JPS59161815A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS59161815A
JPS59161815A JP58035737A JP3573783A JPS59161815A JP S59161815 A JPS59161815 A JP S59161815A JP 58035737 A JP58035737 A JP 58035737A JP 3573783 A JP3573783 A JP 3573783A JP S59161815 A JPS59161815 A JP S59161815A
Authority
JP
Japan
Prior art keywords
stage
wafer
reticle
pattern
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58035737A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0352207B2 (enrdf_load_stackoverflow
Inventor
Shoichi Tanimoto
昭一 谷元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58035737A priority Critical patent/JPS59161815A/ja
Publication of JPS59161815A publication Critical patent/JPS59161815A/ja
Priority to US06/800,094 priority patent/US4629313A/en
Priority to US06/897,644 priority patent/US4711567A/en
Publication of JPH0352207B2 publication Critical patent/JPH0352207B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58035737A 1982-10-22 1983-03-07 投影露光装置 Granted JPS59161815A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58035737A JPS59161815A (ja) 1983-03-07 1983-03-07 投影露光装置
US06/800,094 US4629313A (en) 1982-10-22 1985-11-20 Exposure apparatus
US06/897,644 US4711567A (en) 1982-10-22 1986-08-18 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58035737A JPS59161815A (ja) 1983-03-07 1983-03-07 投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2031370A Division JPH038319A (ja) 1990-02-14 1990-02-14 露光装置の位置合わせ装置及び方法

Publications (2)

Publication Number Publication Date
JPS59161815A true JPS59161815A (ja) 1984-09-12
JPH0352207B2 JPH0352207B2 (enrdf_load_stackoverflow) 1991-08-09

Family

ID=12450135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58035737A Granted JPS59161815A (ja) 1982-10-22 1983-03-07 投影露光装置

Country Status (1)

Country Link
JP (1) JPS59161815A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6266631A (ja) * 1985-09-19 1987-03-26 Nippon Kogaku Kk <Nikon> ステツプ・アンド・リピ−ト露光装置
JPS62158341A (ja) * 1985-12-30 1987-07-14 Hoya Corp 移動ステ−ジ
JPS62248224A (ja) * 1986-04-21 1987-10-29 Nikon Corp 投影露光装置
JPS6376427A (ja) * 1986-09-19 1988-04-06 Canon Inc 露光方法
JPH01283927A (ja) * 1988-05-11 1989-11-15 Mitsubishi Electric Corp 縮小投影露光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56134737A (en) * 1980-02-29 1981-10-21 Optimetrix Corp Improvement in stepwise repetitive projection matching exposure device having auxiliary optical unit
JPS587823A (ja) * 1981-07-06 1983-01-17 Hitachi Ltd アライメント方法およびその装置
JPS5976425A (ja) * 1982-10-25 1984-05-01 Canon Inc 半導体用焼付装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56134737A (en) * 1980-02-29 1981-10-21 Optimetrix Corp Improvement in stepwise repetitive projection matching exposure device having auxiliary optical unit
JPS587823A (ja) * 1981-07-06 1983-01-17 Hitachi Ltd アライメント方法およびその装置
JPS5976425A (ja) * 1982-10-25 1984-05-01 Canon Inc 半導体用焼付装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6266631A (ja) * 1985-09-19 1987-03-26 Nippon Kogaku Kk <Nikon> ステツプ・アンド・リピ−ト露光装置
JPS62158341A (ja) * 1985-12-30 1987-07-14 Hoya Corp 移動ステ−ジ
JPS62248224A (ja) * 1986-04-21 1987-10-29 Nikon Corp 投影露光装置
JPS6376427A (ja) * 1986-09-19 1988-04-06 Canon Inc 露光方法
JPH01283927A (ja) * 1988-05-11 1989-11-15 Mitsubishi Electric Corp 縮小投影露光装置

Also Published As

Publication number Publication date
JPH0352207B2 (enrdf_load_stackoverflow) 1991-08-09

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