JPS5919130B2 - ビニル基とカルボキシル基を含んでいる橋かけ可能なウレタン樹脂の製法 - Google Patents

ビニル基とカルボキシル基を含んでいる橋かけ可能なウレタン樹脂の製法

Info

Publication number
JPS5919130B2
JPS5919130B2 JP51150971A JP15097176A JPS5919130B2 JP S5919130 B2 JPS5919130 B2 JP S5919130B2 JP 51150971 A JP51150971 A JP 51150971A JP 15097176 A JP15097176 A JP 15097176A JP S5919130 B2 JPS5919130 B2 JP S5919130B2
Authority
JP
Japan
Prior art keywords
ether
groups
acid
benzoin
ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51150971A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5276399A (en
Inventor
ハンス・ユルゲン・ローゼンクランツ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Publication of JPS5276399A publication Critical patent/JPS5276399A/ja
Publication of JPS5919130B2 publication Critical patent/JPS5919130B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/6705—Unsaturated polymers not provided for in the groups C08G18/671, C08G18/6795, C08G18/68 or C08G18/69
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
JP51150971A 1975-12-19 1976-12-17 ビニル基とカルボキシル基を含んでいる橋かけ可能なウレタン樹脂の製法 Expired JPS5919130B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2557408A DE2557408C2 (de) 1975-12-19 1975-12-19 Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung

Publications (2)

Publication Number Publication Date
JPS5276399A JPS5276399A (en) 1977-06-27
JPS5919130B2 true JPS5919130B2 (ja) 1984-05-02

Family

ID=5964937

Family Applications (2)

Application Number Title Priority Date Filing Date
JP51150971A Expired JPS5919130B2 (ja) 1975-12-19 1976-12-17 ビニル基とカルボキシル基を含んでいる橋かけ可能なウレタン樹脂の製法
JP58135263A Granted JPS5936246A (ja) 1975-12-19 1983-07-26 樹脂組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP58135263A Granted JPS5936246A (ja) 1975-12-19 1983-07-26 樹脂組成物

Country Status (7)

Country Link
US (1) US4162274A (enExample)
JP (2) JPS5919130B2 (enExample)
DE (1) DE2557408C2 (enExample)
FR (1) FR2335544A1 (enExample)
GB (1) GB1537909A (enExample)
IT (1) IT1069809B (enExample)
NL (1) NL7614061A (enExample)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4296215A (en) * 1978-07-27 1981-10-20 Ici Americas Inc. Method to thicken dissolved thermoset resins
DE2841880A1 (de) * 1978-09-26 1980-04-03 Bayer Ag Trockenfotoresistmaterial
DE3005009A1 (de) * 1980-02-11 1981-08-20 Basf Ag, 6700 Ludwigshafen Magnetische aufzeichnungstraeger
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
US4338242A (en) * 1980-09-19 1982-07-06 The Dow Chemical Company Urethane modified polymers having hydroxyl groups
US4383091A (en) * 1980-09-19 1983-05-10 The Dow Chemical Company Urethane modified polymers having hydroxyl groups
AT366082B (de) * 1980-09-25 1982-03-10 Vianova Kunstharz Ag Bindemittelkombination fuer kathodisch abscheidbare lacke
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4424316A (en) 1981-10-08 1984-01-03 Stauffer Chemical Company Compositions for forming poly(oxazolidone/urethane) thermosets and products therefrom
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
DE3367781D1 (en) * 1982-04-03 1987-01-08 Ciba Geigy Ag Process for preparing prepregs from fibres that contain cellulose using aqueous resin compositions
US4393181A (en) * 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
BR8208087A (pt) * 1982-07-02 1984-07-17 Dow Chemical Co Resinas ester-vinilicas modificadas com uretano,contendo grupos hidroxilicos secundarios
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61132947A (ja) * 1984-11-30 1986-06-20 Hitachi Chem Co Ltd 感光性樹脂組成物
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
JPS61200536A (ja) * 1985-03-01 1986-09-05 Hitachi Chem Co Ltd 感光性組成物
DE3508450A1 (de) * 1985-03-09 1986-09-11 Rütgerswerke AG, 6000 Frankfurt Durch strahlung vernetzbare bindemittel und ihre verwendung
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61264341A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPH07120041B2 (ja) * 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
JPH07120040B2 (ja) * 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
JPH07120042B2 (ja) * 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
US4910281A (en) * 1987-09-22 1990-03-20 Minnesota Mining And Manufacturing Company Acryloyloxy and methacryloyloxy group-containing condensation polymers
US4921930A (en) * 1987-09-22 1990-05-01 Minnesota Mining And Manufacturing Company Acryloyloxy and methacryloyloxy group-containing condensation polymers
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
US4956265A (en) * 1988-02-03 1990-09-11 Minnesota Mining And Manufacturing Company Radiation crosslinkable compositions
US4914165A (en) * 1988-02-03 1990-04-03 Minnesota Mining And Manufacturing Company Radiation crosslinkable compositions
JP2610468B2 (ja) * 1988-02-24 1997-05-14 日本合成ゴム株式会社 放射線硬化性ポリウレタンの製造方法
JPH0217698A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 高密度プリント回路板の製造方法
JPH0217697A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 高密度プリント回路板の製造方法
US5091475A (en) * 1989-07-17 1992-02-25 Mobay Corporation Powder coatings with flat finishes
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
US6045857A (en) * 1997-06-19 2000-04-04 Macdermid Acumen, Inc. Curable, water-borne one-component coating system using thermally labile hydrophillic groups
US6268111B1 (en) * 1999-10-20 2001-07-31 Rohm And Haas Company Photoimageable composition having photopolymerizeable binder oligomer
US6472493B1 (en) 1999-11-23 2002-10-29 E. I. Du Pont De Nemours And Company Clear coating composition having improved early hardness and water resistance
JP2003122001A (ja) * 2001-10-15 2003-04-25 Nippon Kayaku Co Ltd 感光性樹脂、及びそれを用いた感光性樹脂組成物、並びにその硬化物
US20050271973A1 (en) * 2004-06-04 2005-12-08 Ziegler Michael J Negative acting photoresist with improved blocking resistance
DE602005001724T2 (de) 2004-06-22 2007-12-06 Fujifilm Corp. Verfahren zur Herstellung von Bildaufzeichnungsmaterialien.
US8486711B2 (en) 2004-10-22 2013-07-16 Bayer Materialscience Llc Highly fluorescent markers for fluids or articles
CN101283015A (zh) * 2005-10-07 2008-10-08 日本化药株式会社 聚氨酯酰亚胺树脂、含该树脂的感光性树脂组合物及其固化物
KR101161226B1 (ko) * 2006-03-22 2012-07-02 히다치 가세고교 가부시끼가이샤 폴리아미드이미드 수지, 폴리아미드 수지의 제조 방법 및 경화성 수지 조성물
WO2018173679A1 (ja) * 2017-03-22 2018-09-27 Dic株式会社 酸基含有（メタ）アクリレート樹脂及びソルダーレジスト用樹脂材料

