JPS59135749A - 層間絶縁膜の形成方法 - Google Patents

層間絶縁膜の形成方法

Info

Publication number
JPS59135749A
JPS59135749A JP1117283A JP1117283A JPS59135749A JP S59135749 A JPS59135749 A JP S59135749A JP 1117283 A JP1117283 A JP 1117283A JP 1117283 A JP1117283 A JP 1117283A JP S59135749 A JPS59135749 A JP S59135749A
Authority
JP
Japan
Prior art keywords
insulating film
interlayer insulating
resist
forming
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1117283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225251B2 (enrdf_load_stackoverflow
Inventor
Yaichiro Watakabe
渡壁　弥一郎
Akira Shigetomi
重富　晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1117283A priority Critical patent/JPS59135749A/ja
Publication of JPS59135749A publication Critical patent/JPS59135749A/ja
Publication of JPH0225251B2 publication Critical patent/JPH0225251B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP1117283A 1983-01-24 1983-01-24 層間絶縁膜の形成方法 Granted JPS59135749A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1117283A JPS59135749A (ja) 1983-01-24 1983-01-24 層間絶縁膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1117283A JPS59135749A (ja) 1983-01-24 1983-01-24 層間絶縁膜の形成方法

Publications (2)

Publication Number Publication Date
JPS59135749A true JPS59135749A (ja) 1984-08-04
JPH0225251B2 JPH0225251B2 (enrdf_load_stackoverflow) 1990-06-01

Family

ID=11770631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1117283A Granted JPS59135749A (ja) 1983-01-24 1983-01-24 層間絶縁膜の形成方法

Country Status (1)

Country Link
JP (1) JPS59135749A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187355A (ja) * 1984-10-05 1986-05-02 Nippon Telegr & Teleph Corp <Ntt> 多層配線形成法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187355A (ja) * 1984-10-05 1986-05-02 Nippon Telegr & Teleph Corp <Ntt> 多層配線形成法

Also Published As

Publication number Publication date
JPH0225251B2 (enrdf_load_stackoverflow) 1990-06-01

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