JPS6034258B2 - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS6034258B2
JPS6034258B2 JP55080354A JP8035480A JPS6034258B2 JP S6034258 B2 JPS6034258 B2 JP S6034258B2 JP 55080354 A JP55080354 A JP 55080354A JP 8035480 A JP8035480 A JP 8035480A JP S6034258 B2 JPS6034258 B2 JP S6034258B2
Authority
JP
Japan
Prior art keywords
semiconductor element
plate
ceramic base
metal plate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55080354A
Other languages
English (en)
Other versions
JPS575341A (en
Inventor
修一 大坂
透 立川
俊一 上村
栄三 伊藤
敏信 番條
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP55080354A priority Critical patent/JPS6034258B2/ja
Publication of JPS575341A publication Critical patent/JPS575341A/ja
Publication of JPS6034258B2 publication Critical patent/JPS6034258B2/ja
Expired legal-status Critical Current

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    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/291Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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Description

【発明の詳細な説明】 この発明はセラミックベースとセラミックキャツプとか
らなるパッケージ内に半導体素子を封入してなる半導体
装置の改良に関するものである。
この種の半導体装置として、セラミックベース表面の所
定位置にAu又はAgペーストを塗布してその上に半導
体素子を固着し、上記セラミックベースに外部リードを
介在させてセラミックキャップをガラスで中空型に封着
した詔ゆるサーディッブ型半導体装置がある。第1図は
通常のサーディップ型半導体装置を示す図であり、1は
セラミックベース、2はセラミックベースー表面の所定
位置に塗布されたAu又はAgペースト、3は半導体素
子、4はAuまたはAgペースト2の半導体素子3を固
着するためのAuSj共晶合金、5は金属外部リード、
6は金属外部リード5と半導体素子3の所定位置を接続
する金属細線、7はセラミックキャップ、8はセラミッ
クベース1とセラミックキャップ7および金属外部リー
ド5を固着、封止するガラスである。
この従来例では、Au又はAgペースト2は、ガラスフ
リットにAu又はAgを混ぜて、セラミックベース1上
に焼き付けた構造となっている。従って、その表面には
、Au又はAgの他にガラスフリット中の各種の酸化物
が存在し、半導体素子3を固着するための各種のロー材
の濡れ性は良くない。このため、半導体素子3をAu又
はAgペースト2上に固着しようとすると多量のAuS
i共晶合金4を必要とし、かつ、人手作業にたよらざる
を得ない。このように装置はAuを主体した高価な材料
を使うことおよび人手作業によらなければならないため
作業時間が長いという欠点があった。また従来よりAu
系共晶合金を用いない半導体素子の固着方法として、実
公昭54−7486号公報に示されるように、半導体素
子に金属板を一体的に取付け、その金属板をパッケージ
のベースに半田付けすることによって半導体素子をパッ
ケージに固着する方法が知られているが、この方法はパ
ッケージのベースが金属製の場合に限られ、セラミック
ベースの場合には適用できないものであった。本発明は
このような点に鑑みてなされたもので、Auを主体とし
た高価な材料の使用を避け、安価かつ容易に組立てるこ
とができる半導体装置を提供することを目的とする。第
2図は本発明の一実施例を示す断面図である。図におい
て、1はセラミックベースで、その半導体素子3を固着
す領域にはあらかじめ凹部が設けられ、ガラス層10が
塗布されている。ガラス層10の上には、ガラスやセラ
ミックと熱膨張係数が比較的近い、Fe−Ni合金板の
表面にAgをメッキ又はA期薄板を圧着して構成したA
g表面を有する金属板11が固着されている。なお表面
層を形成する物質としては、Agの他にCuのような半
田付け可能なものを用いることができる。このように、
Ag表面を有する金属板11を素子固着領域に設けるこ
とにより、Au系共晶合金を使用しなくても、比較的安
価なAg系やPb系の合金半田12によって金属板11
に半導体素子3を固着することが可能となる。なお、半
導体素子3は、上記Ag系又はPb系の合金半田12と
接着可能なように裏面を金属化している。以上の様に構
成された半導体装置においては、Pb系もしくはAg系
の半田はFe−Ni合金板の表面に被着されたAg層及
び半導体素子の金属化面とは非常に接着性が良く、ガラ
スもまたFe−Ni合金板の表面に被着されたAg層及
びセラミックとは非常に接着性が良いので、セラミック
ベースと半導体素子を固着する際の信頼性が非常に良い
ものである。
更に、上記金属板は、Fe−Niの合金板の表面にAg
層を被着したものであるので、金属板の厚さが厚いため
に半田及びガラスを用いてセラミックベース半導体素子
を固着する際の取り扱いが容易となるものであり、しか
も、金属板としてのFe−Niの合金板の熱膨張係数が
セラミック及びガラスに比較的近いので、製造時及び装
置完成後における素子動作時において金属板とガラス層
及びセラミックとの熱膨張係数の相違による熱歪がほと
んどなく、金属板とセラミックベースとの固着状態が変
化することかないという効果を有するものである。とこ
ろで、半導体素子3がMOSLSIの場合には、半導体
素子3の裏面側よりの電気入力が必要な場合が生じる。
この場合、外部金属リード5の所定リードと、素子3を
固着した金属板11とを金属紬線6で接続すればよいが
、このような中空型パッケージに多く使用れている金属
細線6の材質は、N線もしくはAI/Su合金線である
。この山線もしくはN/Si合金線を金属板1 1のA
g表面に直接接続した場合、Agのマィグレーションに
より接続部に欠陥を発生し、断線事故を発生する。この
ような不都合をなくすために、金属紬線6とAg表面を
有する金属板11との間に、金属小片14を入れる。こ
の金属小片14の表面にはN薄膜15が圧接されており
、金属小片14の裏面にはAg系又はPb系合金半田に
濡れやすい金属薄膜16が圧接されている。すなわち、
金属小片14は、両面クラッド金属片で構成されている
。このような金属小片14を金属細線6とAg表面を有
する金属板11との間に設けることにより本接合部の信
頼度は十分に向上する。上記した半導体装置の製造手順
は以下の様に行われる金のである。
まずセラミックベース1の凹部にガラス層10を徒布し
、次にFe−Niの合金板の表面にAgがメッキされ又
はAg薄板が圧着されて予めAg層が被着れた金属板1
1をガラス層10上に固着する。その後半田12によ
って金属板11との対向面が予め金属化された半導体素
子3及び金属小片14を固着し、更に半導体素子3およ
び金属小片14に金属紬線6を施した後、ガラス8によ
ってセラミックベース1とセラミックキャップ7及び金
属外部リード5を固着して第2図に示す様なものを得る
のである。以上のように本発明によれば、セラミックベ
ースと固着面が金属化された半導体素子との間に金属板
を介在して、材料費の安い半田により金属板と半導体素
子を、ガラスにより金属板とセラミックベースをそれぞ
れ固着してセラミックベースと半導体素子の固着を行な
ったものであり、しかも金属板自体を材料費の安いFe
−Niの合金板の表面にAg層を被着したものとしたの
で、固着における信頼性を損なうことなく、セラミック
ベースと半導体素子の固着に要する全体の材料費が非常
に安価となるという効果を有するものであ。
更に製造に際して取り扱い易い金属板並びに半田及びガ
ラスを用いているため、従来方法で示した焼き付け方法
或いは共晶合金方法に比較して固着する際の方法が非常
に容易となるという効果を有するものである。
【図面の簡単な説明】
第1図は従来の半導体装置を示す断面図、第2図はこの
発明の一実施例を示す断面図である。 図において、1はセラミックベース、3は半導体素子、
7はセラミックキャップ、8は封止用ガラス、1川まガ
ラス層、11は金属板、12は合金半田である。なお、
図中同一符号は同一又は相当部分を示す。第1図 第2図

