JPS60436B2 - 金属表面の電着処理方法 - Google Patents
金属表面の電着処理方法Info
- Publication number
- JPS60436B2 JPS60436B2 JP50146932A JP14693275A JPS60436B2 JP S60436 B2 JPS60436 B2 JP S60436B2 JP 50146932 A JP50146932 A JP 50146932A JP 14693275 A JP14693275 A JP 14693275A JP S60436 B2 JPS60436 B2 JP S60436B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- chromium
- current
- layer
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 27
- 229910052751 metal Inorganic materials 0.000 title claims description 15
- 239000002184 metal Substances 0.000 title claims description 15
- 238000004070 electrodeposition Methods 0.000 title claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 23
- 238000000576 coating method Methods 0.000 claims description 21
- 239000003792 electrolyte Substances 0.000 claims description 21
- 229910052804 chromium Inorganic materials 0.000 claims description 20
- 239000011651 chromium Substances 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 10
- 238000001465 metallisation Methods 0.000 claims description 4
- 150000007524 organic acids Chemical class 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000008151 electrolyte solution Substances 0.000 claims description 3
- 230000005012 migration Effects 0.000 claims description 3
- 238000013508 migration Methods 0.000 claims description 3
- 230000002401 inhibitory effect Effects 0.000 claims description 2
- 235000005985 organic acids Nutrition 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 23
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 18
- 239000000203 mixture Substances 0.000 description 10
- -1 potassium hexafluorosilicate Chemical compound 0.000 description 10
- 238000007747 plating Methods 0.000 description 8
- 229910000831 Steel Inorganic materials 0.000 description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 229940117975 chromium trioxide Drugs 0.000 description 5
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 150000002367 halogens Chemical group 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- VUFILEBJGBVGKR-UHFFFAOYSA-N 2,2-dichlorohexanedioic acid Chemical compound OC(=O)CCCC(Cl)(Cl)C(O)=O VUFILEBJGBVGKR-UHFFFAOYSA-N 0.000 description 3
- QAOJBHRZQQDFHA-UHFFFAOYSA-N 2,3-dichlorobenzoic acid Chemical compound OC(=O)C1=CC=CC(Cl)=C1Cl QAOJBHRZQQDFHA-UHFFFAOYSA-N 0.000 description 3
- XSCRWBSKSVOZOK-UHFFFAOYSA-N 2,3-dichlorobutanedioic acid Chemical compound OC(=O)C(Cl)C(Cl)C(O)=O XSCRWBSKSVOZOK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 3
- 229960004319 trichloroacetic acid Drugs 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- NDUPDOJHUQKPAG-UHFFFAOYSA-N Dalapon Chemical compound CC(Cl)(Cl)C(O)=O NDUPDOJHUQKPAG-UHFFFAOYSA-N 0.000 description 2
- 125000000218 acetic acid group Chemical class C(C)(=O)* 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 150000001278 adipic acid derivatives Chemical class 0.000 description 2
- 150000007933 aliphatic carboxylic acids Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical class O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 229960005215 dichloroacetic acid Drugs 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical class O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- DUKLUIAXHKCMQI-UHFFFAOYSA-N 2,2-dichloropropanedioic acid Chemical compound OC(=O)C(Cl)(Cl)C(O)=O DUKLUIAXHKCMQI-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000002000 Electrolyte additive Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910020440 K2SiF6 Inorganic materials 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 241000282330 Procyon lotor Species 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 159000000032 aromatic acids Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- AXZAYXJCENRGIM-UHFFFAOYSA-J dipotassium;tetrabromoplatinum(2-) Chemical compound [K+].[K+].[Br-].[Br-].[Br-].[Br-].[Pt+2] AXZAYXJCENRGIM-UHFFFAOYSA-J 0.000 description 1
- 238000002265 electronic spectrum Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000009916 joint effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- HAPIXNBOBZHNCA-UHFFFAOYSA-N methyl 4-methyl-3-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)benzoate Chemical compound COC(=O)C1=CC=C(C)C(B2OC(C)(C)C(C)(C)O2)=C1 HAPIXNBOBZHNCA-UHFFFAOYSA-N 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 150000003112 potassium compounds Chemical class 0.000 description 1
