JPS60140847A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS60140847A
JPS60140847A JP25003183A JP25003183A JPS60140847A JP S60140847 A JPS60140847 A JP S60140847A JP 25003183 A JP25003183 A JP 25003183A JP 25003183 A JP25003183 A JP 25003183A JP S60140847 A JPS60140847 A JP S60140847A
Authority
JP
Japan
Prior art keywords
layer
electrode
insulating film
metal
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25003183A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0441498B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Watabe
渡部　潔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP25003183A priority Critical patent/JPS60140847A/ja
Publication of JPS60140847A publication Critical patent/JPS60140847A/ja
Publication of JPH0441498B2 publication Critical patent/JPH0441498B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP25003183A 1983-12-28 1983-12-28 半導体装置 Granted JPS60140847A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25003183A JPS60140847A (ja) 1983-12-28 1983-12-28 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25003183A JPS60140847A (ja) 1983-12-28 1983-12-28 半導体装置

Publications (2)

Publication Number Publication Date
JPS60140847A true JPS60140847A (ja) 1985-07-25
JPH0441498B2 JPH0441498B2 (enrdf_load_stackoverflow) 1992-07-08

Family

ID=17201801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25003183A Granted JPS60140847A (ja) 1983-12-28 1983-12-28 半導体装置

Country Status (1)

Country Link
JP (1) JPS60140847A (enrdf_load_stackoverflow)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52124860A (en) * 1976-04-13 1977-10-20 Toshiba Corp Electrode formation method for semiconductor devices
JPS5544713A (en) * 1978-09-26 1980-03-29 Toshiba Corp Semiconductor device
JPS5660030A (en) * 1979-10-22 1981-05-23 Toshiba Corp Manufacture of semiconductor device
JPS56162829A (en) * 1980-05-20 1981-12-15 Nec Corp Manufacture of semiconductor device
JPS57176762A (en) * 1981-04-22 1982-10-30 Nec Corp Semiconductor device
JPS5873135A (ja) * 1981-10-28 1983-05-02 Nec Corp 半導体装置とその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52124860A (en) * 1976-04-13 1977-10-20 Toshiba Corp Electrode formation method for semiconductor devices
JPS5544713A (en) * 1978-09-26 1980-03-29 Toshiba Corp Semiconductor device
JPS5660030A (en) * 1979-10-22 1981-05-23 Toshiba Corp Manufacture of semiconductor device
JPS56162829A (en) * 1980-05-20 1981-12-15 Nec Corp Manufacture of semiconductor device
JPS57176762A (en) * 1981-04-22 1982-10-30 Nec Corp Semiconductor device
JPS5873135A (ja) * 1981-10-28 1983-05-02 Nec Corp 半導体装置とその製造方法

Also Published As

Publication number Publication date
JPH0441498B2 (enrdf_load_stackoverflow) 1992-07-08

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