Claims (1)

  1. 【特許請求の範囲】 1 セラミツクベースと、このセラミツクベース上に設
    けられ、Fe−Ni合金板の少なくとも−表面にAg層
    が被着された金属板と、この金属板を上記セラミツクベ
    ースに固着するガラス層と、上記金属板上に設けられ、
    上記金属板のAg層との対向面が金属化された半導体素
    子と、その半導体素子の金属化層と上記金属板のAg層
    との間に介在し、半導体素子と金属板とを固着するAg
    系もしくはPb系の半田と、上記セラミツクベースに固
    着されて上記セラミツクベースと共に上記半導体素子を
    封止するセラミツクキヤツプとを備えた半導体装置。 2 Fe−Ni合金板の表面のAg層は、Agをメツキ
    したもの又はAg薄板を圧着によつて被着したものであ
    ることを特徴とする特許請求の範囲第1頁記載の半導体
    装置。
JP55080354A 1980-06-12 1980-06-12 半導体装置 Expired JPS6034258B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55080354A JPS6034258B2 (ja) 1980-06-12 1980-06-12 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55080354A JPS6034258B2 (ja) 1980-06-12 1980-06-12 半導体装置

Publications (2)

Publication Number Publication Date
JPS575341A JPS575341A (en) 1982-01-12
JPS6034258B2 true JPS6034258B2 (ja) 1985-08-07

Family

ID=13715912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55080354A Expired JPS6034258B2 (ja) 1980-06-12 1980-06-12 半導体装置

Country Status (1)

Country Link
JP (1) JPS6034258B2 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60167449A (ja) * 1984-02-10 1985-08-30 Mitsubishi Electric Corp 半導体装置
JPS63136534A (ja) * 1986-11-27 1988-06-08 Nec Corp 半導体装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS547486U (ja) * 1977-06-20 1979-01-18

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503090U (ja) * 1973-05-09 1975-01-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS547486U (ja) * 1977-06-20 1979-01-18

Also Published As

Publication number Publication date
JPS575341A (en) 1982-01-12

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