JPS5874043A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS5874043A
JPS5874043A JP56174307A JP17430781A JPS5874043A JP S5874043 A JPS5874043 A JP S5874043A JP 56174307 A JP56174307 A JP 56174307A JP 17430781 A JP17430781 A JP 17430781A JP S5874043 A JPS5874043 A JP S5874043A
Authority
JP
Japan
Prior art keywords
film
silicon
silica film
silicon nitride
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56174307A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0419707B2 (OSRAM
Inventor
Manzo Saito
斉藤　万蔵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56174307A priority Critical patent/JPS5874043A/ja
Publication of JPS5874043A publication Critical patent/JPS5874043A/ja
Publication of JPH0419707B2 publication Critical patent/JPH0419707B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/60—

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP56174307A 1981-10-29 1981-10-29 半導体装置 Granted JPS5874043A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56174307A JPS5874043A (ja) 1981-10-29 1981-10-29 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56174307A JPS5874043A (ja) 1981-10-29 1981-10-29 半導体装置

Publications (2)

Publication Number Publication Date
JPS5874043A true JPS5874043A (ja) 1983-05-04
JPH0419707B2 JPH0419707B2 (OSRAM) 1992-03-31

Family

ID=15976364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56174307A Granted JPS5874043A (ja) 1981-10-29 1981-10-29 半導体装置

Country Status (1)

Country Link
JP (1) JPS5874043A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246652A (ja) * 1984-05-22 1985-12-06 Nec Corp 平坦化導電体配線の形成方法
JPS61240636A (ja) * 1985-04-17 1986-10-25 Seiko Epson Corp 半導体装置の製造方法
JPS63207168A (ja) * 1987-02-24 1988-08-26 Seiko Epson Corp Ｍｏｓ型半導体集積回路装置
JPH01225326A (ja) * 1988-01-13 1989-09-08 Sgs Thomson Microelectron Sa 集積回路のパッシベーション方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5133575A (en) * 1974-09-17 1976-03-22 Nippon Telegraph & Telephone Tasohaisenkozo
JPS5214365A (en) * 1975-07-25 1977-02-03 Hitachi Ltd Process for formation of insulating membrane by spreading

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5133575A (en) * 1974-09-17 1976-03-22 Nippon Telegraph & Telephone Tasohaisenkozo
JPS5214365A (en) * 1975-07-25 1977-02-03 Hitachi Ltd Process for formation of insulating membrane by spreading

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246652A (ja) * 1984-05-22 1985-12-06 Nec Corp 平坦化導電体配線の形成方法
JPS61240636A (ja) * 1985-04-17 1986-10-25 Seiko Epson Corp 半導体装置の製造方法
JPS63207168A (ja) * 1987-02-24 1988-08-26 Seiko Epson Corp Ｍｏｓ型半導体集積回路装置
JPH01225326A (ja) * 1988-01-13 1989-09-08 Sgs Thomson Microelectron Sa 集積回路のパッシベーション方法

Also Published As

Publication number Publication date
JPH0419707B2 (OSRAM) 1992-03-31

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