- 229910001487 potassium perchlorate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1650174 | 1974-12-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5183839A JPS5183839A (en) | 1976-07-22 |
| JPS60436B2 true JPS60436B2 (ja) | 1985-01-08 |
Family
ID=4417922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50146932A Expired JPS60436B2 (ja) | 1974-12-11 | 1975-12-11 | 金属表面の電着処理方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4092226A (enExample) |
| JP (1) | JPS60436B2 (enExample) |
| CA (1) | CA1076988A (enExample) |
| DE (1) | DE2555834C2 (enExample) |
| FR (1) | FR2294251A1 (enExample) |
| GB (1) | GB1534150A (enExample) |
| SE (1) | SE431995B (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0041085A1 (en) * | 1980-06-02 | 1981-12-09 | M & T Chemicals, Inc. | Chromium plating process, composition therefor and chromium plating solution |
| JPS60128289A (ja) * | 1983-12-12 | 1985-07-09 | Orient Watch Co Ltd | 複合めつき方法 |
| IT1215985B (it) * | 1988-03-04 | 1990-02-22 | Elca Srl | Procedimento elettrochimico per la realizzazione di rivestimenti di cromo e metalli simili mediante corrente pulsante ad inversione periodica della polarita' |
| DE3933896C1 (enExample) * | 1989-10-11 | 1990-10-11 | Lpw-Chemie Gmbh, 4040 Neuss, De | |
| US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
| US5829240A (en) * | 1997-03-17 | 1998-11-03 | A. B. Carter, Inc. | Spinning ring having improved traveler bearing surface |
| RU2125125C1 (ru) * | 1997-12-24 | 1999-01-20 | Малинин Владимир Федорович | Способ электролитического хромирования |
| RU2125126C1 (ru) * | 1998-01-27 | 1999-01-20 | Малинин Владимир Федорович | Способ электролитического хромирования в низкоконцентрированном электролите |
| US6946065B1 (en) | 1998-10-26 | 2005-09-20 | Novellus Systems, Inc. | Process for electroplating metal into microscopic recessed features |
| US6793796B2 (en) | 1998-10-26 | 2004-09-21 | Novellus Systems, Inc. | Electroplating process for avoiding defects in metal features of integrated circuit devices |
| US6309916B1 (en) | 1999-11-17 | 2001-10-30 | Amkor Technology, Inc | Method of molding plastic semiconductor packages |
| US6360520B2 (en) | 2000-01-14 | 2002-03-26 | Ab Carter, Inc. | Spinning ring having amorphous chromium bearing surface |
| US6478943B1 (en) | 2000-06-01 | 2002-11-12 | Roll Surface Technologies, Inc. | Method of manufacture of electrochemically textured surface having controlled peak characteristics |
| JP3423702B2 (ja) * | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
| CA2450283C (en) * | 2001-07-05 | 2008-10-28 | Roll Surface Technologies, Inc. | Electrochemically textured surface having controlled peak characteristics and the method of manufacture |
| US7011067B2 (en) * | 2002-08-19 | 2006-03-14 | Trw | Chrome plated engine valve |
| US10011917B2 (en) | 2008-11-07 | 2018-07-03 | Lam Research Corporation | Control of current density in an electroplating apparatus |
| US11225727B2 (en) | 2008-11-07 | 2022-01-18 | Lam Research Corporation | Control of current density in an electroplating apparatus |
| US9385035B2 (en) | 2010-05-24 | 2016-07-05 | Novellus Systems, Inc. | Current ramping and current pulsing entry of substrates for electroplating |
| US9028666B2 (en) | 2011-05-17 | 2015-05-12 | Novellus Systems, Inc. | Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath |
| US8557397B2 (en) * | 2011-12-29 | 2013-10-15 | Arcanum Alloy Design Inc. | Metallurgically bonded stainless steel |
| CN103132114B (zh) * | 2013-03-21 | 2016-02-10 | 湖南特力液压有限公司 | 耐磨工件及其耐磨镀层的制造方法 |
| WO2016130548A1 (en) | 2015-02-10 | 2016-08-18 | Arcanum Alloy Design, Inc. | Methods and systems for slurry coating |
| CN104846409A (zh) * | 2015-04-30 | 2015-08-19 | 云南民族大学 | 高钨含量且无裂纹的钨镍合金镀层及电镀液和电镀工艺 |
| US10851464B1 (en) * | 2015-05-12 | 2020-12-01 | Hitachi Automotive Systems, Ltd. | Method for producing chromium plated parts, and chromium plating apparatus |
| WO2017201418A1 (en) | 2016-05-20 | 2017-11-23 | Arcanum Alloys, Inc. | Methods and systems for coating a steel substrate |
| CN106119726B (zh) * | 2016-08-11 | 2017-12-12 | 宁波市鄞州亚大汽车管件有限公司 | 一种扣压套管接头的制备方法 |
