the product, with a melting point of 123-124.
1.5t of crystalline product with 6C2 decomposition temperature of 140-150℃
I got it.

上記反応を化学式で表わせは、下記のように書くことが
できる。
The above reaction can be expressed as a chemical formula as shown below.

この生成物はスペクトル分析によって題記の化金物であ
ることを確認した。赤外吸収: 2150/XrL’(
N3)。核磁気共鳴:δ7.25 (2重項、9Hz。
This product was confirmed to be the title metal compound by spectral analysis. Infrared absorption: 2150/XrL'(
N3). Nuclear magnetic resonance: δ7.25 (doublet, 9Hz.

2H)、7.3(2重項、9Hz、2H)、7.8(1
重項。
2H), 7.3 (doublet, 9Hz, 2H), 7.8 (1
Heavy items.

IH)、7.9(2重項、9Hz、2H)、8.0(2
重項。
IH), 7.9 (doublet, 9Hz, 2H), 8.0 (2
Heavy items.

9Hz、2H) 実施例62,6−ジ(p−アット−α−グロムヘンシリ
デ/)−4−カルボキシルシクロヘキサノン 2.6−ジプロムー2.6−(rχ−ブロム−p−アジ
ドベンジル)−4−カルy1?キンシクロヘキサノン5
tを30 mlのNMP’に溶解し、ピリジ751を加
えて室温で2日間反応させた。次に、この反応溶液を5
001nl!の2N塩酸に加えた。析出した生成物を吸
引濾過によって集め、300 ml X 3回の水で洗
浄後、更に20m1x1回のメタノールで洗浄し、減圧
乾燥して分解温度110−120℃の生成物3.1fを
得た。
9Hz, 2H) Example 6 2,6-di(p-at-α-glomhensilide/)-4-carboxylcyclohexanone 2,6-dipromu2,6-(rχ-bromo-p-azidobenzyl)-4-caly1 ? Quincyclohexanone 5
t was dissolved in 30 ml of NMP', pyridi751 was added, and the mixture was allowed to react at room temperature for 2 days. Next, add 50% of this reaction solution to
001nl! of 2N hydrochloric acid. The precipitated product was collected by suction filtration, washed 3 times with 300 ml of water, further washed once with 20 ml of methanol, and dried under reduced pressure to obtain product 3.1f with a decomposition temperature of 110-120°C.

上記反応を化学式で表わせは、下記のように書くことが
できる。
The above reaction can be expressed as a chemical formula as shown below.

OOH この生成物はスペクトル分析によって題記の化合物であ
ることを確認した。赤外吸収: 2150cm ”(−
N3)。核磁気共鳴:δ1,5〜3(多重項、5H)。
OOH This product was confirmed to be the title compound by spectral analysis. Infrared absorption: 2150cm ”(-
N3). Nuclear magnetic resonance: δ1,5-3 (multiplet, 5H).

6、i (i重項、2H)、7.15(2M項、9Hz
、4H)+7.65(2i項、9Hz、4H)。
6, i (i multiplet, 2H), 7.15 (2M term, 9Hz
, 4H) + 7.65 (2i term, 9Hz, 4H).

〔発明の効果〕〔Effect of the invention〕

以上詳述したように、本発明による芳香族ビスアジド化
合物は電子密度の高い重原子ノ・口rンを含んでいるの
で、高い放射線吸収効率を有し、放射線感応樹脂用の硬
化剤として用いられることができる。
As detailed above, the aromatic bisazide compound according to the present invention contains heavy atoms with high electron density, so it has high radiation absorption efficiency and can be used as a curing agent for radiation-sensitive resins. be able to.

第1頁の続き QInt、C1,’ 識別記号 庁内整理番号0発 明
 者 児 嶋 充 雅 日立市東町4場内
Continuing from page 1 QInt, C1,' Identification code Internal reference number 0 Inventor Mitsuru Kojima Masaru Hitachi City Higashimachi 4 premises

Claims (1)

【特許請求の範囲】 下記のいずれか一つの一般式で表ノつされること5を特
徴とする含・・ロダン芳香族ビスアジド系放射線感応物
質。 ただし、Xはハロダン、Yは一〇〇−または−N−。 1 2はYが−CH−のとき水素、低級アルキル基、暑 −ol(alは水素葦たは低級アルキル基を表わす)、
はlを表わし、−N3基はベンゼン核の・平うまたはメ
タ位に位置する。
[Scope of Claims] A radiation-sensitive substance containing rhodan aromatic bisazide, characterized in that it is represented by any one of the following general formulas. However, X is Halodan and Y is 100- or -N-. 1 2 is hydrogen, lower alkyl group, hot-ol (al represents hydrogen or lower alkyl group) when Y is -CH-,
represents l, and the -N3 group is located at the planar or meta position of the benzene nucleus.
JP18833283A 1983-10-11 1983-10-11 Radiation-sensitive substance Granted JPS6081158A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18833283A JPS6081158A (en) 1983-10-11 1983-10-11 Radiation-sensitive substance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18833283A JPS6081158A (en) 1983-10-11 1983-10-11 Radiation-sensitive substance

Publications (2)

Publication Number Publication Date
JPS6081158A true JPS6081158A (en) 1985-05-09
JPH0446267B2 JPH0446267B2 (en) 1992-07-29

Family

ID=16221757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18833283A Granted JPS6081158A (en) 1983-10-11 1983-10-11 Radiation-sensitive substance

Country Status (1)

Country Link
JP (1) JPS6081158A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52149116A (en) * 1976-06-07 1977-12-12 Tokyo Ouka Kougiyou Kk Method of forming xxray image
JPS5677844A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS57185037A (en) * 1981-05-08 1982-11-15 Fujitsu Ltd Negative resist for forming micropattern
JPS5840547A (en) * 1981-09-04 1983-03-09 Toshiba Corp Resist with low molecular weight and high resolution
JPS5876829A (en) * 1981-10-31 1983-05-10 Toshiba Corp Low molecular weight resist of high resolution
JPS58122531A (en) * 1982-01-18 1983-07-21 Fujitsu Ltd Formation of pattern

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52149116A (en) * 1976-06-07 1977-12-12 Tokyo Ouka Kougiyou Kk Method of forming xxray image
JPS5677844A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS57185037A (en) * 1981-05-08 1982-11-15 Fujitsu Ltd Negative resist for forming micropattern
JPS5840547A (en) * 1981-09-04 1983-03-09 Toshiba Corp Resist with low molecular weight and high resolution
JPS5876829A (en) * 1981-10-31 1983-05-10 Toshiba Corp Low molecular weight resist of high resolution
JPS58122531A (en) * 1982-01-18 1983-07-21 Fujitsu Ltd Formation of pattern

Also Published As

Publication number Publication date
JPH0446267B2 (en) 1992-07-29

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