JPS5932895B2 - 半導体装置およびその製造方法 - Google Patents

半導体装置およびその製造方法

Info

Publication number
JPS5932895B2
JPS5932895B2 JP49115359A JP11535974A JPS5932895B2 JP S5932895 B2 JPS5932895 B2 JP S5932895B2 JP 49115359 A JP49115359 A JP 49115359A JP 11535974 A JP11535974 A JP 11535974A JP S5932895 B2 JPS5932895 B2 JP S5932895B2
Authority
JP
Japan
Prior art keywords
film
semiconductor device
entire surface
organic film
bonding pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49115359A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5141964A (show.php
Inventor
忠宏 橋本
泰史 奥山
政志 向川
幸一郎 高畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP49115359A priority Critical patent/JPS5932895B2/ja
Publication of JPS5141964A publication Critical patent/JPS5141964A/ja
Publication of JPS5932895B2 publication Critical patent/JPS5932895B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP49115359A 1974-10-07 1974-10-07 半導体装置およびその製造方法 Expired JPS5932895B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49115359A JPS5932895B2 (ja) 1974-10-07 1974-10-07 半導体装置およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49115359A JPS5932895B2 (ja) 1974-10-07 1974-10-07 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
JPS5141964A JPS5141964A (show.php) 1976-04-08
JPS5932895B2 true JPS5932895B2 (ja) 1984-08-11

Family

ID=14660565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49115359A Expired JPS5932895B2 (ja) 1974-10-07 1974-10-07 半導体装置およびその製造方法

Country Status (1)

Country Link
JP (1) JPS5932895B2 (show.php)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558555A (en) * 1978-10-25 1980-05-01 Hitachi Ltd Electronic device and its manufacture
JPS5846652A (ja) * 1981-09-14 1983-03-18 Fujitsu Ltd 多層配線形成方法
JPS58101439A (ja) * 1981-12-12 1983-06-16 Toshiba Corp 半導体装置の製造方法
JPH076009B2 (ja) * 1985-09-03 1995-01-25 三菱化成株式会社 光磁気ディスク用磁性金属材料の製造方法
US4849164A (en) * 1988-02-29 1989-07-18 General Motors Corporation Method of producing iron powder article
JP2786029B2 (ja) * 1991-08-06 1998-08-13 九州日本電気株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS5141964A (show.php) 1976-04-08

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