JPS5879752A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5879752A JPS5879752A JP56177201A JP17720181A JPS5879752A JP S5879752 A JPS5879752 A JP S5879752A JP 56177201 A JP56177201 A JP 56177201A JP 17720181 A JP17720181 A JP 17720181A JP S5879752 A JPS5879752 A JP S5879752A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semiconductor device
- groove
- type
- conductive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/65—Integrated injection logic
- H10D84/658—Integrated injection logic integrated in combination with analog structures
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56177201A JPS5879752A (ja) | 1981-11-06 | 1981-11-06 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56177201A JPS5879752A (ja) | 1981-11-06 | 1981-11-06 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5879752A true JPS5879752A (ja) | 1983-05-13 |
JPH0512863B2 JPH0512863B2 (enrdf_load_html_response) | 1993-02-19 |
Family
ID=16026938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56177201A Granted JPS5879752A (ja) | 1981-11-06 | 1981-11-06 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5879752A (enrdf_load_html_response) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60158657A (ja) * | 1984-01-29 | 1985-08-20 | Rohm Co Ltd | 半導体装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS516488A (enrdf_load_html_response) * | 1974-07-05 | 1976-01-20 | Hitachi Ltd | |
JPS5456357A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Production of semiconductor device |
JPS5655060A (en) * | 1979-10-11 | 1981-05-15 | Fujitsu Ltd | Semiconductor integrated circuit device |
-
1981
- 1981-11-06 JP JP56177201A patent/JPS5879752A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS516488A (enrdf_load_html_response) * | 1974-07-05 | 1976-01-20 | Hitachi Ltd | |
JPS5456357A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Production of semiconductor device |
JPS5655060A (en) * | 1979-10-11 | 1981-05-15 | Fujitsu Ltd | Semiconductor integrated circuit device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60158657A (ja) * | 1984-01-29 | 1985-08-20 | Rohm Co Ltd | 半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0512863B2 (enrdf_load_html_response) | 1993-02-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3074708B2 (ja) | 高出力用集積回路のための半導体構造 | |
JPS5879752A (ja) | 半導体装置の製造方法 | |
JPH07235602A (ja) | Iil回路を有する半導体装置およびその製造方法 | |
JPS6038889A (ja) | 半導体装置およびその製造方法 | |
JP2000232111A (ja) | 半導体装置の製造方法 | |
JPS6347965A (ja) | 半導体集積回路 | |
JPS60776B2 (ja) | 半導体装置 | |
JP2003309187A (ja) | 半導体集積回路およびその製造方法 | |
JP2932076B2 (ja) | 半導体装置の製造方法 | |
JPS58107645A (ja) | 半導体装置の製法 | |
JPS63244667A (ja) | バイポ−ラ集積回路の製造方法 | |
JPH0436578B2 (enrdf_load_html_response) | ||
JPH0454984B2 (enrdf_load_html_response) | ||
JPS6132545A (ja) | 半導体集積回路の製造方法 | |
JPS6327051A (ja) | 半導体集積回路 | |
JPS6343357A (ja) | 半導体集積回路 | |
JPS60182149A (ja) | 半導体集積回路の製造方法 | |
JPS592184B2 (ja) | 半導体装置の製造方法 | |
JPS60103640A (ja) | 半導体装置 | |
JPS61244060A (ja) | 半導体装置 | |
JPH0263156A (ja) | 半導体集積回路装置 | |
JPS624367A (ja) | バイボ−ラ型半導体装置 | |
JPH02278866A (ja) | 半導体装置の製造方法 | |
JPH02105442A (ja) | 半導体集積回路の製造方法 | |
JPS58220471A (ja) | ラテラル・トランジスタ |