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3373221A (en) * 1964-11-04 1968-03-12 Shell Oil Co Reaction products of unsaturated esters of polyepoxides and unsaturated carboxylic acids, and polyisocyanates
US3478126A (en) * 1967-05-26 1969-11-11 Scm Corp Urethane modified epoxy ester resin compositions and products
US3634542A (en) * 1969-08-04 1972-01-11 Shell Oil Co Unsaturated polyesters esterified with polycarboxylic acid anhydride and containing polyepoxide
JPS4918799B1 (enExample) * 1970-12-24 1974-05-13
US3980483A (en) * 1972-04-24 1976-09-14 Nippon Oil Seal Industry Co., Ltd. Photocurable composition
JPS5010618B2 (enExample) * 1972-10-31 1975-04-23

Also Published As

Publication number Publication date
JPS5276399A (en) 1977-06-27
DE2557408A1 (de) 1977-06-30
JPH038369B2 (enExample) 1991-02-05
IT1069809B (it) 1985-03-25
DE2557408C2 (de) 1983-08-25
US4162274A (en) 1979-07-24
NL7614061A (nl) 1977-06-21
FR2335544A1 (fr) 1977-07-15
GB1537909A (en) 1979-01-10
JPS5936246A (ja) 1984-02-28
FR2335544B1 (enExample) 1983-01-07

Similar Documents

Publication Publication Date Title
JPS5919130B2 (ja) ビニル基とカルボキシル基を含んでいる橋かけ可能なウレタン樹脂の製法
US4327170A (en) Photopolymerizable unsaturated polyesters and copying material prepared therewith
CA1259218A (en) Dry film resist and production of resist images
US5436279A (en) Coating materials containing a reaction product of an epoxy novolak resin and an olefinically unsaturated carboxylic acid crosslinkable by radiation
JPS6049206B2 (ja) 付着性の優れた重合性プレポリマ−
US4436570A (en) Process for bonding films
WO2007083690A1 (ja) 活性エネルギー線硬化型樹脂組成物、及びその用途
CN101213490B (zh) 感光性树脂组合物
US3776889A (en) Allyl carbamate esters of hydroxy-containing polymers
JPS6136872B2 (enExample)
US4576898A (en) Process of making photopolymer relief plates using an adhesive layer
JPS592283B2 (ja) イオウ含有不飽和樹脂の製造法
JP2000178330A (ja) 変性ノボラック樹脂およびその樹脂組成物
US5356740A (en) Radiation-sensitive compositions
DE2121253A1 (de) Urethangruppenhaltige, durch Vinylpolymerisation vernetzbare Polymere
JPH02223952A (ja) 放射線重合性混合物およびそれから製造された複写材料
JP4501056B2 (ja) エポキシアクリレート樹脂、硬化性樹脂組成物、アルカリ現像型感光性樹脂組成物及びこれらの硬化物
JPS59191772A (ja) 被覆，接着用組成物
JP5135659B2 (ja) エネルギー線硬化型樹脂の製造方法およびエネルギー線硬化型樹脂組成物
TWI901961B (zh) 固化性樹脂、及固化性樹脂中間體、固化性樹脂、固化性樹脂組合物及固化物的製造方法
JPH0556298B2 (enExample)
JP2956102B2 (ja) 平版印刷版用感光性組成物
JPS5853644B2 (ja) 光硬化型耐熱性樹脂組成物
JP2778116B2 (ja) 感光性組成物
JPS6032818A (ja) 感光性樹脂の製造方法