JPS59212833A - 感光性耐熱材料 - Google Patents

感光性耐熱材料

Info

Publication number
JPS59212833A
JPS59212833A JP8787983A JP8787983A JPS59212833A JP S59212833 A JPS59212833 A JP S59212833A JP 8787983 A JP8787983 A JP 8787983A JP 8787983 A JP8787983 A JP 8787983A JP S59212833 A JPS59212833 A JP S59212833A
Authority
JP
Japan
Prior art keywords
acid
general formula
represented
formula
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8787983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Shigeru Kubota
繁 久保田
Norimoto Moriwaki
森脇　紀元
Torahiko Ando
虎彦 安藤
Shohei Eto
江藤　昌平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8787983A priority Critical patent/JPS59212833A/ja
Publication of JPS59212833A publication Critical patent/JPS59212833A/ja
Publication of JPH0159569B2 publication Critical patent/JPH0159569B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Formation Of Insulating Films (AREA)
JP8787983A 1983-05-17 1983-05-17 感光性耐熱材料 Granted JPS59212833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8787983A JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8787983A JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS59212833A true JPS59212833A (ja) 1984-12-01
JPH0159569B2 JPH0159569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-12-18

Family

ID=13927147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8787983A Granted JPS59212833A (ja) 1983-05-17 1983-05-17 感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS59212833A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02311563A (ja) * 1989-05-26 1990-12-27 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US6013414A (en) * 1991-10-25 2000-01-11 International Business Machines Corporation Photosensitive polyimide-precursor formulation
JP2023085410A (ja) * 2020-01-30 2023-06-20 旭化成株式会社 ネガ型感光性樹脂組成物及び硬化レリーフパターンの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02311563A (ja) * 1989-05-26 1990-12-27 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US6013414A (en) * 1991-10-25 2000-01-11 International Business Machines Corporation Photosensitive polyimide-precursor formulation
JP2023085410A (ja) * 2020-01-30 2023-06-20 旭化成株式会社 ネガ型感光性樹脂組成物及び硬化レリーフパターンの製造方法

Also Published As

Publication number Publication date
JPH0159569B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-12-18

Similar Documents

Publication Publication Date Title
JP2890213B2 (ja) 感光性重合体組成物及びパターンの形成方法
JP3211108B2 (ja) 感光性樹脂組成物
JP2826940B2 (ja) ｉ線露光用感光性組成物
JPS59108031A (ja) 感光性ポリイミド
US5399460A (en) Negative photoresists containing aminoacrylate salts
JPH07271034A (ja) 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法
JPH0567026B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6026033A (ja) 感光性ポリアミド酸誘導体およびこれを用いて基体上にポリイミドパタ−ンを形成する方法
JPH0159571B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH1195431A (ja) 感光性樹脂組成物、それを用いた樹脂膜の製造法及び物品
JPS59232122A (ja) 有機溶媒可溶性の感光性ポリイミド
JPS62184056A (ja) 感光性組成物
JP2000147768A (ja) ネガ型感光性ポリイミド組成物及び絶縁膜
JPS606729A (ja) 有機溶媒に可溶性の感光性ポリイミド
JPS59212833A (ja) 感光性耐熱材料
JP3093055B2 (ja) 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法
JPH02261862A (ja) 光重合性樹脂組成物
JPS59212834A (ja) 感光性耐熱材料
JPH11271973A (ja) 感光性樹脂組成物及びこれを用いた半導体素子
JPH0792682A (ja) 感光性樹脂組成物及びレリーフパターンの製造法
JPS59212832A (ja) 感光性耐熱材料
JP2511651B2 (ja) パタ−ンを形成する方法
JPH0153969B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH05224419A (ja) ポリイミド微細パターンの形成方法
JP3040866B2 (ja) 感光性樹脂組成物