JPS5941509B2 - 強付着性の特に硬質炭素層を大きな面積に蒸着するための装置 - Google Patents

強付着性の特に硬質炭素層を大きな面積に蒸着するための装置

Info

Publication number
JPS5941509B2
JPS5941509B2 JP13680180A JP13680180A JPS5941509B2 JP S5941509 B2 JPS5941509 B2 JP S5941509B2 JP 13680180 A JP13680180 A JP 13680180A JP 13680180 A JP13680180 A JP 13680180A JP S5941509 B2 JPS5941509 B2 JP S5941509B2
Authority
JP
Japan
Prior art keywords
hot cathode
substrate
vapor deposition
anode
deposition apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13680180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56102576A (en
Inventor
ヘルム−ト・ボリンゲル
ベルント・ビユツケン
リユ−デイゲル・ウイルベルク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BEBU HOOHIBAAKUMU DORESUDEN
Original Assignee
BEBU HOOHIBAAKUMU DORESUDEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BEBU HOOHIBAAKUMU DORESUDEN filed Critical BEBU HOOHIBAAKUMU DORESUDEN
Publication of JPS56102576A publication Critical patent/JPS56102576A/ja
Publication of JPS5941509B2 publication Critical patent/JPS5941509B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP13680180A 1979-10-02 1980-10-02 強付着性の特に硬質炭素層を大きな面積に蒸着するための装置 Expired JPS5941509B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD23G/21595 1979-10-02
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten

Publications (2)

Publication Number Publication Date
JPS56102576A JPS56102576A (en) 1981-08-17
JPS5941509B2 true JPS5941509B2 (ja) 1984-10-08

Family

ID=5520396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13680180A Expired JPS5941509B2 (ja) 1979-10-02 1980-10-02 強付着性の特に硬質炭素層を大きな面積に蒸着するための装置

Country Status (4)

Country Link
JP (1) JPS5941509B2 (de)
CH (1) CH653708A5 (de)
DD (1) DD146307A1 (de)
DE (1) DE3030454C2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
DE3246361A1 (de) * 1982-02-27 1983-09-08 Philips Patentverwaltung Gmbh, 2000 Hamburg Kohlenstoff enthaltende gleitschicht
US6804791B2 (en) 1990-03-23 2004-10-12 Matsushita Electric Industrial Co., Ltd. Data processing apparatus
JPH0560537U (ja) * 1992-01-22 1993-08-10 弘 小川 厨房用塵芥処理装置
JP4080503B2 (ja) 2005-10-03 2008-04-23 中部日本マルコ株式会社 非接触コネクタ

Also Published As

Publication number Publication date
JPS56102576A (en) 1981-08-17
DD146307A1 (de) 1981-02-04
DE3030454C2 (de) 1987-04-02
CH653708A5 (en) 1986-01-15
DE3030454A1 (de) 1981-04-16

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