| JP7349427B2 (ja) * | 2018-07-03 | 2023-09-22 | 株式会社Jcu | ３価クロムメッキ液およびこれを用いたクロムメッキ方法 |
| CN110055389B (zh) * | 2019-04-18 | 2020-12-29 | 北京科技大学 | 一种连续电脉冲室温快速消除固体金属中氢的方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1527734A (en) * | 1922-12-14 | 1925-02-24 | Electrolytic Corp | Apparatus and method for electrolytically depositing metals |
| US1918605A (en) * | 1928-01-09 | 1933-07-18 | Parker Rust Proof Co | Chromium plating |
| GB406767A (en) * | 1932-09-21 | 1934-03-08 | Grace Ellen Adey | A process and apparatus for effecting the electro-deposition of metals |
| FR960114A (enExample) * | 1942-05-04 | 1950-04-13 | ||
| GB591783A (en) * | 1943-10-16 | 1947-08-28 | Westinghouse Electric Int Co | Improvements in or relating to the electro deposition of metals |
| US2852447A (en) * | 1955-10-21 | 1958-09-16 | Hausner Johann Karl | Method of electrodepositing chromium |
| DE1421984A1 (de) * | 1962-10-01 | 1968-11-07 | Forsch Edelmetalle Und Metallc | Verfahren zur Herstellung von rissfreien Chromueberzuegen |
| US3282812A (en) * | 1964-02-20 | 1966-11-01 | Udylite Corp | Electrodeposition of chromium |
| GB1128465A (en) * | 1964-10-08 | 1968-09-25 | M & T Chemicals Inc | Improvements in or relating to electrodeposition of chromium |
| US3318786A (en) * | 1964-10-16 | 1967-05-09 | Diamond Alkali Co | Chromium plating |
| DE1290782B (de) * | 1964-12-28 | 1969-03-13 | M & T Chemicals Inc | Galvanisches Chrombad |
| FR1476180A (fr) * | 1965-04-16 | 1967-04-07 | M & T Cheicals | Procédé de chromage |
| CH482839A (de) * | 1965-04-16 | 1969-12-15 | M & T Chemicals Inc | Verfahren zum galvanischen Glanzverchromen |
| US3414492A (en) * | 1965-12-14 | 1968-12-03 | Corillium Corp | Chromium plating process |
| FR1540853A (fr) * | 1966-12-15 | 1968-09-27 | Ibm | Procédé de revêtement de films magnétiques |
| US3616434A (en) * | 1968-04-18 | 1971-10-26 | Novachrome Inc | Apparatus with power source for plating |
| GB1291566A (en) * | 1968-12-13 | 1972-10-04 | Canning & Co Ltd W | A method of electro-depositing micro cracked chromium |
| GB1322152A (en) * | 1971-01-27 | 1973-07-04 | Alkan Ltd M L | Chromium electro plating |
| US3886053A (en) * | 1973-11-01 | 1975-05-27 | James M Leland | Programmable pulse electroplating process |
-
1975
- 1975-12-08 US US05/638,928 patent/US4092226A/en not_active Expired - Lifetime
- 1975-12-10 CA CA241,449A patent/CA1076988A/en not_active Expired
- 1975-12-10 SE SE7513958A patent/SE431995B/xx not_active IP Right Cessation
- 1975-12-10 FR FR7538403A patent/FR2294251A1/fr active Granted
- 1975-12-10 GB GB50614/75A patent/GB1534150A/en not_active Expired
- 1975-12-11 DE DE2555834A patent/DE2555834C2/de not_active Expired
- 1975-12-11 JP JP50146932A patent/JPS60436B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE431995B (sv) | 1984-03-12 |
| GB1534150A (en) | 1978-11-29 |
| FR2294251B1 (enExample) | 1980-09-19 |
| DE2555834C2 (de) | 1983-10-06 |
| US4092226A (en) | 1978-05-30 |
| CA1076988A (en) | 1980-05-06 |
| SE7513958L (sv) | 1976-06-14 |
| FR2294251A1 (fr) | 1976-07-09 |
| DE2555834A1 (de) | 1976-06-16 |
| JPS5183839A (en) | 1976-07-22 |
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| Zelley | Formation of immersion zinc coatings on aluminum | |
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| EP3241928B1 (en) | Trivalent chromium plating formulations and processes | |
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| US4167459A (en) | Electroplating with Ni-Cu alloy | |
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| US3729396A (en) | Rhodium plating composition and method for plating rhodium | |
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| US4806226A (en) | Process for electrolytically coloring aluminum material | |
| NO784051L (no) | Fremgangsmaate til fremstilling av blanke til skinnende, galvaniske zinkutfellinger og sur vandig pletteringsopploesning til utfoerelse av fremgangsmaaten | |
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| JPH0319306B2 (enExample) | ||
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| JPS6017096A (ja) | 電極の製造法 | |
| Al-Said et al. | The influence of additions on the electrodeposition of the alloy of Co-Zn from a new eutectic deep solvent. | |
| Chitharanjan Hegde et al. | Electrodeposition and characterization Zn-Co alloy |